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    • 6. 发明专利
    • System, Method, And Computer Program For Analyzing Operation Of Fluid Control Device
    • SG11201908394WA
    • 2019-10-30
    • SG11201908394W
    • 2018-03-13
    • FUJIKIN KK
    • SUZUKI YUYAKOMEHANA KATSUNORIOCHIISHI MASAHIKOHARADA AKIHIROTANNO RYUTAROSHINOHARA TSUTOMU
    • F16K37/00G01M3/00
    • SYSTEM, METHOD, AND COMPUTER PROGRAM FOR ANALYZING OPERATION OF FLUID CONTROL DEVICE A cause of abnormality of a fluid control device and/or data with which abnormality can be predicted can be collected to be analyzed, and abnormality can be predicted based on a result of the analysis. A fluid control device 8 and a server 72 are configured to be able to communicate with each other through networks NW1 and 2. The fluid control device 8 includes an operation information acquisition mechanism that acquires a plurality of types of operation information about the fluid control device 8. The server 72 includes a determination processing unit 721 that determines whether the fluid control device 8 has an abnormality, an information collection unit 724 that collects the operation information and an abnormality determination result for the fluid control device 1, an information storage unit 725 that stores the operation information and the determination result collected, an information extraction unit 726 that refers to the information storage unit 725, and extracts, analysis target including same predetermined operation information and another of the operation information as well as information related to the determination result, 72 selectively for each of a plurality of the fluid control devices 1, and a correlation analysis unit 727 that analyzes correlation between a predetermined operation of the fluid control device 8 and occurrence of abnormality through comparison using the information extracted. Fig. 14
    • 10. 发明专利
    • VALVE AND SEMICONDUCTOR PRODUCTION DEVICE
    • SG11201907322SA
    • 2019-09-27
    • SG11201907322S
    • 2017-11-02
    • FUJIKIN KK
    • TANNO RYUTAROYANAGIDA YASUMASASHINOHARA TSUTOMU
    • F16K31/44F16K1/32H01L21/3065
    • VALVE DEVICE AND SEMICONDUCTOR PRODUCTION DEVICE Provided are a valve device and a semiconductor production device that can be used long-term without seizing even during high-temperature use, and which do not have contaminants in the chambers thereof. The valve device includes: a boosting mechanism 30 that amplifies drive force; a first stem 25 and a second stem 26 that receive force amplified by the boosting mechanism 30 and move; and a diaphragm 11 capable of opening and closing fluid passages 2b, 2c. The boosting mechanism 30 includes: a retainer 31 and bearings 32; shafts 33 having both ends thereof supported by the bearings 32; and arms 34 pivotably supported by the shafts 33 and having an outer end portion 34C that receives drive force and an inner end portion 34B that amplifies and transmits drive force to the first stem 25. In the retainer 31, the bearings 32, the shafts 33, and the arms 34, the bearings 32 and both ends of the shaft 33 constitute a swinging portion in conjunction with the swinging by the arms 34, and thereamong, the bearings 32 include a carbon fiber composite material. [FIG. 2] 22