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1. 发明申请

WO2019115195A1 SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2019115195A1
公开(公告)日：2019-06-20
申请号：PCT/EP2018/082175
申请日：2018-11-22
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： POIESZ, Thomas , BALTIS, Coen, Hubertus, Matheus , SOETHOUDT, Abraham, Alexander , AKBAS, Mehmet, Ali , VAN DEN BERG, Dennis , VANESCH, Wouter , TEUNISSEN, Marcel, Maria, Cornelius, Franciscus
IPC分类号： G03F7/20 , H01L21/687
摘要： The present invention provides a substrate holder for use in a lithographic apparatus. The substrate holder being configured to support a substrate and comprising a main body, a plurality of support elements and a seal unit. The main body has a main body surface. The plurality of support elements project from the main body surface and each support element has a distal end surface configured to support the substrate. The seal unit may comprise a first seal positioned radially outward of and surrounding the plurality of support elements. An upper surface of the first seal member may have a contact region configured to contact the substrate during loading and/or unloading of the substrate. In an embodiment, a position of the contact region is arranged at a distance from the plurality of support elements sufficient enough such that during the unloading of the substrate, a force applied to the first seal member by the substrate is greater than a force applied to the plurality of support elements by the substrate. Additionally or alternatively, a profile of the contact region, in a cross section through the seal member in a radial direction, has a shape which is configured such that during the unloading of the substrate, the substrate contacts the seal member via at least two different points of the profile. The present invention also provides a substrate holder with a further member radially outward of the seal unit. The further member being configured to contact the substrate during loading or unloading of the substrate. At least part of the substrate holder may have a coating made of diamond-like carbon, diamond, silicon carbide, boron nitrite or boron carbon nitride.

2. 发明申请

WO2015169616A1 SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SUPPORT LOCATION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板支撑，用于在基板支撑位置上装载基板的方法，地平面设备和装置制造方法
公开(公告)号：WO2015169616A1
公开(公告)日：2015-11-12
申请号：PCT/EP2015/058831
申请日：2015-04-23
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： LEENDERS, Martinus, Hendrikus, Antonius , DE KRUIJF, Niek, Elout , DUSA, Mircea , HOUBEN, Martijn , MULDER, Johannes, Gerardus,Maria , POIESZ, Thomas , VAN DEN HEUVEL, Marco, Adrianus, Peter , VAN DONGEN, Paul , GERRITZEN, Justin, Johannes, Hermanus , VERWEIJ, Antonie, Hendrik , SOETHOUDT, Abraham, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70783 , H01L21/6835 , H01L21/6838
摘要： A substrate support (1), includes: a substrate support location (4) configured to support a substrate (W), and a vacuum clamping device (7) configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source (8) to create a reduced pressure, at least one vacuum section (9) connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device (16) configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input (16a) to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
摘要翻译：衬底支撑件（1）包括：被配置为支撑衬底（W）的衬底支撑位置（4）和被配置为将衬底夹持在衬底支撑位置上的真空夹紧装置（7），其中真空夹紧装置包括至少一个减压源（8）以产生减压，连接到所述至少一个减压源的至少一个真空部分（9），其中所述至少一个真空部分被配置为将所述基板吸引到所述基板支撑件位置和控制装置（16），其被配置为控制沿着所述至少一个真空部分的空间压力分布，所述基板由所述至少一个真空部分被所述真空夹紧装置吸引，其中所述控制装置包括用于接收的基板形状数据输入（16a）表示要被夹持的基板的形状数据的基板形状数据，并且其中所述控制装置被配置为根据所述基板形状数据来适应所述空间压力分布。

3. 发明申请

WO2018059836A1 A SUBSTRATE, A SUBSTRATE HOLDER, A SUBSTRATE COATING APPARATUS, A METHOD FOR COATING THE SUBSTRATE AND A METHOD FOR REMOVING THE COATING 审中-公开
标题翻译：基板，基板支架，基板涂布装置，涂布基板的方法及涂布方法
公开(公告)号：WO2018059836A1
公开(公告)日：2018-04-05
申请号：PCT/EP2017/071179
申请日：2017-08-23
申请人： ASML NETHERLANDS B.V.
发明人： ACHANTA, Satish , WELTERS, Wilhelmus, Jacobus, Johannes , SOETHOUDT, Abraham, Alexander , KAMMINGA, Jelmer, Mattheüs , LIEDECKE, Christian
IPC分类号： G03F7/16 , B05D1/18 , C23C16/455 , H01L21/687
摘要： The present invention relates to a substrate (100), a substrate holder (200), a substrate coating apparatus (800, 801), a method for coating the substrate (100) and a method for removing the coating (102). A monomolecular layer (102) is applied to the backside (101) of the substrate or a clamp surface (201) of the substrate holder (200). The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force (210). After loading the substrate (100) on the substrate holder (200) full clamping force (210) is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer (102), resulting in an increase of the friction force between the substrate (100) and the substrate holder (200).
摘要翻译：（100），基板保持器（200），基板涂覆设备（800,801），用于涂覆基板（100）的方法和用于去除基板涂层（102）。将单分子层（102）施加到衬底的背面（101）或衬底支架（200）的夹持表面（201）。当衬底没有经历完全夹紧力时，衬底背面和衬底之间的摩擦力很小（210）。在将衬底（100）装载到衬底保持器（200）上之后，施加完全夹紧力（210）以固定衬底。夹紧力导致局部去除单分子层（102），导致衬底（100）和衬底支架（200）之间的摩擦力增加。

4. 发明申请

WO2016198255A1 LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE 审中-公开
标题翻译：用于装载基板的平面设备和方法
公开(公告)号：WO2016198255A1
公开(公告)日：2016-12-15
申请号：PCT/EP2016/061587
申请日：2016-05-23
申请人： ASML NETHERLANDS B.V.
发明人： SOETHOUDT, Abraham, Alexander , POIESZ, Thomas
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , B01D53/346 , B01D53/56 , B01D53/79 , B01D2251/2062 , B01D2251/2067 , B01D2257/402 , B01D2257/404 , B01D2258/0283 , B01D2259/124 , B05B13/0278 , B05B13/041 , B05B13/0627 , B05B15/656 , B05B15/68 , F23J15/003 , F23J2219/20 , G03F7/707 , G03F7/70783 , Y02C20/10
摘要： A lithographic apparatus comprises a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between the base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.
摘要翻译：光刻设备包括支撑台和气体提取系统。气体提取系统构造成当衬底被降低到支撑台上时，通过至少一个气体提取开口从支撑台的基底表面和基底之间的间隙中提取气体。光刻设备被构造成使得当基板和支撑平面之间的距离大于阈值距离时，以第一负载流速从间隙中提取气体，并且当第二负载流速从气隙中抽出气体时衬底与支撑面之间的距离小于阈值距离，其中第二负载流速低于第一负载流量。

5. 发明申请

WO2020147992A1 METHOD, SUBSTRATE AND SYSTEM FOR ESTIMATING STRESS IN A SUBSTRATE 审中-公开
公开(公告)号：WO2020147992A1
公开(公告)日：2020-07-23
申请号：PCT/EP2019/080270
申请日：2019-11-05
申请人： ASML NETHERLANDS B.V.
发明人： POIESZ, Thomas , HABETS, Michel, Ben, Isel , SOETHOUDT, Abraham, Alexander , MARQUART, Herman
IPC分类号： G03F7/20 , H01L21/02 , H01L21/30
摘要： The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.

6. 发明申请

WO2017137129A1 LITHOGRAPHIC APPARATUS, METHOD FOR UNLOADING A SUBSTRATE AND METHOD FOR LOADING A SUBSTRATE 审中-公开
标题翻译：光刻设备，卸载基板的方法和用于加载基板的方法
公开(公告)号：WO2017137129A1
公开(公告)日：2017-08-17
申请号：PCT/EP2016/082484
申请日：2016-12-22
申请人： ASML NETHERLANDS B.V.
发明人： JEUNINK, Andre, Bernardus , MARTENS, Robby, Franciscus, Josephus , DE VOS, Youssef, Karel, Maria , VAN DORST, Ringo, Petrus, Cornelis , TEN BRINKE, Gerhard, Albert , SENDEN, Dirk, Jerome, Andre , BALTIS, Coen, Hubertus, Matheus , GERRITZEN, Justin, Johannes, Hermanus , KAMMINGA, Jelmer, Mattheüs , PACITTI, Evelyn, Wallis , POIESZ, Thomas , SCHEIBERLICH, Arie, Cornelis , SCHOLTEN, Bert, Dirk , SCHREUDER, André , SOETHOUDT, Abraham, Alexander , TROMP, Siegfried, Alexander , VAN DE VIJVER, Yuri, Johannes, Gabriël
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70733 , H01L21/68742
摘要： A method for unloading a substrate from a support table configured to support the substrate, the method comprising: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
摘要翻译：一种用于从支撑所述基板的支撑台卸载基板的方法，所述方法包括：经由多个气流向所述支撑台的基座表面和所述基板之间的间隙供应气体其中在卸载的初始阶段期间，气体通过支撑台的外部区域中的至少一个气体流动开口供应，并且不通过支撑台的中央区域中的任何气体流动开口，外部区域，并且在随后的卸载阶段期间，通过外部区域中的至少一个气体流动开口和中央区域中的至少一个气体流动开口供应气体。

7. 发明申请

WO2016062540A1 SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：支撑台，用于装载基板的方法，平面设备和装置的制造方法
公开(公告)号：WO2016062540A1
公开(公告)日：2016-04-28
申请号：PCT/EP2015/073112
申请日：2015-10-07
申请人： ASML NETHERLANDS B.V.
发明人： TROMP, Siegfried, Alexander , VERWEIJ, Antonie, Hendrik , SOETHOUDT, Abraham, Alexander , VAN DE POEL, Jan, Pieter , BAGGEN, Mark, Constant, Johannes
IPC分类号： G03F7/20 , F16C32/06
CPC分类号： F16C32/0611 , F16C29/025 , F16C32/0607 , G03F7/20 , G03F7/707 , G03F7/708
摘要： There are disclosed a support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table (100) is configured to support a substrate (W). The support table comprises a base surface (101). The base surface faces a bottom surface (103) of the substrate when the substrate is supported by the support table. One or more gas cushion members (102) are provided above the base surface. Each of the gas cushion members comprises a recess (108). The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localised build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
摘要翻译：公开了一种用于光刻设备的支撑台，装载基板的方法，光刻设备以及使用光刻设备制造设备的方法。在一种布置中，支撑台（100）构造成支撑基板（W）。支撑台包括基面（101）。当基板由支撑台支撑时，基部表面面向基板的底表面（103）。一个或多个气垫构件（102）设置在基面的上方。每个气垫构件包括凹部（108）。凹部的形状和构造使得将基底降低到支撑台上的由支撑台支撑基板的位置导致凹陷内的压力的局部积聚。压力的局部积聚提供了在降低衬底期间的局部气体缓冲效应。

8. 发明申请

WO2019096554A1 SUBSTRATE HOLDER, SUBSTRATE SUPPORT AND METHOD OF CLAMPING A SUBSTRATE TO A CLAMPING SYSTEM 审中-公开
公开(公告)号：WO2019096554A1
公开(公告)日：2019-05-23
申请号：PCT/EP2018/079185
申请日：2018-10-24
申请人： ASML NETHERLANDS B.V.
发明人： SOETHOUDT, Abraham, Alexander , POIESZ, Thomas
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
摘要： A method of clamping a substrate (W) to a clamping system, the method comprising the steps of: providing a substrate holder (200) comprising; a main body (210) having a first main body surface (212) and a second main body surface (214), wherein the first main body surface and second main body surface are on opposite sides of the main body; and a plurality of first burls (220a, 220b) projecting from the first main body surface, wherein each first burl has a distal end surface configured to support the substrate; providing a support surface (300) for supporting the substrate holder; providing a plurality of second burls (240) for supporting the substrate holder on the support surface through contact with distal end surfaces of the plurality of second burls: generating a first force to attract the substrate holder to the support surface; placing the substrate on the substrate holder such that it contacts the plurality of first burls; generating a second force to attract the substrate to the substrate holder; and controlling at least one of the first force and the second force in a release step to deform the main body between the second burls such as to create a gap (225, 226) between the distal end surfaces of a first subset of the plurality of first burls and the substrate and such that the substrate is supported on distal end surfaces of a second subset of the plurality of first burls.

9. 发明申请

WO2019091694A1 A SUBSTRATE HOLDER AND A METHOD OF MANUFACTURING A DEVICE 审中-公开
公开(公告)号：WO2019091694A1
公开(公告)日：2019-05-16
申请号：PCT/EP2018/077740
申请日：2018-10-11
申请人： ASML NETHERLANDS B.V.
发明人： POIESZ, Thomas , ACHANTA, Satish , BOUWKNEGT, Jeroen , SOETHOUDT, Abraham, Alexander
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
摘要： There is disclosed a substrate holder, a method of manufacturing this substrate holder and a lithographic apparatus comprising this substrate holder. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder (WT) comprises a main body (40), a plurality of burls and a coating (23). The main body has a substrate-facing face (41). The plurality of burls protrude from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face comprises an arrangement of areas (42,43). Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

10. 发明申请

WO2017001135A1 A SUBSTRATE HOLDER, A LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICES 审中-公开
标题翻译：基板保持器，平面设备及其制造方法
公开(公告)号：WO2017001135A1
公开(公告)日：2017-01-05
申请号：PCT/EP2016/062371
申请日：2016-06-01
申请人： ASML NETHERLANDS B.V.
发明人： POIESZ, Thomas , HOUBEN, Martijn , SOETHOUDT, Abraham, Alexander
IPC分类号： G03F7/20 , H01L21/687
CPC分类号： H01L21/6875 , B23H7/26 , G03F7/2002 , G03F7/2004 , G03F7/707 , G03F7/70783 , H01L21/0274 , H01L21/6831 , H01L21/6838
摘要： A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.
摘要翻译：一种用于光刻设备并被配置为支撑衬底的衬底保持器，所述衬底保持器包括：主体，其具有主体表面; 以及从所述主体表面突出的多个毛刺; 其中每个毛刺具有构造成与所述基底接合的远端; 毛边的远端基本上与支撑平面一致，由此基底可以以基本平坦的状态支撑在毛刺上; 在基板和基板保持器沿该方向的相对移动的情况下，每个凸起的远端和与其接合的基板之间的摩擦力产生在平行于支撑平面的方向上; 并且毛边的远端表面设置有释放结构，其被构造成使得摩擦力小于在不存在释放结构时会产生的摩擦力。

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