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1. 发明申请

WO2017137129A1 LITHOGRAPHIC APPARATUS, METHOD FOR UNLOADING A SUBSTRATE AND METHOD FOR LOADING A SUBSTRATE 审中-公开
标题翻译：光刻设备，卸载基板的方法和用于加载基板的方法
公开(公告)号：WO2017137129A1
公开(公告)日：2017-08-17
申请号：PCT/EP2016/082484
申请日：2016-12-22
申请人： ASML NETHERLANDS B.V.
发明人： JEUNINK, Andre, Bernardus , MARTENS, Robby, Franciscus, Josephus , DE VOS, Youssef, Karel, Maria , VAN DORST, Ringo, Petrus, Cornelis , TEN BRINKE, Gerhard, Albert , SENDEN, Dirk, Jerome, Andre , BALTIS, Coen, Hubertus, Matheus , GERRITZEN, Justin, Johannes, Hermanus , KAMMINGA, Jelmer, Mattheüs , PACITTI, Evelyn, Wallis , POIESZ, Thomas , SCHEIBERLICH, Arie, Cornelis , SCHOLTEN, Bert, Dirk , SCHREUDER, André , SOETHOUDT, Abraham, Alexander , TROMP, Siegfried, Alexander , VAN DE VIJVER, Yuri, Johannes, Gabriël
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70733 , H01L21/68742
摘要： A method for unloading a substrate from a support table configured to support the substrate, the method comprising: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
摘要翻译：一种用于从支撑所述基板的支撑台卸载基板的方法，所述方法包括：经由多个气流向所述支撑台的基座表面和所述基板之间的间隙供应气体其中在卸载的初始阶段期间，气体通过支撑台的外部区域中的至少一个气体流动开口供应，并且不通过支撑台的中央区域中的任何气体流动开口，外部区域，并且在随后的卸载阶段期间，通过外部区域中的至少一个气体流动开口和中央区域中的至少一个气体流动开口供应气体。

2. 发明申请

WO2015169616A1 SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SUPPORT LOCATION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板支撑，用于在基板支撑位置上装载基板的方法，地平面设备和装置制造方法
公开(公告)号：WO2015169616A1
公开(公告)日：2015-11-12
申请号：PCT/EP2015/058831
申请日：2015-04-23
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： LEENDERS, Martinus, Hendrikus, Antonius , DE KRUIJF, Niek, Elout , DUSA, Mircea , HOUBEN, Martijn , MULDER, Johannes, Gerardus,Maria , POIESZ, Thomas , VAN DEN HEUVEL, Marco, Adrianus, Peter , VAN DONGEN, Paul , GERRITZEN, Justin, Johannes, Hermanus , VERWEIJ, Antonie, Hendrik , SOETHOUDT, Abraham, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70783 , H01L21/6835 , H01L21/6838
摘要： A substrate support (1), includes: a substrate support location (4) configured to support a substrate (W), and a vacuum clamping device (7) configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source (8) to create a reduced pressure, at least one vacuum section (9) connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device (16) configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input (16a) to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
摘要翻译：衬底支撑件（1）包括：被配置为支撑衬底（W）的衬底支撑位置（4）和被配置为将衬底夹持在衬底支撑位置上的真空夹紧装置（7），其中真空夹紧装置包括至少一个减压源（8）以产生减压，连接到所述至少一个减压源的至少一个真空部分（9），其中所述至少一个真空部分被配置为将所述基板吸引到所述基板支撑件位置和控制装置（16），其被配置为控制沿着所述至少一个真空部分的空间压力分布，所述基板由所述至少一个真空部分被所述真空夹紧装置吸引，其中所述控制装置包括用于接收的基板形状数据输入（16a）表示要被夹持的基板的形状数据的基板形状数据，并且其中所述控制装置被配置为根据所述基板形状数据来适应所述空间压力分布。

3. 发明申请

WO2016207122A1 SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：支持设备，平面设备和设备制造方法
公开(公告)号：WO2016207122A1
公开(公告)日：2016-12-29
申请号：PCT/EP2016/064236
申请日：2016-06-21
申请人： ASML NETHERLANDS B.V.
发明人： JEUNINK, Andre, Bernardus , DE JONG, Robbert , LEENDERS, Martinus, Hendrikus, Antonius , PACITTI, Evelyn, Wallis , POIESZ, Thomas , VAN DEN BERKMORTEL, Frank, Pieter, Albert
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70783 , G03F7/70858
摘要： A support apparatus (60) configured to support an object (W), the support apparatus comprising a support body (100) comprising an object holder (61) to hold an object; an opening (66) in the support body adjacent to an edge of the object holder; a channel (68) in fluid communication with the opening via each of a plurality of passageways (67) in the support body; and a passageway liner (70) mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating substantially to thermally decouple the support body from fluid in the at least one of the plurality of passageways.
摘要翻译：一种被配置为支撑物体（W）的支撑装置（60），所述支撑装置包括支撑体（100），所述支撑体包括用于保持物体的物体保持器（61）所述支撑体中与所述物体保持器的边缘相邻的开口（66）通过所述支撑体中的多个通道（67）中的每一个与所述开口流体连通的通道（68）以及安装在所述多个通道中的至少一个通道中的通道衬套（70），所述通道衬套基本上是热绝缘的，以将所述支撑体与所述多个通道中的所述至少一个通道中的流体热分解。

4. 发明申请

WO2015165653A1 SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：平面设备支持表，平面设备和设备制造方法
公开(公告)号：WO2015165653A1
公开(公告)日：2015-11-05
申请号：PCT/EP2015/056364
申请日：2015-03-25
申请人： ASML NETHERLANDS B.V.
发明人： VAN SOMMEREN, Daan, Daniel, Johannes, Antonius , POIESZ, Thomas
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70866 , H01L21/67028 , H01L21/67051 , H01L21/6875
摘要： A support table (WT) for a lithographic apparatus, the support table is configured to support a lower surface of a substrate (W). The support table comprises: a base surface (22) configured to be substantially parallel to the lower surface of the substrate supported on the support table, a plurality of burls (20) protruding above the base surface, each of the plurality of burls having a respective distal end and a first height above the base surface, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the plurality of the burls, and a plurality of elongate raised protrusions (45) protruding above the base surface, each of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height. The base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.
摘要翻译：一种用于光刻设备的支撑台（WT），所述支撑台被配置为支撑衬底（W）的下表面。所述支撑台包括：基部表面（22），其被构造成基本上平行于支撑在所述支撑台上的所述基板的下表面;多个凸起（20），突出在所述基座表面上方，所述多个毛刺中的每一个具有相应的远端和在基底表面上方的第一高度，所述多个毛刺被布置成使得当所述基底被所述支撑台支撑时，所述基底由所述多个毛刺中的每一个的相应远端支撑，并且多个在基座表面上突出的细长凸起突起（45），每个细长凸起突起在基面上方具有第二高度，其中第二高度小于第一高度。基部表面包括多个区域，每个区域中的一些细长凸起突起位于其中。位于每个区域内的所有细长凸起突起具有基本上相同的伸长方向，使得它们彼此基本平行，从而在细长凸起之间形成基本上平行于细长凸起突起的至少一个气流路径。

5. 发明申请

WO2015106860A1 SUBSTRATE HOLDER AND SUPPORT TABLE FOR LITHOGRAPHY 审中-公开
标题翻译：基板支架和支撑表
公开(公告)号：WO2015106860A1
公开(公告)日：2015-07-23
申请号：PCT/EP2014/075163
申请日：2014-11-20
申请人： ASML NETHERLANDS B.V.
发明人： HOUBEN, Martijn , POIESZ, Thomas
IPC分类号： G03F7/20 , H01L21/687
CPC分类号： G03F7/707 , G03F7/70783 , H01L21/6831 , H01L21/68742 , H01L21/6875
摘要： A substrate table (WT) supports a substrate holder (WH) to which a substrate (W) is clamped for exposure. The substrate table (WT) has a plurality of e-pins (30) spaced apart from and distributed around the center of the substrate holder for receiving and lowering a substrate onto the substrate holder prior to exposure and raising a substrate off the substrate holder after exposure. Tip portions of the e-pins (30) and the corresponding apertures (24) in the substrate holder (WH) have a shape in plan including at least one re-entrant, e.g. a cross shape.
摘要翻译：衬底台（WT）支撑衬底保持器（WH），衬底（W）夹在其上用于曝光。衬底台（WT）具有与衬底保持器的中心间隔开并分布在衬底保持器的中心的多个e形销（30），用于在曝光之前将衬底接收和降低到衬底保持器上，并且在衬底保持器之后将衬底从衬底保持器上抬起，曝光。 e形销（30）的顶端部分和衬底保持器（WH）中的对应的孔（24）具有平面形状，包括至少一个入口（例如）。十字形。

6. 发明申请

WO2023072640A1 CLAMP FOR HOLDING AN OBJECT AND METHOD 审中-公开
公开(公告)号：WO2023072640A1
公开(公告)日：2023-05-04
申请号：PCT/EP2022/078749
申请日：2022-10-14
申请人： ASML NETHERLANDS B.V.
发明人： POIESZ, Thomas , VAN ROOIJ, René, Adrianus , STEIN, Alexander
IPC分类号： G03F7/20 , H01L21/687 , H01L21/683
摘要： The disclosure provides a clamp comprising a dielectric member; a conductive element disposed on the dielectric member and comprised of a first conductive material; and a number of burls arranged on the conductive element for supporting the object, each burl comprising a second conductive material, wherein the clamp comprises a stack of alternating layers of etch resistant material and a third conductive material arranged between the conductive element and the number of burls.

7. 发明申请

WO2018007498A1 A SUBSTRATE HOLDER AND A METHOD OF MANUFACTURING A SUBSTRATE HOLDER 审中-公开
标题翻译：一种基板支架和一种制造基板支架的方法
公开(公告)号：WO2018007498A1
公开(公告)日：2018-01-11
申请号：PCT/EP2017/066890
申请日：2017-07-06
申请人： STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , STICHTING VU , ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： POIESZ, Thomas , ACHANTA, Satish , AKBAS, Mehmet, Ali , ANTONOV, Pavlo , BOUWKNEGT, Jeroen , FRENKEN, Joost, Wilhelmus, Maria , PACITTI, Evelyn, Wallis , TEN KATE, Nicolaas , TIRRI, Bruce , VERHOEVEN, Jan
IPC分类号： G03F7/20 , H01L21/687
摘要： There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.
摘要翻译：公开了一种衬底保持器，制造衬底保持器的方法，包括该衬底保持器的光刻设备，以及使用该光刻设备制造器件的方法。在一种布置中，提供了一种用于光刻设备中的衬底保持器。衬底支架支撑衬底。衬底支架包括主体。主体具有主体表面。设置从主体表面突出的多个突起。每个钻头都有一个钻头侧表面和一个远端表面。每个套管的远端表面与基底接合。突起的远端表面基本上符合支撑平面并支撑基板。在碳基材料的多个分离区域中提供一层碳基材料。碳基材料层提供比多个碳基材料的分离区域外部的主体表面的一部分具有更低摩擦系数的表面。碳基材料层仅覆盖至少一个突起的远端表面的一部分。或者，碳基材料层覆盖至少一个突起的末端表面和至少一部分突起侧表面。

8. 发明申请

WO2016198255A1 LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE 审中-公开
标题翻译：用于装载基板的平面设备和方法
公开(公告)号：WO2016198255A1
公开(公告)日：2016-12-15
申请号：PCT/EP2016/061587
申请日：2016-05-23
申请人： ASML NETHERLANDS B.V.
发明人： SOETHOUDT, Abraham, Alexander , POIESZ, Thomas
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , B01D53/346 , B01D53/56 , B01D53/79 , B01D2251/2062 , B01D2251/2067 , B01D2257/402 , B01D2257/404 , B01D2258/0283 , B01D2259/124 , B05B13/0278 , B05B13/041 , B05B13/0627 , B05B15/656 , B05B15/68 , F23J15/003 , F23J2219/20 , G03F7/707 , G03F7/70783 , Y02C20/10
摘要： A lithographic apparatus comprises a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between the base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.
摘要翻译：光刻设备包括支撑台和气体提取系统。气体提取系统构造成当衬底被降低到支撑台上时，通过至少一个气体提取开口从支撑台的基底表面和基底之间的间隙中提取气体。光刻设备被构造成使得当基板和支撑平面之间的距离大于阈值距离时，以第一负载流速从间隙中提取气体，并且当第二负载流速从气隙中抽出气体时衬底与支撑面之间的距离小于阈值距离，其中第二负载流速低于第一负载流量。

9. 发明申请

WO2022184366A1 SUBSTRATE RESTRAINING SYSTEM 审中-公开
公开(公告)号：WO2022184366A1
公开(公告)日：2022-09-09
申请号：PCT/EP2022/052542
申请日：2022-02-03
申请人： ASML NETHERLANDS B.V.
发明人： VERSCHUREN, Marinus, Augustinus, Christiaan , POIESZ, Thomas
IPC分类号： G03F7/20 , B23Q3/18
摘要： A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displacable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location.

10. 发明申请

WO2019096554A1 SUBSTRATE HOLDER, SUBSTRATE SUPPORT AND METHOD OF CLAMPING A SUBSTRATE TO A CLAMPING SYSTEM 审中-公开
公开(公告)号：WO2019096554A1
公开(公告)日：2019-05-23
申请号：PCT/EP2018/079185
申请日：2018-10-24
申请人： ASML NETHERLANDS B.V.
发明人： SOETHOUDT, Abraham, Alexander , POIESZ, Thomas
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
摘要： A method of clamping a substrate (W) to a clamping system, the method comprising the steps of: providing a substrate holder (200) comprising; a main body (210) having a first main body surface (212) and a second main body surface (214), wherein the first main body surface and second main body surface are on opposite sides of the main body; and a plurality of first burls (220a, 220b) projecting from the first main body surface, wherein each first burl has a distal end surface configured to support the substrate; providing a support surface (300) for supporting the substrate holder; providing a plurality of second burls (240) for supporting the substrate holder on the support surface through contact with distal end surfaces of the plurality of second burls: generating a first force to attract the substrate holder to the support surface; placing the substrate on the substrate holder such that it contacts the plurality of first burls; generating a second force to attract the substrate to the substrate holder; and controlling at least one of the first force and the second force in a release step to deform the main body between the second burls such as to create a gap (225, 226) between the distal end surfaces of a first subset of the plurality of first burls and the substrate and such that the substrate is supported on distal end surfaces of a second subset of the plurality of first burls.

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