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1. 发明申请

WO2017084870A9 Lithographic Apparatus and Method 审中-公开
公开(公告)号：WO2017084870A9
公开(公告)日：2017-05-26
申请号：PCT/EP2016/076274
申请日：2016-11-01
申请人： ASML NETHERLANDS B.V.
发明人： SMEETS, Benjamin, Cunnegonda, Henricus , BAGGEN, Mark, Constant, Johannes
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the the substrate table or the projection system.

2. 发明申请

WO2016062540A1 SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：支撑台，用于装载基板的方法，平面设备和装置的制造方法
公开(公告)号：WO2016062540A1
公开(公告)日：2016-04-28
申请号：PCT/EP2015/073112
申请日：2015-10-07
申请人： ASML NETHERLANDS B.V.
发明人： TROMP, Siegfried, Alexander , VERWEIJ, Antonie, Hendrik , SOETHOUDT, Abraham, Alexander , VAN DE POEL, Jan, Pieter , BAGGEN, Mark, Constant, Johannes
IPC分类号： G03F7/20 , F16C32/06
CPC分类号： F16C32/0611 , F16C29/025 , F16C32/0607 , G03F7/20 , G03F7/707 , G03F7/708
摘要： There are disclosed a support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table (100) is configured to support a substrate (W). The support table comprises a base surface (101). The base surface faces a bottom surface (103) of the substrate when the substrate is supported by the support table. One or more gas cushion members (102) are provided above the base surface. Each of the gas cushion members comprises a recess (108). The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localised build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
摘要翻译：公开了一种用于光刻设备的支撑台，装载基板的方法，光刻设备以及使用光刻设备制造设备的方法。在一种布置中，支撑台（100）构造成支撑基板（W）。支撑台包括基面（101）。当基板由支撑台支撑时，基部表面面向基板的底表面（103）。一个或多个气垫构件（102）设置在基面的上方。每个气垫构件包括凹部（108）。凹部的形状和构造使得将基底降低到支撑台上的由支撑台支撑基板的位置导致凹陷内的压力的局部积聚。压力的局部积聚提供了在降低衬底期间的局部气体缓冲效应。

3. 发明申请

WO2022063508A1 METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM 审中-公开
公开(公告)号：WO2022063508A1
公开(公告)日：2022-03-31
申请号：PCT/EP2021/073400
申请日：2021-08-24
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： BUTLER, Hans , DEN BOEF, Arie, Jeffrey , BAGGEN, Mark, Constant, Johannes , RAAYMAKERS, Jeroen, Arnoldus, Leonardus, Johannes , ZIMMERMAN, Richard, Carl
IPC分类号： G03F7/20 , G01N21/956
摘要： Described herein is a metrology tool. The metrology tool includes a substrate table (ST) to hold a substrate (S); a projection system (PS) configured to project a beam on a target portion (TP) of the substrate; an actuator (PEA) configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

4. 发明申请

WO2019072504A1 SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2019072504A1
公开(公告)日：2019-04-18
申请号：PCT/EP2018/075293
申请日：2018-09-19
申请人： ASML NETHERLANDS B.V.
发明人： ROSET, Niek, Jacobus, Johannes , VERMEULEN, Marcus, Martinus, Petrus, Adrianus , RAVENSBERGEN, Simon, Karel , BAGGEN, Mark, Constant, Johannes , KRAMER, Gijs , TIMMERMANS, Roger, Anton, Marie , VAN DEN BERKMORTEL, Frank, Pieter, Albert
IPC分类号： G03F7/20 , H01L21/687
摘要： A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

5. 发明申请

WO2017084870A1 Lithographic Apparatus and Method 审中-公开
标题翻译：光刻设备和方法
公开(公告)号：WO2017084870A1
公开(公告)日：2017-05-26
申请号：PCT/EP2016/076274
申请日：2016-11-01
申请人： ASML NETHERLANDS B.V.
发明人： SMEETS, Benjamin, Cunnegonda, Henricus , BAGGEN, Mark, Constant, Johannes
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70241 , G03F7/70341 , G03F7/70858
摘要： A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the the substrate table or the projection system.
摘要翻译：光刻设备包括用于保持衬底的衬底台和用于将辐射束投影到衬底的目标区域上以便在衬底上形成图像的投影系统。投影系统包括具有第一透镜元件的透镜元件布置。第一压力传感器布置成测量邻近第一透镜元件的至少一个压力值。控制器基于从压力传感器接收到的信号来确定第一透镜元件和/或另一透镜元件上的压力差的第一变化，基于确定的衬底台和投影系统之一的位置确定对位置的调整第一次改变，并促使致动器对衬底台或投影系统进行调整。

6. 发明申请

WO2015185320A1 LITHOGRAPHIC APPARATUS 审中-公开
标题翻译： LITHOGRAPHIC设备
公开(公告)号：WO2015185320A1
公开(公告)日：2015-12-10
申请号：PCT/EP2015/060096
申请日：2015-05-07
申请人： ASML NETHERLANDS B.V.
发明人： NAKIBOGLU, Günes , BAGGEN, Mark, Constant, Johannes , BOOGAARD, Gerard, Johannes , COX, Henrikus, Herman, Marie , KEMPER, Nicolaas, Rudolf , KERSSEMAKERS, Sander , RIJS, Robertus, Mathijs, Gerardus , VAN BOXTEL, Frank, Johannes, Jacobus , VAN DEN BOOGAERT, Erwin, Antonius, Henricus, Franciscus , VAN DER WIJST, Marc, Wilhelmus, Maria , VAN DUIJNHOVEN, Martinus , VERDONSCHOT, Jessica, Henrica, Anna
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G10K11/16 , G10K11/168 , G10K11/172
摘要： A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.
摘要翻译：光刻设备具有容纳可移动物体的隔间。可移动物体的运动引起隔室中的声学干扰。声阻尼器布置成阻尼隔室中的声学干扰，并且包括与隔室连通的腔室（100）和多孔板（101），其具有多个通孔（102），位于腔室和隔间。

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