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1. 发明申请

WO2017137129A1 LITHOGRAPHIC APPARATUS, METHOD FOR UNLOADING A SUBSTRATE AND METHOD FOR LOADING A SUBSTRATE 审中-公开
标题翻译：光刻设备，卸载基板的方法和用于加载基板的方法
公开(公告)号：WO2017137129A1
公开(公告)日：2017-08-17
申请号：PCT/EP2016/082484
申请日：2016-12-22
申请人： ASML NETHERLANDS B.V.
发明人： JEUNINK, Andre, Bernardus , MARTENS, Robby, Franciscus, Josephus , DE VOS, Youssef, Karel, Maria , VAN DORST, Ringo, Petrus, Cornelis , TEN BRINKE, Gerhard, Albert , SENDEN, Dirk, Jerome, Andre , BALTIS, Coen, Hubertus, Matheus , GERRITZEN, Justin, Johannes, Hermanus , KAMMINGA, Jelmer, Mattheüs , PACITTI, Evelyn, Wallis , POIESZ, Thomas , SCHEIBERLICH, Arie, Cornelis , SCHOLTEN, Bert, Dirk , SCHREUDER, André , SOETHOUDT, Abraham, Alexander , TROMP, Siegfried, Alexander , VAN DE VIJVER, Yuri, Johannes, Gabriël
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70733 , H01L21/68742
摘要： A method for unloading a substrate from a support table configured to support the substrate, the method comprising: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
摘要翻译：一种用于从支撑所述基板的支撑台卸载基板的方法，所述方法包括：经由多个气流向所述支撑台的基座表面和所述基板之间的间隙供应气体其中在卸载的初始阶段期间，气体通过支撑台的外部区域中的至少一个气体流动开口供应，并且不通过支撑台的中央区域中的任何气体流动开口，外部区域，并且在随后的卸载阶段期间，通过外部区域中的至少一个气体流动开口和中央区域中的至少一个气体流动开口供应气体。

2. 发明申请

WO2021008781A1 SUBSTRATE SHAPE MEASURING DEVICE 审中-公开
公开(公告)号：WO2021008781A1
公开(公告)日：2021-01-21
申请号：PCT/EP2020/065873
申请日：2020-06-08
申请人： ASML NETHERLANDS B.V.
发明人： KRAMER, Gijs , VAN DORST, Ringo, Petrus, Cornelis
IPC分类号： G03F7/20 , G01B11/30 , H01L21/67 , H01L21/687
摘要： The invention provides a substrate shape measuring device (SSM), comprising: a substrate support (WS) to support a substrate (W) having a main surface (MS), said main surface of the substrate when supported by the substrate support substantially extending in a first plane, one or more sensor assemblies (SAS), each comprising a light emitter (LE) to emit light along a light axis (LD) substantially parallel to the first plane and a light sensor (LS) arranged to receive the light, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction (MD1) with respect to the substrate substantially parallel to the first plane and a second measurement direction (MD2) with respect to the substrate substantially parallel to the first plane, and wherein the substrate shape measuring device comprises a processing device (PD) arranged to determine a shape of the substrate.

3. 发明申请

WO2021151682A1 POSITIONING DEVICE 审中-公开
公开(公告)号：WO2021151682A1
公开(公告)日：2021-08-05
申请号：PCT/EP2021/050711
申请日：2021-01-14
申请人： ASML NETHERLANDS B.V.
发明人： DE WIT, Paul, Corné, Henri , VAN DORST, Ringo, Petrus, Cornelis
IPC分类号： G03F7/20
摘要： The invention provides a positioning device, comprising: a first positioning module arranged to support and position a first substrate, a second positioning module arranged to support and position a second substrate, a first positioning field in which the two positioning modules can be alternatingly positioned to carry out a first processing sequence, a second positioning field in which the two positioning modules can be alternatingly positioned to carry out a second processing sequence, wherein when one of the two positioning modules is carrying out or finishing the first processing sequence, the other positioning module has finished the second processing sequence and is positioning closer to the one of the two positioning modules.

4. 发明申请

WO2019206548A1 STAGE APPARATUS, LITHOGRAPHIC APPARATUS, CONTROL UNIT AND METHOD 审中-公开
公开(公告)号：WO2019206548A1
公开(公告)日：2019-10-31
申请号：PCT/EP2019/057672
申请日：2019-03-27
申请人： ASML NETHERLANDS B.V.
发明人： VAN DORST, Ringo, Petrus, Cornelis , KRAMER, Gijs , SMEETS, Benjamin, Cunnegonda, Henricus , FRENCKEN, Mark, Johannes, Hermanus
IPC分类号： G03F7/20 , H01L21/677 , H01L21/68 , H01L21/67 , H01L21/687
摘要： The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.

5. 发明公开

EP3997517A1 SUBSTRATE SHAPE MEASURING DEVICE 审中-实审
公开(公告)号：EP3997517A1
公开(公告)日：2022-05-18
申请号：EP20730652.3
申请日：2020-06-08
申请人： ASML Netherlands B.V.
发明人： KRAMER, Gijs , VAN DORST, Ringo, Petrus, Cornelis
IPC分类号： G03F7/20 , G01B11/30 , H01L21/67 , H01L21/687

6. 发明公开

EP3859448A1 POSITIONING DEVICE AND METHOD TO USE A POSITIONING DEVICE 审中-公开
公开(公告)号：EP3859448A1
公开(公告)日：2021-08-04
申请号：EP20154103.4
申请日：2020-01-28
申请人： ASML Netherlands B.V.
发明人： DE WIT, Paul, Corné, Henri , VAN DORST, Ringo, Petrus, Cornelis
IPC分类号： G03F7/20
摘要： The invention provides a positioning device, comprising: a first positioning module arranged to support and position a first substrate, a second positioning module arranged to support and position a second substrate, a first positioning field in which the first positioning module and the second positioning module can be positioned to cooperate with one or more first processing devices, a second positioning field in which the first positioning module and the second positioning module can be positioned to cooperate with one or more second processing devices, wherein the first positioning field and the second positioning field extend in a positioning plane extending in a first direction and second direction perpendicular to the first direction, wherein the first positioning field and the second positioning field are arranged next to each other in the first direction, and wherein the first positioning module and the second positioning module can swap position in the first direction, wherein, during a position swap, a first side of the first positioning module faces a second side of the second positioning module in the second direction, wherein the first positioning module and the second positioning module each comprise a first unit to carry out a first processing step in the first positioning field and a final unit to carry out a final processing step in the first positioning field, wherein the first unit and the final unit are arranged at the first side of the first positioning module and at the second side of the second positioning module.

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