基本信息:
- 专利标题： 반도체 리소그래피용 공중합체와 조성물, 및 상기 공중합체의 제조 방법
- 专利标题（英）：Copolymer and composition for semiconductor lithography and process for producing the copolymer
- 专利标题（中）：用于半导体层析的共聚物和组合物和用于生产共聚物的方法
- 申请号：KR1020097008252 申请日：2007-10-19
- 公开(公告)号：KR1020090082363A 公开(公告)日：2009-07-30
- 发明人： 오이카와도모 , 오카다다카요시 , 구도마사아키 , 야마기시다카노리
- 申请人： 마루젠 세끼유가가꾸 가부시키가이샤
- 申请人地址： *-*, Irifune *-chome, Chuo-ku, Tokyo, Japan
- 专利权人： 마루젠 세끼유가가꾸 가부시키가이샤
- 当前专利权人： 마루젠 세끼유가가꾸 가부시키가이샤
- 当前专利权人地址： *-*, Irifune *-chome, Chuo-ku, Tokyo, Japan
- 代理人： 특허법인코리아나
- 优先权： JPJP-P-2006-287353 2006-10-23
- 国际申请： PCT/JP2007/001144 2007-10-19
- 国际公布： WO2008050477 2008-05-02
- 主分类号： C08F220/10
- IPC分类号： C08F220/10 ; G03F7/039 ; H01L21/027
摘要：
[PROBLEMS] To provide a chemical amplification type positive copolymer for semiconductor lithography which eliminates a drawback of the prior art, has a high development contrast, and has excellent resolution in fine-pattern formation; a composition for semiconductor lithography which contains the copolymer; and a process for producing the copolymer. [MEANS FOR SOLVING PROBLEMS] The polymer for semiconductor lithography comprises repeating units (A) having a structure which has an alkali-soluble group protected by an acid-diassociable dissolution-inhibitive group, repeating units (B) having a lactone structure, and repeating units (C) having an alcoholic hydroxy group. It is characterized by having an acid value, as determined by dissolving the copolymer in a solvent and subjecting the solution to neutralization titration with a solution of an alkali metal hydroxide using Bromothymol Blue as an indicator, of 0.01 mmol/g or less.
摘要（中）：
为了提供消除现有技术的缺点的半导体光刻的化学放大型正共聚物，具有高显影对比度，并且在精细图案形成中具有优异的分辨率; 含有共聚物的半导体光刻用组合物; 和共聚物的制造方法。 [解决问题的手段]半导体光刻用聚合物包含具有被酸可溶性溶解抑制基团保护的碱溶性基团的结构的重复单元（A），具有内酯结构的重复单元（B），重复 具有醇羟基的单元（C）。 其特征在于具有通过将共聚物溶解在溶剂中并使用溴甲ol蓝作为指示剂的碱金属氢氧化物溶液进行中和滴定测定的酸值为0.01mmol / g以下。
公开/授权文献:
- KR101439571B1 반도체 리소그래피용 공중합체와 조성물, 및 상기 공중합체의 제조 방법 公开/授权日：2014-09-11