A shower head in which a plurality of process gases are mixed with each other to prevent an undesired reaction by-product from being generated is provided. A shower head(100) of a chemical vapor deposition apparatus comprises: an upper plate(103a) connected to first and second process gas supply pipes(121,122); an intermediate plate(103b) which is connected to the bottom of the upper plate through brazing by means of a filler metal(150), wherein the intermediate plate has a first process gas diffusing part(131) formed by connecting the intermediate plate to the upper plate to diffuse a first process gas supplied through the first process gas supply pipe, a plurality of first process gas channels(132) communicating with the first process gas diffusing part, a port(130) which is in communication with the second process gas supply pipe, and in which a second process gas channel(142) is formed, and second process gas diffusing parts(141) formed for diffusing a second process gas delivered through the second process gas channel; and a lower plate(103c) which is connected to the bottom of the intermediate plate through brazing by means of the filler metal, wherein the lower plate has a plurality of first process gas ejection holes(133) communicating with the first process gas channels, and a plurality of second process gas ejection holes(143) communicating with the second process gas diffusing parts.