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    • 3. 发明申请
    • CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
    • WO2023017107A1
    • 2023-02-16
    • PCT/EP2022/072504
    • 2022-08-11
    • ELDICO SCIENTIFIC AG
    • STEINFELD, GuntherNIEBEL, HaraldVAN DEN BERG, ChristiaanVAN VEEN, AlexanderTUOHIMAA, Tomi
    • H01J37/295H01J37/26
    • A charged-particle beam device (1 ) for charged-particle crystallography of a crystalline sample comprises a charged-particle source (4) for generating a charged-particle beam (2) to be radiated onto a sample and a charged-particle- optical system downstream the charged-particle source (4), which is configured to form in a diffraction mode a substantially parallel charged-particle beam (2) at a predefined sample position (9) and in an imaging mode a focused charged- particle beam (2) having a focus at the predefined sample position (9). The charged-particle-optical system comprises a charged-particle zoom lens system (5) consisting of a first magnetic lens (6), a second magnetic lens (7) downstream the first magnetic lens (6) and a third magnetic lens (8) downstream the second magnetic lens (7), wherein at least the second magnetic lens (7), preferably each one of the first (6), the second (7) and the third (8) magnetic lens has a variable focal length. The charged-particle-optical system further comprises a single beam limiting aperture (12) with a fixed aperture diameter arranged at a fixed position between the second magnetic lens (7) and the third magnetic lens (8) for limiting the diameter of the charged-particle beam (2) at the sample position (9). The charged-particle-optical system is configured such that the diameter of the charged-particle beam (2) at the sample position (9) is in a range between 100 nanometer and 1000 nanometer, in particular between 220 nanometer and 250 nanometer, in the diffraction mode, and in a range between 10 nanometer and 200 nanometer in the imaging mode.