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1. 发明申请

WO99038649A1 POLISHING APPARATUS WITH IMPROVED ALIGNMENT OF POLISHING PLATES 审中-公开
标题翻译：抛光装置改进了抛光板的对准
公开(公告)号：WO99038649A1
公开(公告)日：1999-08-05
申请号：PCT/US1999/000840
申请日：1999-01-14
IPC分类号： B24B37/08 , B24B41/047 , B24B45/00 , B24B5/313 , B24B7/08 , B24B7/17
CPC分类号： B24B37/08 , B24B41/047 , B24B45/00
摘要： In a polishing machine for simultaneous double-sided polishing of workpieces (26) between upper polish plate (210) and lower polish table (20), the upper polish table (16) has a hollow center telescopically receiving in a drive hub (180) supported from below. The drive hub (180) is slotted (12) and the upper polish plate has drive latches (200) received in the slots. Lateral dislocations of the upper polish plate with respect to the drive hub are limited by providing stops (330) on the drive latches which engage the outer surface of the drive hub. Additionally, the upper polish plate is suspended by a lifting rod from a double-ended main lifting cylinder (30).
摘要翻译：在用于同时双面抛光上抛光板（210）和下抛光台（20）之间的工件（26）的抛光机中，上抛光台（16）具有可旋转地容纳在驱动毂（180）中的中空中心，从下方支持。驱动轮毂（180）开槽（12），上部抛光板具有容纳在槽中的驱动闩锁（200）。相对于驱动轮毂的上抛光板的侧向位错通过在与驱动毂的外表面接合的驱动闩上提供止动件（330）来限制。此外，上抛光板由提升杆从双端主提升缸（30）悬挂。

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