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    • 9. 发明申请
    • METHOD OF FORMING POLYIMIDE PATTERNS ON SUBSTRATES
    • 在基材上形成聚酰胺模板的方法
    • WO1995010797A1
    • 1995-04-20
    • PCT/US1994008359
    • 1994-07-25
    • OCCIDENTAL CHEMICAL CORPORATIONCHOI, Jin-O
    • OCCIDENTAL CHEMICAL CORPORATION
    • G03F07/038
    • G03F7/0233B41M1/12C09D179/08G03F7/0387H01L21/4867H01L23/49894H01L2924/0002H01L2924/00
    • Disclosed is a method of forming a pattern on a substrate. A first solution is formed of an organic solvent and monomers of diamine and dianhydride. The monomers are polymerized to form a polyamic acid soluble in the organic solvent. About 20 to about 95 % of the amic acid groups in the polyamic acid are imidized to form a partially imidized polyamic acid. A more concentrated solution of the partially imidized polyamic acid is formed. This can be accomplished by precipitating the partially imidized polyamic acid from the first solution and dissolving it in a second organic solvent to form a second solution. The second solution is applied to the substrate and the solvent is evaporated to form the coating of the partially imidized polyamic acid on the substrate. A portion of the coating is removed to form a pattern on the substrate and the remaining partially imidized polyamic acid is fully imidized on the substrate.
    • 公开了在基板上形成图案的方法。 第一溶液由有机溶剂和二胺和二酐的单体形成。 聚合单体以形成可溶于有机溶剂的聚酰胺酸。 将聚酰胺酸中约20至约95%的酰胺酸酰亚胺化以形成部分酰亚胺化的聚酰胺酸。 形成部分酰亚胺化的聚酰胺酸的更浓的溶液。 这可以通过从第一溶液中沉淀部分酰亚胺化的聚酰胺酸并将其溶解在第二有机溶剂中以形成第二溶液来实现。 将第二溶液施加到基底上并蒸发溶剂以形成部分酰亚胺化的聚酰胺酸在基材上的涂层。 去除一部分涂层以在基材上形成图案,并将剩余的部分酰亚胺化的聚酰胺酸完全酰亚胺化在基材上。