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1. 发明申请

WO2005031397A2 CATOPTRIC AND CATADIOPTRIC IMAGING SYSTEMS WITH PELLICLE AND APERTURE-ARRAY BEAM-SPLITTERS AND NON-ADAPTIVE AND ADAPTIVE CATOPTRIC SURFACES 审中-公开
标题翻译：具有光栅和光束阵列光束分离器和非自适应和自适应阴极表面的CATOPTRIC和CATADIOPTRIC成像系统
公开(公告)号：WO2005031397A2
公开(公告)日：2005-04-07
申请号：PCT/US2004/031329
申请日：2004-09-24
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen , HAMANN, Steven , FISCHER, David, A.
发明人： HILL, Henry, Allen , HAMANN, Steven , FISCHER, David, A.
IPC分类号： G02B
CPC分类号： G02B17/086 , G01B9/02007 , G01B9/02014 , G01B9/02022 , G01B9/02056 , G01B9/02068 , G01B9/02079 , G01B2290/70 , G01J1/58 , G01N21/8806 , G01N21/9501 , G02B17/0808 , G02B26/06 , G03F1/84 , G03F7/7085 , G03F9/7088
摘要： An interferometric system including: an interferometer that directs a measurement beam at an object point to produce a return measurement beam, focuses the return measurement beam to an image point in an image plane, and mixes the return measurement beam with a reference beam at the image point to form a mixed beam; a beam combining layer located at the image plane which is responsive to the mixed beam and produces an optical beam therefrom, wherein the layer comprises a thin film with an array of transmissive openings formed therein and further comprises a fluorescent material associated with each of the openings of the array of openings; a detector that is responsive to the optical beam from the beam combining layer; and an imaging system that directs the optical beam from the beam combining layer onto the detector.
摘要翻译：一种干涉测量系统，包括：干涉仪，其将物体点处的测量光束引导以产生返回测量光束，将返回测量光束聚焦到图像平面中的图像点，并将返回测量光束与图像上的参考光束混合指向形成混合梁; 位于图像平面处的光束组合层，其响应于混合光束并从其产生光束，其中该层包括其中形成有透射开口阵列的薄膜，并且还包括与每个开口相关联的荧光材料的开口阵列; 响应于来自光束组合层的光束的检测器; 以及将来自光束组合层的光束引导到检测器上的成像系统。

2. 发明申请

WO2004090466A2 APPARATUS AND METHOD FOR MEASUREMENT OF FIELDS OF BACKSCATTERED AND FORWARD SCATTERED/REFLECTED BEAMS BY AN OBJECT IN INTERFEROMETRY 审中-公开
标题翻译：用于测量干涉仪中的对象的反向扫描和前向散射/反射的区域的装置和方法
公开(公告)号：WO2004090466A2
公开(公告)日：2004-10-21
申请号：PCT/US2004/009984
申请日：2004-04-01
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G01B
CPC分类号： G02B21/0056 , G01B9/02007 , G01B9/02019 , G01B9/02029 , G01B9/0203 , G01B9/02042 , G01B9/02069 , G01B9/02079 , G01J1/58 , G01N21/211 , G02B17/0808 , G03F7/70625
摘要： An interferometry system for making interferometric measurements of an object, the system including a source assembly that generates an input beam; a detector assembly that includes a detector element; and an interferometer that includes a source imaging system that images the input beam onto a spot on or in the object and an object imaging system that images the spot onto the detector element as an interference beam, the object imaging system combining light coming from the spot with a reference beam to produce the interference beam, wherein the source imaging system is characterized by a first aperture stop that defines a first aperture and includes a first phase shifter that introduces a first phase shift in light passing through a first region of the first aperture relative to light passing through a second regino of the first aperture, and wherein the object imaging system is characterized by a second aperture stop that defines a second aperture and includes a second phase shifter that introduces a second phase shift in light passing through a first region of the second aperture relative to light passing through a second region of the second aperture.
摘要翻译：一种用于对物体进行干涉测量的干涉测量系统，所述系统包括产生输入光束的光源组件; 检测器组件，其包括检测器元件; 以及干涉仪，其包括将输入光束成像到物体上或物体上的点上的源成像系统和将斑点作为干涉光束成像到检测器元件上的物体成像系统，该物体成像系统将来自该点的光具有参考光束以产生所述干涉光束，其中所述源成像系统的特征在于限定第一孔径的第一孔径光阑，并且包括第一移相器，所述第一移相器在通过所述第一孔径的第一区域的光中引入第一相移相对于穿过第一孔的第二区域的光，并且其中所述物体成像系统的特征在于限定第二孔的第二孔径光阑，并且包括第二移相器，所述第二移相器在通过第一区域的光中引入第二相移的第二孔相对于穿过第二孔的第二区域的光。

3. 发明申请

WO2004074881A2 METHOD AND APPARATUS FOR DARK FIELD INTERFEROMETRIC CONFOCAL MICROSCOPY 审中-公开
标题翻译：用于暗场干涉微结构显微镜的方法和装置
公开(公告)号：WO2004074881A2
公开(公告)日：2004-09-02
申请号：PCT/US2004/004946
申请日：2004-02-19
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G01B9/04 , G02B21/0024 , G02B21/0056 , G02B27/108 , G02B27/143 , G02B27/144 , G02B27/145
摘要： A differential interferometric confocal microscope for measuring an object, the microscope including: a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spots located in front of an object plane located near where the object is positioned and onto a second array of spots behind the object plane, wherein the first and second arrays of spots are displaced relative to each other in a direction that is normal to the object plane, the interferometer also (1) imaging the first arrays of spots onto a first image plane tha tis behind the detector-side phinhole array, (2) imaging the first array of spots onto a plane defined by the detector-side pihole array, (3) imaging the second array of spots onto a second image plane that is in front of the detector-side pinhole array, and (4) imaging the second array of spots onto the plane defined by the detector-side pinhole array, wherein each spot of the imaged first array of spots in the first image plane is aligned with a corresponding different spot of the imaged second array of spots in the second image plane and a corresponding different pinhole of the detector-side pinhole array, and wherein each spot of the image first array of spots in the plane defined by the detector-side array coincides with a corresponding different spot of the imaged second array of spots in the plane defined by the detector-side array and coincides with a corresponding different pinhole of the detector-side pinhole array.
摘要翻译：用于测量物体的差分干涉式共聚焦显微镜，所述显微镜包括：源极针孔阵列; 检测器侧针孔阵列; 以及干涉仪，其将源侧针孔阵列的针孔阵列成像到位于物体平面附近的物体平面前方的位于第一阵列的位置上，并且位于物平面后面的第二阵列上，其中，第一和第二阵列阵列在垂直于物平面的方向上相对于彼此移位，干涉仪还（1）将第一阵列阵列成像到检测器侧孔阵列后面的第一图像平面上，（2）将第一阵列的斑点成像到由检测器侧针孔阵列限定的平面上，（3）将第二阵列阵列成像到位于检测器侧针孔阵列前面的第二图像平面上，和（4 ）将第二阵列的斑点成像到由检测器侧针孔阵列限定的平面上，其中第一图像平面中成像的第一阵列阵列的每个点与成像的第二阵列的相对应的不同点对齐他的第二图像平面和检测器侧针孔阵列的相应不同的针孔，并且其中由检测器侧阵列限定的平面中的图像的第一阵列点的每个点与被成像的第二阵列的相应的不同点重合由检测器侧阵列限定的平面中的点并且与检测器侧针孔阵列的相应不同的针孔重合。

4. 发明申请

WO2004072695A2 TRANSVERSE DIFFERENTIAL INTERFEROMETRIC CONFOCAL MICROSCOPY 审中-公开
标题翻译：横向差分干涉微结构显微镜
公开(公告)号：WO2004072695A2
公开(公告)日：2004-08-26
申请号：PCT/US2004/004275
申请日：2004-02-13
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G02B21/0056 , G01B9/04 , G02B21/0024 , G02B21/04
摘要： An array of conjugated quadratures of fields is measured interferometrically by a confocal interferometer and detector system wherein each conjugated quadratures comprises a difference of conjugated quadratures of fields of beams scattered/reflected or transmitted by a pair of spots in or on a substrate. The array of conjugated quadratures is measured jointly, i.e ., simultaneously, and the components of each conjugated quadratures may be measured jointly. Each pair of spots generally has a relative displacement on the order of the three or more times the size of the spots in a direction nominally tangent to the surface of the substrate. The relative phases of the beams subsequently scattered/reflected or transmitted by the pair of spots on/in a substrate may be adjusted as a set by control of a single system parameter so that the conjugated quadratures of the array of conjugated quadratures are nominally zero, i.e ., information may be obtained about the substrate with the interferometer and detector system operating in a dark field mode. Operation in a dark field mode leads to both reduced systematic and statistical errors in the information and increased throughput. The information may include the transverse derivative of a profile of one or more surfaces of a substrate; onedimensional, two-dimensional, and three-dimensional transverse differential images of a substrate; critical dimensions of features or artifacts on or in a substrate, and the size and location of sub-wavelength defects in or on a substrate.
摘要翻译：场共轭正交阵列通过共焦干涉仪和检测器系统进行干涉测量，其中每个共轭正交包括由衬底中或衬底上的一对斑点散射/反射或透射的光束的场的共轭正交的差。共轭正交阵列共同测量，即同时测量，并且可以共同测量每个共轭正交的分量。每对点通常在与基板表面正切的方向上的点的尺寸的三次或更多次的量级上具有相对位移。随后通过单个系统参数的控制将随后由衬底上的一对点散射/反射或透射的光束的相对相位调整为一组，使得共轭正交阵列的共轭正交值标称为零，即，可以利用干涉仪和检测器系统在暗场模式下操作来获得关于衬底的信息。在暗场模式下的操作可以减少信息中的系统和统计误差，提高吞吐量。信息可以包括衬底的一个或多个表面的轮廓的横向导数; 衬底的二维，二维和三维横向差分图像; 衬底上或衬底上的特征或伪影的关键尺寸，以及衬底中或衬底上的亚波长缺陷的尺寸和位置。

5. 发明申请

WO2005008334A2 APPARATUS AND METHOD FOR HIGH SPEED SCAN FOR DETECTION AND MEASUREMENT OF PROPERTIES OF SUB-WAVELENGTH DEFECTS AND ARTIFACTS IN SEMICONDUCTOR AND MASK METROLOGY 审中-公开
标题翻译：用于高速扫描的装置和方法用于检测和测量半波长缺陷和半导体和掩蔽方程中的人造物质
公开(公告)号：WO2005008334A2
公开(公告)日：2005-01-27
申请号：PCT/US2004/021780
申请日：2004-07-07
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G03F
CPC分类号： G01N21/9501 , G01N21/4788 , G01N2021/4709 , G01N2021/95676
摘要： A method of detecting defects or artifacts on or in an object, wherein the defects or artifacts are characterized by a characteristic dimension, the method involving: generating an input beam for illuminating a spot at a selected location on or in the object, wherein the spot has a size L that is substantially larger than the characteristic dimension; deriving a measurement beam and a reference beam from the input beam; directing the measurement beam onto the object as an incident measurement beam that illuminates the spot at that selected location on or in the object to produce a backscattered measurement beam; interfering the backscattered measurement beam with the reference beam to produce an interference beam, the reference beam being oriented relative to the backscattered measurement beam so as to produce a peak sensitivity for a portion of the backscattered measurement beam that emanates from the object at a predetermined diffraction angle; converting the interference beam for that selected location into an interference signal; and using the interference signal for that selected location to determine whether any defects or artifacts characterized by said characteristic dimension are present anywhere within a region on or in the object defined by the spot at that selected location.
摘要翻译：一种检测物体上或物体中的缺陷或伪影的方法，其中所述缺陷或伪像由特征尺寸表征，所述方法包括：产生用于照亮所述物体上或物体中的选定位置处的斑点的输入光束，其中所述光点具有基本上大于特征尺寸的尺寸L; 从输入光束导出测量光束和参考光束; 将测量光束作为入射测量光束引导到物体上，该入射测量光束照亮物体上或物体中的该选定位置处的光斑以产生反向散射测量光束; 将背散射测量光束与参考光束干涉以产生干涉光束，参考光束相对于背散射测量光束定向，以便在预定衍射下产生从物体发出的反向散射测量光束的一部分的峰值灵敏度角度; 将所选择的位置的干扰波束转换成干扰信号; 以及使用所选择的位置的干扰信号来确定由所述特征维度表征的任何缺陷或伪影是否存在于由所选位置处的点定义的对象上或之内的区域内的任何地方。

6. 发明申请

WO2004090465A2 APPARATUS AND METHOD FOR JOINT MEASUREMENT OF FIELDS OF SCATTERED/REFLECTED OR TRANSMITTED ORTHOGONALLY POLARIZED BEAMS BY AN OBJECT IN INTERFEROMETRY 审中-公开
标题翻译：通过干涉仪对象进行散射/反射或透射正交偏振光束的场测量的装置和方法
公开(公告)号：WO2004090465A2
公开(公告)日：2004-10-21
申请号：PCT/US2004/010031
申请日：2004-04-01
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G01B
CPC分类号： G01B9/02057 , G01B9/02002 , G01B9/02007 , G01B9/02014 , G01B9/02022 , G01B9/02027 , G01B9/02042 , G01B9/02081 , G01B2290/45 , G01B2290/70 , G03F7/70625
摘要： A method of making interferometric measurements of an object, the method including: generating an input beam that includes a plurality of component beams, each of which is at a different frequency and all of which are spatially coextensive with each other, some of the components beams having a first polarization and the rest having a second polarization that is orthogonal to the first polarization; deriving a plurality of measurement beams from the plurality of component beams, each of the plurality of measurement beams being at the frequency of the component beam from which it is derived; focusing the plurality of measurement beams onto a selected spot to produce a plurality of return measurement beams; combining each of the return measurement beams of the plurality of return measurement beams with a different corresponding reference beam of a plurality of reference beams to produce a plurality of interference beams; and acquiring a plurality of electrical interference signal values for the selected spot from the plurality of interference beams.
摘要翻译：一种对物体进行干涉测量的方法，所述方法包括：产生包括多个分量光束的输入光束，每个分量光束处于不同的频率，并且所有分量光束在空间上相互延伸，部分光束具有第一极化，其余具有与所述第一极化正交的第二极化; 从所述多个分量光束导出多个测量光束，所述多个测量光束中的每一个处于从其导出的分量光束的频率; 将多个测量光束聚焦到所选择的点上以产生多个返回测量光束; 将多个返回测量光束中的每个返回测量光束与多个参考光束的不同对应参考光束组合以产生多个干涉光束; 以及从所述多个干涉光束获取所选择的光点的多个电干扰信号值。

7. 发明申请

WO2004068187A2 APPARATUS AND METHOD FOR JOINT MEASUREMENTS OF CONJUGATED QUADRATURES OF FIELDS OF REFLECTED/SCATTERED AND TRANSMITTED BEAMS BY AN OBJECT IN INTERFEROMETRY 审中-公开
标题翻译：用于干涉测量的对象的反射/散射和透射的区域的相关联的测量的测量装置和方法
公开(公告)号：WO2004068187A2
公开(公告)日：2004-08-12
申请号：PCT/US2004/002166
申请日：2004-01-27
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G01B9/02007 , A45D2008/006 , G01B9/02002 , G01B9/0201 , G01B9/02014 , G01B9/02022 , G01B9/02042 , G01B9/02079 , G01B9/04 , G01B2290/70 , G02B21/0056 , G02B21/14 , G02B27/017 , G02B27/108 , G02B27/126 , G02B27/143 , G02B27/144 , G02B27/145
摘要： An interferometery system for making interferometric measurements of an object, the system including: a beam generation module which during operation delivers an output beam that includes a first beam at a first frequency and a second beam at a second frequency that is different from the first frequency, the first and second beams within the output beam being coextensive, the beam generation module including a beam conditioner which during operation introduces a sequence of different shifts in a selected parameter of each of the first and second beams, the selected parameter selected from a group consisting of phase and frequency; a detector assembly having a detector element; and an interferometer constructed to receive the output beam at least a part of which represents a first measurement beam at the first frequency and a second measurement beam at the second frequency, the interferometer further constructed to image both the first and second measurement beams onto a selected spot on the object to produce therefrom corresponding first and second return measurement beams, and to then simultaneously image the first and second return measurement beams onto said detector element.
摘要翻译：一种用于对物体进行干涉测量的干涉仪系统，所述系统包括：光束产生模块，其在操作期间传送包括第一频率的第一光束和不同于第一频率的第二频率的第二光束的输出光束输出光束内的第一和第二光束共同延伸，光束产生模块包括光束调节器，其在操作期间引入第一和第二光束中的每一个的选定参数中的不同偏移序列，所选参数选自组由相位和频率组成; 具有检测器元件的检测器组件; 以及干涉仪，其被构造为接收输出光束，所述输出光束的至少一部分表示第一频率处的第一测量光束和在第二频率处的第二测量光束，所述干涉仪还被构造成将所述第一和第二测量光束成像到所选择的对象上产生相应的第一和第二返回测量光束，然后同时将第一和第二返回测量光束成像到所述检测器元件上。

8. 发明申请

WO2005033747A2 METHOD AND APPARATUS FOR ENHANCED RESOLUTION OF HIGH SPATIAL FREQUENCY COMPONENTS OF IMAGES USING STANDING WAVE BEAMS IN NON-INTERFEROMETRIC AND INTERFEROMETRIC MICROSCOPY 审中-公开
标题翻译：使用非平均和非均匀微观显微镜中的标准波段的图像高空间频率分量的增强分辨率的方法和装置
公开(公告)号：WO2005033747A2
公开(公告)日：2005-04-14
申请号：PCT/US2004/032023
申请日：2004-09-30
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G01B9/02022 , G01B9/02003 , G01B9/02024 , G01B2290/70 , G02B21/14
摘要： A method of measuring properties of a substrate, the method involving: illuminating a spot on the substrate with a standing wave measurement beam to generate a return measurement beam, the standing wave measurement beam characterized by a standing wave pattern; generating an electrical signal from the return measurement beam; causing the standing wave pattern to be at a succession of different positions on the surface of the substrate; and for each of the succession of different positions of the standing wave pattern, acquiring measurement data from the electrical signal.
摘要翻译：一种测量基板特性的方法，所述方法包括：用驻波测量光束照射所述基板上的点以产生返回测量光束，所述驻波测量光束以驻波图案为特征; 从返回测量光束产生电信号; 使驻波图案在基板的表面上处于不同位置的连续位置; 并且对于驻波图案的不同位置的连续中的每一个，从电信号获取测量数据。

9. 发明申请

WO2004090582A2 METHOD FOR CONSTRUCTING A CATADIOPTRIC LENS SYSTEM 审中-公开
标题翻译：用于构造阴离子透镜系统的方法
公开(公告)号：WO2004090582A2
公开(公告)日：2004-10-21
申请号：PCT/US2004/009968
申请日：2004-04-01
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G02B21/0056 , G02B21/0024
摘要： A method of fabricating a catadioptric lens system, the method involving: fabricating a single catadioptric lens element having a bottom surface and an upper surface, the upper surface having a convex portion and a concave portion, both the convex and concave portions sharing a common axis of symmetry; cutting apart the catadioptric lens element to form 2n pie-shaped segments, wherein n is an integer; and reassembling the 2n pie-shaped segments to form the catadioptric lens system with n of the 2n pie-shaped segments being located above a common plane and the rest of the 2n pie-shaped elements being below the common plane.
摘要翻译：一种制造反射折射透镜系统的方法，所述方法包括：制造具有底表面和上表面的单个反射折射透镜元件，所述上表面具有凸部和凹部，所述凸部和凹部均具有公共轴线的对称性切割反射折射透镜元件以形成2n个饼形片段，其中n为整数; 并且重新组装2n个饼状部分以形成反射折射透镜系统，其中2n个饼状部分中的n个位于公共平面之上，其余的2n个饼状部分位于公共平面之下。

10. 发明申请

WO2004074880A2 LONGITUDINAL DIFFERENTIAL INTERFEROMETRIC CONFOCAL MICROSCOPY 审中-公开
标题翻译：长期差异性干涉微结构显微镜
公开(公告)号：WO2004074880A2
公开(公告)日：2004-09-02
申请号：PCT/US2004/004945
申请日：2004-02-19
申请人： ZETETIC INSTITUTE , HILL, Henry, Allen
发明人： HILL, Henry, Allen
IPC分类号： G02B
CPC分类号： G01B9/04 , G02B21/0024 , G02B21/0056 , G02B27/108 , G02B27/143 , G02B27/144 , G02B27/145
摘要： A differential interferometric confocal microscope for measuring an object, the microscope including a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spots located in front of an object plane located near where the object is positioned and onto a second array of spots behind the object plane, wherein the first and second arrays of spots are displaced form each othe in both a direction normal to the object plane and a direction parallel to the object plane, the interferometer also imaging the first arrays of spots onto a first image plane that is behind the detector-side pinhole array and imaging the seonc array of spots onto a second image plane that is in front of the detector-side pinhole array wherein each spot of the imaged first array of spots is aligned with a corresponding different spot of the imaged second array of spots and a corresponding different pinhole of the detector-side pinhole array.
摘要翻译：用于测量物体的差分干涉式共焦显微镜，显微镜包括源极针孔阵列; 检测器侧针孔阵列; 以及干涉仪，其将源侧针孔阵列的针孔阵列成像到位于物体平面附近的物体平面前方的位于第一阵列的位置上，并且位于物平面后面的第二阵列上，其中，第一和第二阵列阵列在垂直于物平面的方向和平行于物平面的方向上均移位，干涉仪还将第一阵列阵列成像到检测器侧后面的第一图像平面上针孔阵列并将斑点阵列成像到位于检测器侧针孔阵列前面的第二图像平面上，其中成像的第一阵列阵列的每个点与成像的第二阵列阵列的相应不同点对准，以及检测器侧针孔阵列的相应不同针孔。

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