专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2013095811A1 FIXED MASK DESIGN FOR IMPROVING ALIGNMENT WITH RESPECT TO AN ION BEAM 审中-公开
标题翻译：固定掩模设计，用于改善与离子束相对的对准
公开(公告)号：WO2013095811A1
公开(公告)日：2013-06-27
申请号：PCT/US2012/065027
申请日：2012-11-14
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , GAMMEL, George, M. , RIORDON, Benjamin, B.
发明人： GAMMEL, George, M. , RIORDON, Benjamin, B.
IPC分类号： H01J37/317 , H01L21/266
CPC分类号： H01J37/20 , H01J37/3045 , H01J37/3171 , H01J2237/24405 , H01J2237/24507 , H01J2237/24528 , H01J2237/31711 , H01L21/266 , H01L31/18 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A mask (200) is disclosed in which outward projections are placed on either side of at least one aperture (201). An ion beam (10) is then directed through the mask toward a workpiece (114). An ion collecting device or an optical system is then used to measure the alignment of the mask to the ion beam. These projections serve to increase the sensitivity of the system to misalignment. In another embodiment, a blocker is used to create a region of the workpiece after a patterned implant that is not subjected to a blanket implant. This facilitates the use of optical means to determine a location of said implanted region and to insure alignment of the mask to the ion beam.
摘要翻译：公开了一种掩模（200），其中向外的突起被放置在至少一个孔（201）的任一侧上。离子束（10）然后通过掩模朝向工件（114）引导。然后使用离子收集装置或光学系统来测量掩模与离子束的对准。这些投影用于提高系统对准偏差的灵敏度。在另一个实施方案中，阻挡剂用于在不经受橡皮布植入的图案化植入物之后产生工件的区域。这有利于使用光学装置来确定所述注入区域的位置并确保掩模与离子束的对准。

2. 发明申请

WO2013055627A1 METHOD OF CREATING TWO DIMENSIONAL DOPING PATTERNS IN SOLAR CELLS 审中-公开
标题翻译：在太阳能电池中制造两维DOPING图案的方法
公开(公告)号：WO2013055627A1
公开(公告)日：2013-04-18
申请号：PCT/US2012/059238
申请日：2012-10-08
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , GRAFF, John, W. , RIORDON, Benjamin, B. , BATEMAN, Nicholas, P.T. , OLSON, Joseph, C.
发明人： GRAFF, John, W. , RIORDON, Benjamin, B. , BATEMAN, Nicholas, P.T. , OLSON, Joseph, C.
IPC分类号： H01L31/18 , H01L31/0224 , H01L31/068 , H01J37/317 , H01L21/266
CPC分类号： H01L31/0682 , H01J2237/31711 , H01L21/266 , H01L31/022441 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of fabricating an interdigitated back contact (IBC) solar cell is disclosed. A first mask is used to perform a patterned ion implantation of n-type dopant to create the back surface field. A second mask is then used to create the p-type emitter on the same surface. The second mask may be aligned to the n-type implant, and may be used in a plurality of orientations to create the desired p-type emitter. In some embodiments, a p-type blanket implant is performed as well. In some embodiments, a doping gradient is created.
摘要翻译：公开了一种制造交错背接触（IBC）太阳能电池的改进方法。使用第一掩模来执行n型掺杂剂的图案化离子注入以产生背表面场。然后使用第二个掩模在相同的表面上创建p型发射器。第二掩模可以对准n型植入物，并且可以以多个取向使用以产生所需的p型发射体。在一些实施例中，还执行p型覆盖植入。在一些实施例中，产生掺杂梯度。

3. 发明申请

WO2012096961A1 SUBSTRATE IDENTIFICATION AND TRACKING THROUGH SURFACE REFLECTANCE 审中-公开
标题翻译：通过表面反射识别和跟踪基板
公开(公告)号：WO2012096961A1
公开(公告)日：2012-07-19
申请号：PCT/US2012/020783
申请日：2012-01-10
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , RIORDON, Benjamin, B. , LOW, Russell, J.
发明人： RIORDON, Benjamin, B. , LOW, Russell, J.
IPC分类号： G06K9/00 , H01L31/18 , H04N7/32
CPC分类号： H01L31/0682 , G06K9/00577 , H01L31/1876 , Y02E10/547 , Y02P70/521
摘要： A method of identifying Individual silicon substrates, and particularly solar cells, is disclosed. Every solar cell possesses a unique set of optical properties. The method identifies these properties and stores them in a database, where they can be associated to a particular solar cell. Unlike conventional tracking techniques, the present method requires no dedicated space on the surface of the silicon substrate. This method allows substrates to be tracked through the manufacturing process, as well as throughout the life of the substrate.
摘要翻译：公开了一种识别单个硅衬底，特别是太阳能电池的方法。每个太阳能电池都具有独特的光学特性。该方法识别这些属性并将其存储在数据库中，并将其与特定的太阳能电池相关联。与传统跟踪技术不同，本方法不需要硅衬底表面上的专用空间。该方法允许通过制造过程以及在基板的整个寿命期间跟踪基板。

4. 发明申请

WO2010135661A1 TECHNIQUES FOR PROCESSING A SUBSTRATE 审中-公开
标题翻译：加工基材的技术
公开(公告)号：WO2010135661A1
公开(公告)日：2010-11-25
申请号：PCT/US2010/035799
申请日：2010-05-21
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , RIORDON, Benjamin, B. , DANIELS, Kevin, M. , WEAVER, William, T. , ANELLA, Steven, M.
发明人： RIORDON, Benjamin, B. , DANIELS, Kevin, M. , WEAVER, William, T. , ANELLA, Steven, M.
IPC分类号： G21K5/00
CPC分类号： H01J37/3171 , H01J37/20 , H01J37/3045 , H01J2237/20235 , H01J2237/31711 , H01L31/022425 , H01L31/0288 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized with a system for processing one or more substrates. The system may comprise an ion source for generating ions of desired species, the ions generated from the ion source being directed toward the one or more substrates along an ion beam path; a substrate support for supporting the one or more substrates; a mask disposed between the ion source and the substrate support, the mask comprising a finger defining one or more apertures through which a portion of the ions traveling along the ion beam path pass; and a first detector for detecting ions, the first detector being fixedly positioned relative to the one or more substrates.
摘要翻译：本文中公开了一种用于处理衬底的改进技术。在一个特定的示例性实施例中，该技术可以用用于处理一个或多个基板的系统来实现。该系统可以包括用于产生所需物质的离子的离子源，从离子源产生的离子沿离子束路指向一个或多个衬底; 用于支撑所述一个或多个基板的基板支撑件; 设置在所述离子源和所述衬底支撑件之间的掩模，所述掩模包括限定一个或多个孔的手指，所述离子沿所述离子束路径行进的一部分穿过所述孔; 以及用于检测离子的第一检测器，所述第一检测器相对于所述一个或多个基板固定地定位。

5. 发明申请

WO2011163488A1 THERMAL CONTROL OF A PROXIMITY MASK AND WAFER DURING ION IMPLANTATION 审中-公开
标题翻译：在离子植入过程中临时掩蔽和水分的热控制
公开(公告)号：WO2011163488A1
公开(公告)日：2011-12-29
申请号：PCT/US2011/041650
申请日：2011-06-23
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , RIORDON, Benjamin, B. , ANELLA, Steven, M.
发明人： RIORDON, Benjamin, B. , ANELLA, Steven, M.
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J2237/002 , H01J2237/2001 , H01J2237/31711
摘要： An improved method of processing substrates, such as to create solar cells, is disclosed. The use of shadow masks may cause alignment errors associated with the differing thermal expansion characteristics of the shadow mask and the substrate. To counteract this error, mechanisms are used to insure that the thermal expansion of the shadow mask and the substrate are equal or substantially equal. In some embodiments, the shadow mask is produced with a type and quantity of material so that its thermal expansion matches that of the substrate. In other embodiments, heating and cooling mechanisms are applied to the shadow mask so that its thermal expansion matches that of the substrate. In other embodiments, heating and cooling mechanisms are applied to the substrate so that its thermal expansion matches that of the shadow mask. Furthermore, both the mask and substrate can be heated and/or cooled simultaneously.
摘要翻译：公开了一种改进的处理衬底的方法，例如制造太阳能电池。阴影掩模的使用可能导致与荫罩和基板的不同热膨胀特性相关联的对准误差。为了抵消该误差，使用机构来确保荫罩和基板的热膨胀相等或基本相等。在一些实施例中，荫罩是用类型和数量的材料制造的，使得它的热膨胀与衬底的热膨胀相匹配。在其他实施例中，将加热和冷却机构施加到荫罩，使得其热膨胀与基板的热膨胀匹配。在其他实施例中，将加热和冷却机构施加到基板上，使得其热膨胀与荫罩的热膨胀相匹配。此外，掩模和基底可以同时加热和/或冷却。

6. 发明申请

WO2011056786A1 SELF-ALIGNED MASKING FOR SOLAR CELL MANUFACTURE 审中-公开
标题翻译：用于太阳能电池制造的自对准掩模
公开(公告)号：WO2011056786A1
公开(公告)日：2011-05-12
申请号：PCT/US2010/055105
申请日：2010-11-02
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , BATEMAN, Nicholas, P.T. , MAYNARD, Helen, L. , RIORDON, Benjamin, B. , HATEM, Christopher, R. , RAMAPPA, Deepak
发明人： BATEMAN, Nicholas, P.T. , MAYNARD, Helen, L. , RIORDON, Benjamin, B. , HATEM, Christopher, R. , RAMAPPA, Deepak
IPC分类号： H01L21/266 , H01L31/18
CPC分类号： H01L31/0682 , H01L21/266 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： Various methods of utilizing the physical and chemical properly differences between amorphized and crystalline silicon are used to create masks that can be used for subsequent implants, in some embodiments, the difference in film growth between amorphous and crystalline silicon is used to create the mask, in other embodiments, the difference in reflectivity or light absorption between amorphous and crystalline silicon is used to create the mask, in other embodiments, differences in the characteristics of doped and undoped silicon is used to create masks.
摘要翻译：使用在非晶化和晶体硅之间利用物理和化学适当差异的各种方法来产生可用于后续种植体的掩模，在一些实施方案中，使用无定形和晶体硅之间的膜生长差异来产生掩模在其它实施例中，使用非晶和晶体硅之间的反射率或光吸收的差异来产生掩模，在其它实施例中，掺杂和未掺杂的硅的特性的差异用于产生掩模。

7. 发明申请

WO2011049950A1 STEPPED MASKING FOR PATTERNED IMPLANTATION 审中-公开
标题翻译：用于模式植入的步进掩模
公开(公告)号：WO2011049950A1
公开(公告)日：2011-04-28
申请号：PCT/US2010/053204
申请日：2010-10-19
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , RIORDON, Benjamin, B. , BATEMAN, Nicholas, P.T. , CARLSON, Charles, T.
发明人： RIORDON, Benjamin, B. , BATEMAN, Nicholas, P.T. , CARLSON, Charles, T.
IPC分类号： H01L21/266
CPC分类号： H01L21/266 , H01J37/3172 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of moving a mask to perform a pattern implant of as substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.
摘要翻译：公开了一种移动掩模以执行作为衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。在将衬底暴露于离子束之后，掩模相对于衬底被索引到新位置，并且执行随后的注入步骤。通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。在一些实施例中，植入模式包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域的格栅。在其他实施例中，植入图案适用于汇流条结构。

8. 发明申请

WO2013006433A3 USE OF ION BEAM TAILS TO MANUFACTURE A WORKPIECE 审中-公开
公开(公告)号：WO2013006433A3
公开(公告)日：2013-01-10
申请号：PCT/US2012/044922
申请日：2012-06-29
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , BATEMAN, Nicholas, P.T. , KURUNCZI, Peter, F. , RIORDON, Benjamin, B. , GRAFF, John, W.
发明人： BATEMAN, Nicholas, P.T. , KURUNCZI, Peter, F. , RIORDON, Benjamin, B. , GRAFF, John, W.
IPC分类号： H01L31/18 , H01L31/0224 , H01L31/068 , H01J37/317 , H01L21/265 , H01L21/266
摘要： One method of implanting a workpiece involves implanting the workpiece with an n-type dopant in a first region with center and a periphery. The workpiece also is implanted with a p-type dopant in a second region complementary to the first region. This second region also has a center and a periphery. The periphery of the first region and the periphery of the second region at least partially overlap. A dose at the periphery of the first region or second region is less than a dose at the center of the first region or second region. The region of overlap may function as a junction where charge carriers cannot pass.

9. 发明申请

WO2013003282A2 USE OF A SHADOW MASK AND A SOFT MASK FOR ALIGNED IMPLANTS IN SOLAR CELLS 审中-公开
标题翻译：在阴极细胞中使用阴影掩模和对准的植入物的软掩模
公开(公告)号：WO2013003282A2
公开(公告)日：2013-01-03
申请号：PCT/US2012/044025
申请日：2012-06-25
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , BATEMAN, Nicholas, P.T. , RIORDON, Benjamin, B. , GUPTA, Atul
发明人： BATEMAN, Nicholas, P.T. , RIORDON, Benjamin, B. , GUPTA, Atul
IPC分类号： H01L31/0224
CPC分类号： H01L21/266 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of implanting a solar cell is disclosed. Λ substrate is coated with a soft mask material. A shadow mask is used to perform a pattern ion implant and to set the soft mask material. After the soft mask material is set, the mask is removed and a blanket implant is performed.
摘要翻译：公开了一种改进的植入太阳能电池的方法。？用软掩模材料涂覆基材。阴影掩模用于执行图案离子注入并设置软掩模材料。在软掩模材料被设置之后，去除掩模并执行覆盖植入。

10. 发明申请

WO2011019828A2 MASKED ION IMPLANT WITH FAST-SLOW SCAN 审中-公开
标题翻译：带快速慢扫描的离子植入物
公开(公告)号：WO2011019828A2
公开(公告)日：2011-02-17
申请号：PCT/US2010/045186
申请日：2010-08-11
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , BATEMAN, Nicholas, P.T. , ANELLA, Steven, M. , RIORDON, Benjamin, B. , GUPTA, Atul
发明人： BATEMAN, Nicholas, P.T. , ANELLA, Steven, M. , RIORDON, Benjamin, B. , GUPTA, Atul
IPC分类号： H01L31/18
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/31711 , H01L21/266 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rale and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This aϋows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
摘要翻译：制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。离子束被引导通过掩模中的多个孔朝向衬底。衬底以不同的速度移动，使得当衬底以第二扫描速率移动时，当衬底以第一扫描范围移动时，衬底暴露于离子剂量率，而衬底被移动到第二离子剂量率。通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。这是一种用于提供有利于制造太阳能电池的精确掺杂分布的离子注入。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式