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1. 发明申请

WO2013095811A1 FIXED MASK DESIGN FOR IMPROVING ALIGNMENT WITH RESPECT TO AN ION BEAM 审中-公开
标题翻译：固定掩模设计，用于改善与离子束相对的对准
公开(公告)号：WO2013095811A1
公开(公告)日：2013-06-27
申请号：PCT/US2012/065027
申请日：2012-11-14
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , GAMMEL, George, M. , RIORDON, Benjamin, B.
发明人： GAMMEL, George, M. , RIORDON, Benjamin, B.
IPC分类号： H01J37/317 , H01L21/266
CPC分类号： H01J37/20 , H01J37/3045 , H01J37/3171 , H01J2237/24405 , H01J2237/24507 , H01J2237/24528 , H01J2237/31711 , H01L21/266 , H01L31/18 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A mask (200) is disclosed in which outward projections are placed on either side of at least one aperture (201). An ion beam (10) is then directed through the mask toward a workpiece (114). An ion collecting device or an optical system is then used to measure the alignment of the mask to the ion beam. These projections serve to increase the sensitivity of the system to misalignment. In another embodiment, a blocker is used to create a region of the workpiece after a patterned implant that is not subjected to a blanket implant. This facilitates the use of optical means to determine a location of said implanted region and to insure alignment of the mask to the ion beam.
摘要翻译：公开了一种掩模（200），其中向外的突起被放置在至少一个孔（201）的任一侧上。离子束（10）然后通过掩模朝向工件（114）引导。然后使用离子收集装置或光学系统来测量掩模与离子束的对准。这些投影用于提高系统对准偏差的灵敏度。在另一个实施方案中，阻挡剂用于在不经受橡皮布植入的图案化植入物之后产生工件的区域。这有利于使用光学装置来确定所述注入区域的位置并确保掩模与离子束的对准。

2. 发明申请

WO2013080111A1 MEDICAL IMAGING SYSTEM AND METHOD FOR PROVIDING AN X-RAY IMAGE 审中-公开
标题翻译：医学成像系统和提供X射线图像的方法
公开(公告)号：WO2013080111A1
公开(公告)日：2013-06-06
申请号：PCT/IB2012/056716
申请日：2012-11-26
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH
发明人： KURZE, Christoph
IPC分类号： A61B6/00
CPC分类号： A61B6/587 , A61B6/0492 , A61B6/08 , A61B6/4405 , A61B6/4411 , A61B6/4452 , A61B6/4464 , A61B6/461 , A61B6/547 , A61B6/585 , A61B6/588 , A61N5/1049 , A61N2005/105 , A61N2005/1051 , G02B7/005 , G02B27/64 , H01J37/22 , H01J2237/1501 , H01J2237/20292 , H01J2237/24528 , H01J2237/2482 , H04B10/22
摘要： An X-ray imaging system comprises an X-ray tube (6), a ceiling suspension (2) for the X-ray tube, a detector trolley (12) with an X-ray detector (10) mounted thereon, an active sensor matrix (24), an optical indication unit (20) and a control unit (26). The active sensor matrix (24) is fixedly mounted on the ceiling suspension (2), the optical indication unit (20) is fixedly mounted to the detector trolley (12) and is adapted for emitting an optical indication (22) onto the active sensor matrix (24). The control unit (26) is connected to the active sensor matrix (24) and is adapted for acquiring the position of the optical indication (22) on the active sensor matrix (24) and to create control signals for aligning the detector trolley position and the ceiling suspension position relative to each other such that the optical indication is present on a predetermined spot on the active sensor matrix. This eliminates the need of a mechanically fixed arm carrying a detector unit at a fixed spatial relationship to an X-ray arm as the detector and the X-ray tube are be linked by a position following process.
摘要翻译： X射线成像系统包括X射线管（6），用于X射线管的天花板悬挂（2），安装有X射线检测器（10）的检测器手推车（12），主动传感器矩阵（24），光学指示单元（20）和控制单元（26）。有源传感器矩阵（24）固定地安装在天花板悬架（2）上，光学指示单元（20）固定地安装到检测器手推车（12）上，并且适于将光学指示（22）发射到主动传感器矩阵（24）。控制单元（26）连接到主动传感器矩阵（24），并且适于获取有源传感器矩阵（24）上的光学指示（22）的位置，并且产生用于使检测器台车位置和天花板悬挂位置相对于彼此使得光学指示存在于有源传感器矩阵上的预定点上。这样当检测器和X射线管通过位置跟随过程连接时，这消除了将机械固定的臂承载与X射线臂固定的空间关系的检测器单元的需要。

3. 发明申请

WO2012096959A1 TECHNIQUE AND APPARATUS FOR MONITORING ION MASS, ENERGY, AND ANGLE IN PROCESSING SYSTEMS 审中-公开
标题翻译：用于监控处理系统中离子质量，能量和角度的技术和装置
公开(公告)号：WO2012096959A1
公开(公告)日：2012-07-19
申请号：PCT/US2012/020780
申请日：2012-01-10
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , GODET, Ludovic , LEAVITT, Christopher, J. , KOO, Bon, Woong , RENAU, Anthony
发明人： GODET, Ludovic , LEAVITT, Christopher, J. , KOO, Bon, Woong , RENAU, Anthony
IPC分类号： H01J49/40 , H01J49/04 , H01J37/32
CPC分类号： H01J49/40 , H01J37/244 , H01J37/3171 , H01J37/32935 , H01J49/04 , H01J2237/24528 , H01J2237/24542
摘要： A time-of-flight (TOF) ion sensor system for monitoring an angular distribution of ion species having an ion energy and incident on a substrate includes a drift tube wherein the ion sensor system is configured to vary an angle of the drift tube with respect to a plane of the substrate. The drift tube may have a first end configured to receive a pulse of ions from ion species where in heavier ions and lighter ions of the pulse of ions arrive in packets at a second end of the drift tube. An ion detector may be disposed at the second end of the ion sensor, wherein the ion detector is configured to detect the packets of ions derived from the pulse of ions and corresponding to respective different ion masses.
摘要翻译：用于监测具有离子能并入射在衬底上的离子种的角度分布的飞行时间（TOF）离子传感器系统包括漂移管，其中离子传感器系统被配置为相对于漂移管的角度改变到基板的平面。漂移管可以具有被配置为从离子物质接收离子脉冲的第一端，其中离子脉冲的重离子和离子脉冲的较轻离子在漂移管的第二端处分组到达。离子检测器可以设置在离子传感器的第二端处，其中离子检测器被配置为检测源自离子脉冲的离子的分组并且对应于各个不同的离子质量。

4. 发明申请

WO2010011252A1 METHOD AND APPARATUS FOR MEASUREMENT OF BEAM ANGLE IN ION IMPLANTATION 审中-公开
标题翻译：用于测量离子植入中的光束角的方法和装置
公开(公告)号：WO2010011252A1
公开(公告)日：2010-01-28
申请号：PCT/US2009/003743
申请日：2009-06-23
申请人： AXCELIS TECHNOLOGIES, INC. , MITCHELL, Robert , VANDERBERG, Bo
发明人： MITCHELL, Robert , VANDERBERG, Bo
IPC分类号： H01J37/317 , H01J37/147 , H01J37/304
CPC分类号： H01J37/1471 , H01J37/304 , H01J37/3171 , H01J2237/24507 , H01J2237/24528 , H01J2237/24578
摘要： An ion beam angle detection apparatus (440), comprising a linear drive assembly (460) fixedly attached to a moveable profiler assembly (450), wherein the profiler assembly comprises, a profiler having a profiler aperture (454) formed within a profiler top plate (455) and a profiler sensor assembly, a moveable angle mask assembly (446) comprising a moveable angle mask with a mask aperture (448), wherein the angle mask assembly is non-fixedly attached to the profiler assembly, the mask aperture is movable relative to the profiler aperture by energizing an mask linear drive (464) fixedly attached to the profiler assembly and the profiler aperture is movable through a length greater than the elongated length of the ion beam (456).
摘要翻译：一种离子束角度检测装置（440），其包括固定地连接到可移动轮廓仪组件（450）的线性驱动组件（460），其中所述轮廓仪组件包括：轮廓仪，其具有形成在轮廓仪顶板内的轮廓仪孔（455）和轮廓仪传感器组件，可移动角度掩模组件（446），其包括具有掩模孔（448）的可移动角度掩模，其中所述角度掩模组件不固定地附接到所述轮廓仪组件，所述掩模孔可移动相对于轮廓仪孔径，通过激励固定地附接到轮廓仪组件的掩模线性驱动器（464），并且轮廓仪孔径可移动通过大于离子束（456）的细长长度的长度。

5. 发明申请

WO2009099922A3 AN APPARATUS FOR HANDLING A SUBSTRATE AND A METHOD THEREOF 审中-公开
标题翻译：一种处理基板的装置及其方法
公开(公告)号：WO2009099922A3
公开(公告)日：2009-11-05
申请号：PCT/US2009032556
申请日：2009-01-30
申请人： VARIAN SEMICONDUCTOR EQUIPMENT , HOLDEN SCOTT C
发明人： HOLDEN SCOTT C
IPC分类号： H01L21/67 , H01L21/265 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67259 , H01J37/20 , H01J37/3171 , H01J37/32743 , H01J2237/20207 , H01J2237/20292 , H01J2237/204 , H01J2237/24528 , H01J2237/2482 , H01L21/68742
摘要： An apparatus and method of handling substrates is disclosed. A detecting system, capable of determining whether a substrate is tilted in. relation to the platen, is positioned proximate to the substrate. In some embodiments, the detecting system is a distance measuring system. In other embodiments, it is an angle sensor. The detecting system is in communication with a controller, which, in turn, is in communication with a substrate handling robot. If, based on information received from the detecting system, the controller determines that the substrate is tilted beyond an acceptable range, it is assumed that the substrate has remained attached to the platen. In such a case, the substrate handling robot does not attempt to remove it from the platen. In this way, the substrate is not damaged.
摘要翻译：公开了一种处理基材的设备和方法。能够确定衬底是否相对于台板倾斜的检测系统位于衬底附近。在一些实施例中，检测系统是距离测量系统。在其他实施例中，它是角度传感器。检测系统与控制器通信，控制器又与基板处理机器人通信。如果基于从检测系统接收到的信息，控制器确定衬底倾斜超出可接受的范围，则假定衬底保持附接至台板。在这种情况下，基板处理机器人不会尝试将其从压板上移除。这样，基材不会被损坏。

6. 发明申请

WO2008042094A2 NEW AND IMPROVED BEAM LINE ARCHITECTURE FOR ION IMPLANTER 审中-公开
标题翻译：用于离子植入物的新的和改进的束线结构
公开(公告)号：WO2008042094A2
公开(公告)日：2008-04-10
申请号：PCT/US2007019904
申请日：2007-09-13
申请人： AXCELIS TECH INC , VANDERBERG BO , SPLINTER PATRICK
发明人： VANDERBERG BO , SPLINTER PATRICK
IPC分类号： H01J37/147 , H01J37/317
CPC分类号： H01J37/1471 , H01J37/04 , H01J37/304 , H01J37/3171 , H01J2237/0475 , H01J2237/055 , H01J2237/1501 , H01J2237/152 , H01J2237/24507 , H01J2237/24528 , H01J2237/3045 , H01J2237/31703
摘要： A parallelizing component of an ion implantation system comprises two angled dipole magnets that mirror one another and serve to bend an ion beam traversing therethrough to have a substantially "s" shape. This s bend serves to filter out contaminants of the beam, while the dipoles also parallelize the beam to facilitate uniform implant properties across the wafer, such as implant angle, for example. Additionally, a deceleration stage is included toward the end of the implantation system so that the energy of the beam can be kept relatively high throughout the beamline to mitigate beam blowup.
摘要翻译：离子注入系统的平行化部件包括两个成角度的偶极子磁体，其彼此相互反射并用于弯曲横穿其中的离子束以具有基本上“s”的形状。该弯曲用于滤除光束的污染物，而偶极子也使光束平行化，以促进跨晶片的均匀植入性能，例如植入角度。此外，朝向植入系统的端部包括减速阶段，使得束的能量可以在整个束线中保持相对较高以减轻束的膨胀。

7. 发明申请

WO2008001685A1 イオン注入装置およびイオンビームの偏差角補正方法审中-公开
标题翻译：离子植入装置和离子束偏转角校正方法
公开(公告)号：WO2008001685A1
公开(公告)日：2008-01-03
申请号：PCT/JP2007/062578
申请日：2007-06-22
申请人：日新イオン機器株式会社 , 山下貴敏
发明人：山下貴敏
IPC分类号： H01J37/317 , H01J37/12 , H01L21/265
CPC分类号： H01J37/3171 , H01J2237/14 , H01J2237/1538 , H01J2237/24528
摘要： An ion implantation apparatus in which the divergence in the Y-direction due to the space charge effect of the ion beam is compensated between the target and the ion beam deflector where the ion beam is separated from neutral particles and thereby the ion beam transportation efficiency is enhanced. The ion implantation apparatus comprises a beam parallizer (14) for converting an ion beam (4) scanned in the X-direction is bent back into a parallel ion beam by a magnetic field and outputting an ion beam (4) having a ribbon shape. The beam parallizer (14) also serves as an ion beam deflector for separating the ion beam (4) and neutral particles by the deflection of the ion beam (4) by the magnetic filed. Near the exit of the beam parallizer (14), electrodes are so disposed as to be opposed to each other in the Y-direction, with the space where the ion beam (4) passes interposed. Thus, an electrostatic lens (30) for converging the ion beam (4) in the Y-direction is provided.
摘要翻译：一种离子注入装置，其中由于离子束的空间电荷效应而在Y方向上的发散被补偿在靶和离子束偏转器之间，其中离子束与中性粒子分离，从而离子束输送效率为增强。离子注入装置包括用于将在X方向上扫描的离子束（4）转换成通过磁场返回到并联离子束的光束偏光器（14），并输出具有带状的离子束（4）。光束偏光器（14）还用作离子束偏转器，用于通过磁场使离子束（4）的偏转来分离离子束（4）和中性粒子。在光束偏光器（14）的出口附近，电极被设置为在Y方向上彼此相对，并且离子束（4）通过的空间被插入。因此，设置用于使离子束（4）沿Y方向会聚的静电透镜（30）。

8. 发明申请

WO2004012219A1 ADJUSTABLE IMPLANTATION ANGLE WORKPIECE SUPPORT STRUCTURE FOR AN ION BEAM IMPLANTER 审中-公开
标题翻译：可调植入角度工件用于离子束植入物的支撑结构
公开(公告)号：WO2004012219A1
公开(公告)日：2004-02-05
申请号：PCT/US2003/023687
申请日：2003-07-29
申请人： AXCELIS TECHNOLOGIES, INC.
发明人： FERRARA, Joseph
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20207 , H01J2237/20214 , H01J2237/24528 , H01L21/68764 , H01L21/68771
摘要： An ion beam implanter includes an ion beam source for generating an ion beam (14) moving along a beam line and an implantation chamber wherein a workpiece (24) is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure (100) coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a first rotation member (110) rotatably coupled to the implantation chamber and including an opening (121) extending through the rotation member and aligned with an opening in a wall of the implantation chamber. The workpiece support structure further includes a second rotation member (150) rotatably coupled to the first rotation member and having an axis of rotation offset from an axis of rotation of the first rotation member, the second rotation member overlying the opening of the first rotation member. The workpiece support structure also includes a third member fixedly attached to the second rotation member, the third member including a rotatable drive (200, 204) supporting the workpiece. The first rotation member, the second rotation member and the rotatable drive of the third rotation member rotate to move the workpiece along a path of travel for implantation of the implantation surface wherein a distance that the ion beam moves through the implantation chamber before striking the implantation surface of the workpiece is constant.
摘要翻译：离子束注入机包括用于产生沿着束线移动的离子束（14）的离子束源和注入室，其中工件（24）被定位成与离子束相交，用于离子注入工件的表面离子束。离子束注入机还包括耦合到注入室并支撑工件的工件支撑结构（100）。工件支撑结构包括可旋转地联接到植入室的第一旋转构件（110），并且包括延伸穿过旋转构件并与植入室的壁中的开口对准的开口（121）。所述工件支撑结构还包括可旋转地联接到所述第一旋转构件并具有偏离所述第一旋转构件的旋转轴线的旋转轴线的第二旋转构件，所述第二旋转构件覆盖所述第一旋转构件的开口。工件支撑结构还包括固定地附接到第二旋转构件的第三构件，第三构件包括支撑工件的可旋转驱动器（200,204）。第一旋转构件，第二旋转构件和第三旋转构件的可旋转驱动器旋转以沿着用于注入植入表面的移动路径移动工件，其中在撞击植入之前离子束移动通过注入室的距离工件表面是恒定的。

9. 发明申请

WO2016106421A2 SYSTEM AND METHOD TO IMPROVE PRODUCTIVITY OF HYBRID SCAN ION BEAM IMPLANTERS 审中-公开
标题翻译：提高混合光束离子束植入物生产力的系统和方法
公开(公告)号：WO2016106421A2
公开(公告)日：2016-06-30
申请号：PCT/US2015067715
申请日：2015-12-28
申请人： AXCELIS TECH INC
发明人： VANDERBERG BO , RAY ANDY
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： H01J37/3045 , H01J37/3007 , H01J37/304 , H01J37/3171 , H01J2237/24405 , H01J2237/24514 , H01J2237/24528 , H01J2237/24535
摘要： A method for improving the productivity of a hybrid scan implanter by determining an optimum scan width is provided. A method of tuning a scanned ion beam is provided, where a desired beam current is determined to implant a workpiece with desired properties. The scanned beam is tuned utilizing a setup Faraday cup. A scan width is adjusted to obtain an optimal scan width using setup Faraday time signals. Optics are tuned for a desired flux value corresponding to a desired dosage. Uniformity of a flux distribution is controlled when the desired flux value is obtained. An angular distribution of the ion beam is further measured.
摘要翻译：提供了一种通过确定最佳扫描宽度来提高混合扫描注入机的生产率的方法。提供了一种调整扫描离子束的方法，其中确定期望的束电流以将具有期望特性的工件植入。扫描的光束利用设置的法拉第杯进行调谐。调整扫描宽度以使用设置法拉第时间信号获得最佳扫描宽度。调整光学对应于期望剂量的期望通量值。当获得期望的通量值时，控制通量分布的均匀性。进一步测量离子束的角度分布。

10. 发明申请

WO2014173741A1 TUBE-DETECTOR ALIGNMENT USING LIGHT PROJECTIONS 审中-公开
标题翻译：使用光源投影的管道检测器对准
公开(公告)号：WO2014173741A1
公开(公告)日：2014-10-30
申请号：PCT/EP2014/057677
申请日：2014-04-16
申请人： KONINKLIJKE PHILIPS N.V. , PHILIPS DEUTSCHLAND GMBH
发明人： MANKE, Dirk , KURZE, Christoph , VAN DE VEN, Richard Johannus Maria
IPC分类号： A61B6/00 , A61B6/08
CPC分类号： A61B6/587 , A61B6/0492 , A61B6/08 , A61B6/4405 , A61B6/461 , A61B6/547 , A61B6/585 , A61N5/1048 , A61N2005/105 , G02B7/005 , G02B27/64 , H01J37/22 , H01J2237/1501 , H01J2237/20292 , H01J2237/24528 , H01J2237/2482 , H04B10/22
摘要： The present invention relates to acquisition of medical image information of an object. In order to provide a user- friendly alignment of X-ray tube (18) and a detector (24), optionally combined with an anti-scatter grid, an alignment arrangement (200) is proposed, which comprises a tube attachment (26) with a first light projection device (28) and a detector attachment (34) with a second light projection device (36). The first and second light projection devices each generate a light pattern (30, 38) on a projection surface (32). The tube attachment (26) and the detector attachment (34) can be brought into a correct spatial arrangement relative to each other by bringing the first light pattern in a predetermined spatial relation with the second light pattern (38) on the projection surface.
摘要翻译：本发明涉及获取对象的医学图像信息。为了提供X射线管（18）和检测器（24）的用户友好的对准，任选地与防散射栅格组合，提出了一种对准装置（200），其包括管附件（26）具有第一光投射装置（28）和具有第二光投射装置（36）的检测器附件（34）。第一和第二光投射装置各自在投影表面（32）上产生光图案（30,38）。通过使第一光图案与投影表面上的第二光图案（38）成预定的空间关系，可以使管附件（26）和检测器附件（34）相对于彼此进行正确的空间排列。

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