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    • 3. 发明申请
    • METHOD FOR DEPOSITING METAL OXIDE FILMS
    • 沉积金属氧化物膜的方法
    • WO2009080092A1
    • 2009-07-02
    • PCT/EP2007/064158
    • 2007-12-19
    • TALIANI, CarloNOZAR, Petr
    • TALIANI, CarloNOZAR, Petr
    • C23C14/30C23C14/08
    • C23C14/30C23C14/086
    • A method for depositing a metal oxide film on a surface of a supporting body for the film, comprising the steps of: - providing a deposition chamber; - providing a pulsed beam of electrons and plasma in the deposition chamber; - supplying a supporting body in the deposition chamber, the supporting body having a deposition surface; - providing a target body made of a material which comprises the metal oxide in the deposition chamber, the target body having a target surface; - forming a plume of metal oxide ablated from the target surface by means of the impact of the pulsed beam of electrons and plasma against the target surface; and - depositing a metal oxide film on the deposition surface by means of the contact of the plume with the deposition surface.
    • 一种用于在所述膜的支撑体的表面上沉积金属氧化物膜的方法,包括以下步骤: - 提供沉积室; - 在沉积室中提供电子和等离子体的脉冲束; - 在所述沉积室中供应支撑体,所述支撑体具有沉积表面; - 提供由在沉积室中包含金属氧化物的材料制成的靶体,所述靶体具有靶表面; - 通过脉冲电子束和等离子体对靶表面的冲击,形成从目标表面烧蚀的金属氧化物羽流; 以及 - 通过所述羽流与沉积表面的接触在沉积表面上沉积金属氧化物膜。