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1. 发明申请

WO2010110551A2 CHEMICAL VAPOR DEPOSITION REACTOR FOR PREPARATION OF POLYSILICON 审中-公开
标题翻译：化学气相沉积反应器制备多晶硅
公开(公告)号：WO2010110551A2
公开(公告)日：2010-09-30
申请号：PCT/KR2010001677
申请日：2010-03-18
申请人： SUSUNGTECH CO LTD , HANKOOK SILICON CO LTD , YOUN SOON KWANG , JUNG JAE CHUL , KIM TAE SOO , KIM TAE HYUNG , YOU SUN IL , KIM KYUNG HO
发明人： YOUN SOON KWANG , JUNG JAE CHUL , KIM TAE SOO , KIM TAE HYUNG , YOU SUN IL , KIM KYUNG HO
IPC分类号： C23C16/455 , H01L21/205
CPC分类号： C23C16/24 , C01B33/035 , C23C16/4418 , C23C16/4557
摘要： The present invention relates to a chemical vapor deposition reactor for preparation of polysilicon. The chemical vapor deposition reactor for preparation of polysilicon according to the present invention comprises: a base plate; a bezel for creating an enclosed hot zone between the base plate; a heating section for heating the hot zone; inlet and outlet openings via which a reaction gas is supplied and discharged into and from the hot zone; and a heat exchange section formed inside the bezel, thereby allowing the reaction gas that is supplied into the hot zone via the inlet opening to absorb heat energy transferred to the bezel and to thus cool the temperature of the bezel and simultaneously supplying the reaction gas into the hot zone in a heated state. As such, heat energy that is lost outside after being transferred to the bezel can be minimized, and power consumption for maintaining the temperature of the hot zone can be reduced since the reaction gas that has absorbed the heat energy is supplied into the hot zone in the heated state.
摘要翻译：本发明涉及一种用于制备多晶硅的化学气相沉积反应器。根据本发明的用于制备多晶硅的化学气相沉积反应器包括：基板; 用于在基板之间形成封闭的热区的边框; 用于加热热区的加热部分; 入口和出口通过其供应反应气体并从热区排出; 以及形成在所述边框内部的热交换部，由此使经由所述入口开口供给到所述热区域的反应气体吸收传递到所述边框的热能，从而冷却所述边框的温度，同时将所述反应气体供给到热区处于加热状态。因此，能够将被转移到挡板外面的热能最小化，因为能够吸收热能的反应气体被供给到热区内，所以能够降低维持热区温度的功率消耗加热状态。

2. 发明申请

WO2010107262A3 HERMETIC CONTAINER FOR THERMAL CONVERSION REACTION 审中-公开
标题翻译：用于热转化反应的密封容器
公开(公告)号：WO2010107262A3
公开(公告)日：2010-12-23
申请号：PCT/KR2010001686
申请日：2010-03-18
申请人： SUSUNGTECH CO LTD , HANKOOK SILICON CO LTD , YOUN SOON KWANG , JUNG JAE CHUL , KIM TAE SOO , KIM TAE HYUNG , YOU SUN IL , KIM KYUNG HO
发明人： YOUN SOON KWANG , JUNG JAE CHUL , KIM TAE SOO , KIM TAE HYUNG , YOU SUN IL , KIM KYUNG HO
IPC分类号： B01J19/26 , B01J19/32 , C01B33/107
CPC分类号： C01B33/107 , B01J4/002 , B01J19/02 , B01J19/24 , B01J2219/00094 , B01J2219/00135 , B01J2219/00159 , B01J2219/0286 , C01B33/035
摘要： The present invention relates to a hermetic container for a thermal conversion reaction. The hermetic container according to the present invention comprises: a base plate on which utilities are installed; a bezel for forming an enclosed hot zone between the base plate and itself; a heater disposed in the hot zone; an inlet and an outlet for feeding and discharging a reaction gas into and from the hot zone; and a heat exchanger provided inside the bezel for allowing the reaction gas being fed into the hot zone via the inlet to absorb heat energy that is transferred to the bezel such that the temperature of the bezel cools down and also the reaction gas is fed into the hot zone in heated state. Accordingly, in the process of feeding the reaction gas into the hot zone through the heat exchanger provided inside the bezel, heat energy that is transferred from a heater of the hot zone to the bezel and then lost to outside is absorbed by the reaction gas being fed into the hot zone, such that the bezel is prevented from overheating to a temperature above the critical temperature; and because the reaction gas is heated by absorbing the heat energy that was lost to outside the bezel and then fed into the hot zone, power consumption of the heater can be lowered.
摘要翻译：本发明涉及一种用于热转化反应的密封容器。根据本发明的气密容器包括：其上安装有设备的基板; 用于在基板与其自身之间形成封闭热区的挡板; 设置在热区中的加热器; 用于将反应气体供入热区和从热区排出的入口和出口; 以及设置在边框内的热交换器，用于允许经由入口将反应气体供给到热区中，以吸收传递到边框的热能，使得边框的温度冷却并且还将反应气体供给到热区处于加热状态。因此，在通过设置在表圈内部的热交换器将反应气体供给到热区的过程中，从热区的加热器传递到表圈然后流失到外部的热能被反应气体吸收进料到热区中，使得防止挡板过热至临界温度以上的温度; 并且因为反应气体通过吸收损失到玻璃框外部的热能然后进入热区而被加热，所以加热器的功耗可以降低。

3. 发明申请

WO2012096482A3 LAMINATED FILM HAVING CARBON LAYER 审中-公开
标题翻译：具有碳层的层压膜
公开(公告)号：WO2012096482A3
公开(公告)日：2012-11-22
申请号：PCT/KR2012000195
申请日：2012-01-09
申请人： YOUL CHON CHEMICAL CO LTD , JUNG JAE CHUL , KANG HAN JOON , LEE SUNG HO , KIM JIN HO , LEE EUN GOO
发明人： JUNG JAE CHUL , KANG HAN JOON , LEE SUNG HO , KIM JIN HO , LEE EUN GOO
IPC分类号： B32B15/04 , B32B9/00 , B32B27/06
CPC分类号： B32B27/08 , B32B5/16 , B32B9/007 , B32B9/041 , B32B9/045 , B32B15/09 , B32B15/16 , B32B15/20 , B32B27/14 , B32B27/32 , B32B27/36 , B32B2260/025 , B32B2260/046 , B32B2264/108 , B32B2307/7242 , B32B2439/70 , B32B2439/80 , B32B2553/00
摘要： Disclosed is a laminated film including a carbon layer to prevent a fracture or a crack of a layer or a film adjacent to the carbon layer in the laminated film. The carbon layer provides an elasticity and thus prevents the fracture or the crack of a layer or a film adjacent to the carbon layer in the laminated film.
摘要翻译：公开了一种层压膜，其包括碳层，以防止层压膜中与碳层相邻的层或膜的断裂或裂纹。碳层提供弹性，从而防止层压膜中与碳层相邻的层或膜的断裂或裂纹。

4. 发明申请

WO2012091462A2 BACK SHEET FOR SOLAR CELLS AND METHOD FOR PREPARING THE SAME 审中-公开
标题翻译：用于太阳能电池的背板及其制备方法
公开(公告)号：WO2012091462A2
公开(公告)日：2012-07-05
申请号：PCT/KR2011010255
申请日：2011-12-28
申请人： YOUL CHON CHEMICAL CO LTD , JUNG JAE CHUL , KANG HAN JOON , HAN HEE SIK , LEE SUNG HO , KIM JIN HO
发明人： JUNG JAE CHUL , KANG HAN JOON , HAN HEE SIK , LEE SUNG HO , KIM JIN HO
IPC分类号： H01L31/052
CPC分类号： H01L31/0487 , H01L31/049 , H01L31/18 , Y02E10/50 , Y10T428/12049 , Y10T428/12549 , Y10T428/3154
摘要： Provided is a back sheet for solar cells including a substrate, a fluororesin layer existing on one side of the substrate and a heat-dissipating ink layer existing on the other side of the substrate. Provided also is a method for preparing the same. The back sheet for solar cells may have an excellent heat dissipation property as well as a high durability. Further, the method for preparing the same may allow a cost-efficient production of solar cells.
摘要翻译：本发明提供一种太阳能电池用背板，其包括基板，存在于基板一侧的氟树脂层和存在于基板另一侧的散热墨层。还提供了用于制备它的方法。太阳能电池用背板可以具有优异的散热性以及高耐久性。此外，用于制备太阳能电池的方法可以允许成本效益地生产太阳能电池。

5. 发明申请

WO2011119007A3 HEAT-DISSIPATING TAPE AND METHOD FOR MANUFACTURING SAME 审中-公开
标题翻译：散热片及其制造方法
公开(公告)号：WO2011119007A3
公开(公告)日：2012-03-15
申请号：PCT/KR2011002079
申请日：2011-03-25
申请人： YOUL CHON CHEMICAL CO LTD , JUNG JAE CHUL , KANG HAN JUN , LEE SUNG HO , KIM JI HEE
发明人： JUNG JAE CHUL , KANG HAN JUN , LEE SUNG HO , KIM JI HEE
IPC分类号： C09J7/00 , B32B15/02 , C09J9/02 , H05K7/20
CPC分类号： H05K7/20963 , B32B5/02 , B32B7/06 , B32B7/12 , B32B15/02 , B32B15/08 , B32B15/18 , B32B15/20 , B32B27/10 , B32B27/12 , B32B27/18 , B32B27/308 , B32B27/36 , B32B29/02 , B32B2307/30 , B32B2307/302 , B32B2307/732 , B32B2457/00 , B32B2457/20 , C08K3/04 , C09D5/18 , C09D5/32 , C09J7/29 , C09J2203/318 , C09J2205/106 , C09J2400/163 , C09J2433/00 , C09J2475/00 , C09J2483/00 , H05K7/20481
摘要： The present invention relates to a heat-dissipating tape to be used in a variety of electronic products so as to dissipate heat from said electronic products, and to a method for manufacturing the heat-dissipating tape. The heat-dissipating tape of the present invention comprises: a metal mesh base; and a heat-dissipating paint layer, wherein the heat-dissipating paint layer is formed on one side or either side of the metal mesh base. In addition, the heat-dissipating tape of the present invention comprises: a metal mesh base; a heat-dissipating paint layer; and an adhesive layer, wherein the heat dissipating paint layer is formed on one side or either side of the metal mesh base, and the adhesive layer is made of thermally conductive adhesives. The heat-dissipating tape of the present invention is thin, dissipates heat in a vertical direction with respect to a heat-generating source to thereby achieve improved heat-dissipating effects, and has superior adhesion.
摘要翻译：本发明涉及一种用于各种电子产品以散发来自所述电子产品的热量的散热带以及一种用于制造散热带的方法。本发明的散热带包括：金属网基体; 以及散热涂料层，其中，所述散热涂料层形成在所述金属网基材的一侧或两侧。另外，本发明的散热带包括：金属网基体; 散热漆层; 以及粘合剂层，其中所述散热涂料层形成在所述金属网基材的一侧或任一侧上，并且所述粘合剂层由导热粘合剂制成。本发明的散热带薄，相对于发热源在垂直方向上散发热量，从而实现改善的散热效果，并且具有优异的粘附性。

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