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1. 发明申请

WO0111930A9 A CLEAVING PROCESS TO FABRICATE MULTILAYERED SUBSTRATES USING LOW IMPLANTATION DOSES 审中-公开
标题翻译：使用低植入剂量制造多层基材的清洁方法
公开(公告)号：WO0111930A9
公开(公告)日：2001-09-20
申请号：PCT/US0022245
申请日：2000-08-10
申请人： SILICON GENESIS CORP , HENLEY FRANCOIS J , BRYAN MICHAEL A , EN WILLIAM G
发明人： HENLEY FRANCOIS J , BRYAN MICHAEL A , EN WILLIAM G
IPC分类号： H01L21/02 , H01L21/265 , H01L21/301 , H01L21/762 , H01L27/12 , H01L21/30 , H01L21/46
CPC分类号： H01L21/76251 , H01L21/26506 , H01L21/76254
摘要： A method of forming substrates (11), e.g., silicon on insulator, silicon on silicon. The method includes providing a donor substrate, e.g., silicon wafer. The method also includes forming a cleave layer (18) on the donor substrate that contains the cleave plane, the plane of eventual separation. In a specific embodiment, the cleave layer comprising silicon germanium. The method also includes forming a device layer (20) (e.g., epitaxial silicon) on the cleave layer. The method includes introducing particles into the cleave layer to add stress in the cleave layer. The particles within the cleave layer are then redistributed to form a high concentration region of particles in the vicinity of the cleave plane, where the redistribution of the particles is carried out in a manner substantially free from microbubble or microcavity formation in the cleave plane. The method also includes providing selected energy to the donor substrate to cleave the device layer from the cleave layer at the cleave plane, whereupon the selected energy is applied to create a controlled cleaving action to remove the device layer from a portion of the cleave layer in a controlled manner.
摘要翻译：一种形成衬底（11）的方法，例如绝缘体上的硅，硅上的硅。该方法包括提供施主衬底，例如硅晶片。该方法还包括在供体基底上形成含有切割平面（最终分离的平面）的切割层（18）。在具体实施方案中，包含硅锗的切割层。该方法还包括在切割层上形成器件层（20）（例如外延硅）。该方法包括将粒子引入切割层以在切割层中增加应力。然后将切割层内的颗粒重新分布形成在解理面附近的高浓度区域的颗粒，其中颗粒的再分布以基本上不含在分裂面内的微泡或微腔形成的方式进行。该方法还包括向施主衬底提供所选择的能量以在解理面从裂解层切割器件层，由此施加所选择的能量以产生受控的切割作用，以从器件层的一部分切割层受控的方式。

2. 发明申请

WO0111930A2 A CLEAVING PROCESS TO FABRICATE MULTILAYERED SUBSTRATES USING LOW IMPLANTATION DOSES 审中-公开
标题翻译：使用低注入剂量制作多层基板的切割工艺
公开(公告)号：WO0111930A2
公开(公告)日：2001-02-15
申请号：PCT/US0022245
申请日：2000-08-10
申请人： SILICON GENESIS CORP , HENLEY FRANCOIS J , BRYAN MICHAEL A , EN WILLIAM G
发明人： HENLEY FRANCOIS J , BRYAN MICHAEL A , EN WILLIAM G
IPC分类号： H01L21/02 , H01L21/265 , H01L21/301 , H01L21/762 , H01L27/12 , H05K
CPC分类号： H01L21/76251 , H01L21/26506 , H01L21/76254
摘要： A method of forming substrates (11), e.g., silicon on insulator, silicon on silicon. The method includes providing a donor substrate, e.g., silicon wafer. The method also includes forming a cleave layer (18) on the donor substrate that contains the cleave plane, the plane of eventual separation. In a specific embodiment, the cleave layer comprising silicon germanium. The method also includes forming a device layer (20) (e.g., epitaxial silicon) on the cleave layer. The method includes introducing particles into the cleave layer to add stress in the cleave layer. The particles within the cleave layer are then redistributed to form a high concentration region of particles in the vicinity of the cleave plane, where the redistribution of the particles is carried out in a manner substantially free from microbubble or microcavity formation in the cleave plane. The method also includes providing selected energy to the donor substrate to cleave the device layer from the cleave layer at the cleave plane, whereupon the selected energy is applied to create a controlled cleaving action to remove the device layer from a portion of the cleave layer in a controlled manner.
摘要翻译：一种形成衬底（11）的方法，例如绝缘体上的硅，硅上的硅。该方法包括提供施主衬底，例如硅晶片。该方法还包括在供体衬底上形成包含解理平面，最终分离平面的解理层（18）。在具体的实施方式中，劈裂层包含硅锗。该方法还包括在劈裂层上形成器件层（20）（例如，外延硅）。该方法包括将颗粒引入劈裂层中以在劈裂层中增加应力。然后将裂开层内的颗粒重新分布以在裂开平面附近形成高浓度区域的颗粒，其中颗粒的重新分布以在裂开平面中基本上没有微泡或微腔形成的方式进行。该方法还包括向供体衬底提供选择的能量以在劈裂平面处从劈裂层切割器件层，随后施加选定的能量以产生受控的劈裂行为，以从劈裂层的一部分去除器件层受控制的方式。

3. 发明申请

WO02057812A2 OPTICAL MATERIALS WITH SELECTED INDEX-OF-REFRACTION 审中-公开
标题翻译：具有选择的折射率的光学材料
公开(公告)号：WO02057812A2
公开(公告)日：2002-07-25
申请号：PCT/US0201702
申请日：2002-01-17
申请人： NANOGRAM CORP , BRYAN MICHAEL A , KAMBE NOBUYUKI
发明人： BRYAN MICHAEL A , KAMBE NOBUYUKI
IPC分类号： G02B6/124 , G02B6/125 , G02B6/13 , G02B
CPC分类号： G02B6/13 , G02B6/124 , G02B6/125 , Y10T428/25
摘要： Photosensitive optical materials are used for establishing more versatile approaches for optical device formation. In some embodiments, unpatterned light (404) is used to shift the index-of-refraction of planar optical structures (400) to shift the index-of-refraction of the photosensitive material (402) to a desired value. This approach can be effective to produce cladding material with a selected index-of-refraction. In additional embodiments gradients in index-of-refraction are formed using photosensitive materials. In additional embodiments gradient in index-of-refraction are formed using photosensitive materials. In further embodiments, the photosensitive materials are patterned within the planar optical structure. Irradiation of the photosensitive material can selectively shift the index-of-refraction of the patterned photosensitive material. By patterning the light used used to irradiate the patterned photosensitive material, different optical devices can be selectively activated within the optical structure.
摘要翻译：光敏光学材料用于建立用于光学器件形成的更通用的方法。在一些实施例中，未图案化的光（404）用于移动平面光学结构（400）的折射率以将感光材料（402）的折射率偏移到期望值。这种方法可以有效地生产具有选定的折射率的包层材料。在另外的实施例中，使用光敏材料形成折射率折射率。在另外的实施例中，使用光敏材料形成折射率梯度。在另外的实施例中，感光材料在平面光学结构内图案化。感光材料的照射可以选择性地移动图案化感光材料的折射率。通过图案化用于照射图案化感光材料的光，可以在光学结构内选择性地激活不同的光学器件。

4. 发明申请

WO0244765A3 MULTILAYERED OPTICAL STRUCTURES 审中-公开
标题翻译：多层光学结构
公开(公告)号：WO0244765A3
公开(公告)日：2003-01-30
申请号：PCT/US0145762
申请日：2001-10-26
申请人： NANOGRAM CORP , BRYAN MICHAEL A , BI XIANGXIN
发明人： BRYAN MICHAEL A , BI XIANGXIN
IPC分类号： B29D11/00 , B32B9/04 , C03B19/14 , C03B37/012 , C03B37/014 , C03B37/027 , C04B35/14 , C23C16/48 , C23C26/00 , C23C28/00 , C23C28/04 , G02B1/02 , G02B1/04 , G02B6/02 , G02B6/12 , G02B6/13 , G02B6/132 , G02B6/43 , B05D1/36 , B05D5/00 , C08J7/18 , G02B6/00 , G02B6/10
CPC分类号： G02B6/12002 , B32B9/04 , C03B19/1415 , C03B19/1423 , C03B19/1484 , C03B37/01413 , C03B37/0142 , C03B37/01486 , C03B37/027 , C03B2203/34 , C03B2205/40 , C03B2207/02 , C03B2207/34 , C03B2207/66 , C03B2207/85 , C04B35/14 , C04B2235/3201 , C04B2235/3203 , C04B2235/3215 , C04B2235/3217 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3232 , C04B2235/3234 , C04B2235/3244 , C04B2235/3251 , C04B2235/3258 , C04B2235/3287 , C04B2235/3293 , C04B2235/3294 , C04B2235/3296 , C04B2235/3298 , C04B2235/3409 , C04B2235/3418 , C04B2235/3463 , C23C16/483 , C23C26/00 , G02B6/02042 , G02B6/13 , G02B6/132 , G02B2006/12147 , G02B2006/1215 , G02B2006/12176 , Y02P40/57
摘要： Monolithic optical structures include a plurality of layer with each layer having an isolated optical pathway confined within a portion of the layer. The monolithic optical structure can be used as an optical fiber preform. Alternatively or additionally, the monolithic optical structure can include integrated optical circuits within one or more layers of the structure. Monolithic optical structures can be formed by performing multiple passes of a substrate through a flowing particle stream. The deposited particles form an optical material following consolidation. Flexible optical fibers include a plurality of independent light channels extending along the length of the optical fiber. The fibers can be pulled from an appropriate preform.
摘要翻译：单片光学结构包括多个层，每个层具有限定在层的一部分内的隔离的光学路径。单片光学结构可以用作光纤预制件。或者或另外，单片光学结构可以包括在该结构的一个或多个层内的集成光学电路。单片光学结构可以通过通过流动的颗粒流进行多次通过基板来形成。沉积的颗粒在固结后形成光学材料。柔性光纤包括沿着光纤的长度延伸的多个独立光通道。纤维可以从适当的预成型件拉出。

5. 发明申请

WO03060564A2 THREE DIMENSIONAL ENGINEERING OF PLANAR OPTICAL STRUCTURES 审中-公开
标题翻译：平面光学结构的三维工程
公开(公告)号：WO03060564A2
公开(公告)日：2003-07-24
申请号：PCT/US0240848
申请日：2002-12-19
申请人： NEOPHOTONICS CORP , BI XIANGXIN , NEVIS ELIZABETH ANNE , MOSSO RONALD J , CHAPIN MICHAEL EDWARD , CHIRUVOLU SHIVKUMAR , KHAN SARDAR HYAT , KUMAR SUJEET , LOPEZ HERMAN ADRIAN , HUY NGUYEN TRAN THE , HORNE CRAIG RICHARD , BRYAN MICHAEL A , EUVRARD ERIC
发明人： BI XIANGXIN , NEVIS ELIZABETH ANNE , MOSSO RONALD J , CHAPIN MICHAEL EDWARD , CHIRUVOLU SHIVKUMAR , KHAN SARDAR HYAT , KUMAR SUJEET , LOPEZ HERMAN ADRIAN , HUY NGUYEN TRAN THE , HORNE CRAIG RICHARD , BRYAN MICHAEL A , EUVRARD ERIC
IPC分类号： H01S3/063 , H01S3/0941 , H01S3/17 , G02B
CPC分类号： H01S3/0632 , H01S3/0635 , H01S3/0637 , H01S3/0941 , H01S3/176 , H01S3/2308
摘要： Three dimensional optical structures are described that can have various integrations between optical devices within and between layers of the optical structure. Optical turning elements can provide optical pathways between layers of optical devices. Methods are described that provide for great versatility on contouring optical materials throughout the optical structure. Various new optical devices are enabled by the improved optical processing approaches.
摘要翻译：描述了三维光学结构，其可以在光学结构的层内和层之间的光学器件之间具有各种集成。光学旋转元件可以提供光学装置的层之间的光学路径。描述了在整个光学结构中轮廓化光学材料方面具有很大通用性的方法。通过改进的光学处理方法可以实现各种新的光学器件。

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