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    • 3. 发明申请
    • TUNABLE LASER
    • 可调激光
    • WO2017140848A1
    • 2017-08-24
    • PCT/EP2017/053625
    • 2017-02-17
    • ROCKLEY PHOTONICS LIMITEDUNIVERSITY OF SOUTHAMPTON
    • ZILKIE, AaronTHOMSON, David JohnGARDES, Frederic Yannick
    • H01S5/026H01S5/0625H01S5/10H01S5/14
    • H01S5/142H01S5/0261H01S5/06255H01S5/1007H01S5/1032
    • A discrete wavelength tunable laser capable of switching between a plurality of lasing channels of different wavelengths, the tunable laser comprising: a semiconductor optical amplifier (SOA); a wavelength demultiplexer (Demux), having a Demux input which receives the output from the SOA, and a plurality of Demux outputs, each Demux output defining a different spatial path for a respective lasing channel; each of the respective lasing channels being within the bandwidth of the SOA; a reflector located within each spatial path for reflecting light of the respective lasing channel; and a lasing suppression mechanism located within each lasing channel; wherein one or more desired lasing channels are selected by application of the lasing suppression mechanism in each spatial path other than the one or more spatial paths corresponding to the one or more desired lasing channels.
    • 一种能够在多个不同波长的激光通道之间进行切换的离散波长可调激光器,所述可调激光器包括:半导体光放大器(SOA); 具有接收来自SOA的输出的解复用输入和多个解复用器输出的波长解复用器(Demux),每个解复用器输出为相应激射通道定义不同的空间路径; 每个相应的激光通道在SOA的带宽内; 位于每个空间路径内用于反射相应激射通道的光的反射器; 以及位于每个激光通道内的激光抑制机构; 其中通过在除了对应于所述一个或多个期望的激光通道的所述一个或多个空间路径之外的每个空间路径中应用所述激光抑制机构来选择一个或多个期望的激光通道。
    • 5. 发明申请
    • TRIMMING OPTICAL DEVICE STRUCTURES
    • 修剪光学器件结构
    • WO2017125608A1
    • 2017-07-27
    • PCT/EP2017/051341
    • 2017-01-23
    • UNIVERSITY OF SOUTHAMPTON
    • THOMSON, David JohnREED, Graham TrevorTOPLEY, Robert
    • G02B6/134
    • G02B6/1347G02B2006/12171G02B2006/12188
    • A method of trimming the refractive index of material forming at least part of one or more structures integrated in one or more pre-fabricated devices, the method comprising : implanting one or more first regions of material of one or more pre-fabricated devices, encompassing at least partially one or more device structures, with ions to alter the crystal form of the material within the one or more first regions and change the refractive index of the material within the one or more first regions; and heat treating one or more second regions of material of the one or more devices, encompassing at least partially the one or more first regions, to alter the crystal form of the material within the one or more first regions encompassed by the one or more second regions and change the refractive index thereof, thereby trimming the refractive index of the material of at least part of the one or more device structures, such that the one or more device structures provide one or more predetermined device outputs.
    • 一种修整形成集成在一个或多个预制器件中的一个或多个结构的至少一部分的材料的折射率的方法,所述方法包括:将一个或多个第一材料区域 或更多预制器件,其至少部分地包含一个或多个器件结构,其中离子改变所述一个或多个第一区域内的材料的晶体形式并且改变所述一个或多个第一区域内的材料的折射率; 以及热处理所述一个或多个装置的材料的一个或多个第二区域,其至少部分地包围所述一个或多个第一区域以改变由所述一个或多个第二区域包围的所述一个或多个第一区域内的材料的晶体形式 并且改变其折射率,从而修整一个或多个器件结构的至少一部分的材料的折射率,使得一个或多个器件结构提供一个或多个预定的器件输出。
    • 7. 发明申请
    • ERASABLE OPTICAL COUPLER
    • WO2018172740A1
    • 2018-09-27
    • PCT/GB2018/050651
    • 2018-03-14
    • UNIVERSITY OF SOUTHAMPTON
    • CHEN, XiaMILOSEVIC, MilanREED, Graham TrevorTHOMSON, David John
    • G02B6/134G02B6/125G01M11/00
    • The disclosure provides a method of forming an erasable optical coupler in a photonic device comprising a conventional optical waveguide formed in a crystalline wafer. The method comprises selectively implanting ions in a localised region of the wafer material adjacent to the conventional waveguide of the photonic device, to cause modification of the crystal lattice structure of, and a change in refractive index in, the ion implanted region of the wafer material to thereby form an ion implanted waveguide optically coupled to the adjacent conventional waveguide to couple light out therefrom, or in thereto. The crystalline wafer material and ion implanted waveguide are such that the crystal lattice structure or composition can be modified to adjust or remove the optical coupling with the conventional waveguide by further modification of the refractive index in the ion implanted region, in particular by heating. The disclosure also includes an apparatus for carrying out the method, devices fabricated by means of the method, an apparatus for testing an erasable coupler in a waveguide device, and an apparatus for erasing an optical coupler comprising means for localised annealing of a material of the waveguide device, in particular by means of heat or light, as well as a system for sequentially producing a photonic device comprising the fabrication, testing and erasing apparatuses.