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    • 5. 发明申请
    • LOW-IRRITANCY COMPOSITION CONTAINING ANIONIC SURFACTANTS
    • 含有阴离子表面活性剂的低密度组合物
    • WO1997000310A1
    • 1997-01-03
    • PCT/FR1996000910
    • 1996-06-14
    • RHONE-POULENC CHIMIEDERIAN, Paul-JoëlRICCA, Jean-Marc
    • RHONE-POULENC CHIMIE
    • C11D01/65
    • A61Q19/10A61K8/45A61Q5/02C11D1/02C11D1/10C11D1/123C11D1/126C11D1/143C11D1/146C11D1/28C11D1/29C11D1/345C11D1/526C11D1/528C11D1/652
    • Low-irritancy compositions including at least one anionic surfactant and at least one derivative containing a tertiary nitrogen and one or more fragments consisting of polyoxy alkylene glycol and having general formula (I): R -Z-N(R )-[(CH2)x-N(W)]n-W, wherein R is a hydrocarbon radical, Z is a group containing at least one sp3-type carbon atom bound to two hydrogen atoms, or at least one sp2-type carbon atom bound to at least one heteroatom from groups V or VI of the periodic table, W is the radical -[(CH2-CH(R )-O)]m-1-CH2-CH(R )-OH, or R is a hydrogen atom, a C1-4 hydrocarbon radical, or W, x is from 2 to 6 and n is from 0 to 12. The use of a derivative having a tertiary nitrogen in compositions that include at least one anionic surfactant in order to reduce the irritancy of the composition, as well as the use of such compositions, e.g., in cosmetics and detergency, are also disclosed.
    • 低刺激性组合物,包括至少一种阴离子表面活性剂和至少一种含有叔氮的衍生物和一种或多种由聚氧亚烷基二醇组成的片段,并具有通式(I):R 1 -ZN(R 2) [(CH2)xN(W)] nW,其中R 1是烃基,Z是含有至少一个与两个氢原子键合的sp3型碳原子的基团,或至少一个结合的sp2型碳原子 至少一个来自元素周期表V或VI的杂原子,W是基团 - [(CH 2 -CH(R 3)-O)] m-1-CH 2 -CH(R 3)-OH 或R 2为氢原子,C 1-4烃基或W,x为2至6,n为0至12.在组合物中使用具有叔氮的衍生物至少包括 还公开了一种阴离子表面活性剂以减少组合物的刺激性,以及这些组合物在化妆品和洗涤剂中的用途。