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    • 5. 发明申请
    • METHOD, SYSTEM, AND DEVICE FOR DELIVERY OF PROCESS GAS
    • 用于输送过程气体的方法,系统和装置
    • WO2016065132A1
    • 2016-04-28
    • PCT/US2015/056887
    • 2015-10-22
    • RASIRC, INC.
    • ALVAREZ, Daniel, Jr.HOLMES, Russell, J.SPIEGELMAN, JeffreyHEINLEIN, EdwardRAMOS, Christopher
    • B01D53/44B01D53/77B01J20/292H01G4/06
    • C01B21/16B01D19/0031B01D19/0068B01D63/06B01D2325/42
    • A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.
    • 提供了一种方法和化学品输送系统和装置。 一种方法包括使非水肼溶液与载气和/或真空接触,并将包含肼的气流输送至关键过程或应用。 一种化学输送系统和装置包括具有与载气和/或真空接触的气相的非水肼溶液。 一个装置包括用于容纳包含至少一种挥发性过程化学品的液体的室,例如非水肼溶液,过氧化氢溶液或其它合适的过程化学品,以及可以使用 载气和/或真空。 在本发明中有用的另一种方法包括从本文公开的装置中使用载体或真空抽出工艺化学品,并将该工艺化学品递送至关键的工艺或应用。