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    • 8. 发明申请
    • MAGNETIC TUNNEL JUNCTION STORAGE ELEMENT AND METHOD OF FABRICATING THE SAME
    • 磁性隧道结存储元件及其制造方法
    • WO2011123357A1
    • 2011-10-06
    • PCT/US2011/030008
    • 2011-03-25
    • QUALCOMM INCORPORATEDCHEN, Wei-ChuanKANG, Seung H.
    • CHEN, Wei-ChuanKANG, Seung H.
    • H01L43/08H01L43/12H01L27/22
    • H01L43/08H01L27/228H01L43/12
    • Methods for forming a magnetic tunnel junction (MTJ) storage element and MTJ storage elements formed are disclosed. The MTJ storage element includes a MTJ stack having a pinned layer stack, a barrier layer and a free layer. An adjusting layer is formed on the free layer, such that the free layer is protected from process related damages. A top electrode is formed on the adjusting layer and the adjusting layer and the free layer are etched utilizing the top electrode as a mask. A spacer layer is then formed, encapsulating the top electrode, the adjusting layer and the free layer. The spacer layer and the remaining portions of the MTJ stack are etched. A protective covering layer is deposited over the spacer layer and the MTJ stack. In particular, the adjusting layer protects the free layer from oxygen ashing during photoresist removal process.
    • 公开了形成磁性隧道结(MTJ)存储元件和形成的MTJ存储元件的方法。 MTJ存储元件包括具有钉扎层堆叠,阻挡层和自由层的MTJ堆叠。 在自由层上形成调整层,使自由层免受过程相关损害。 顶部电极形成在调整层上,并且利用顶部电极作为掩模蚀刻调整层和自由层。 然后形成间隔层,封装顶部电极,调节层和自由层。 蚀刻间隔层和MTJ叠层的其余部分。 保护覆盖层沉积在间隔层和MTJ堆叠上。 特别地,调节层在光致抗蚀剂去除过程中保护自由层免受氧气灰化。