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    • 7. 发明申请
    • GROUNDING STRUCTURE, AND HEATER AND CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME
    • 接地结构以及具有相同结构的加热器和化学气相沉积设备
    • WO2011078488A3
    • 2011-09-22
    • PCT/KR2010008348
    • 2010-11-24
    • KOMICO LTDCHOI JEONG-DUCKYUK HYUN-MICHOI JIN-SIK
    • CHOI JEONG-DUCKYUK HYUN-MICHOI JIN-SIK
    • H01L21/205H01R13/648
    • H01R4/643C23C16/45565C23C16/4586C23C16/46C23C16/509H01R13/53
    • The present invention relates to a grounding structure, and a heater and a chemical vapor deposition apparatus having the same. The grounding structure comprises: a grounding mount having a housing for receiving a grounding connector that serves to guide a ground current to a ground receiver; a grounding clamp located at the housing, the grounding clamp having a cylindrical form with an open portion to communicate inside and outside and holding a grounding connector in such a manner as to bring the surface and inner surface of the grounding connector into contact with each other; a pair of jaws protruding from the outer surface close to the open portion and extending in parallel with the outer surface, while keeping a distance from each other as much as the width of the open portion; an interference reinforcing member fastened to the jaws, for reinforcing the bonding force between the grounding clamp and the grounding connector; and a ground wire for connecting the outer surface of the grounding clamp with the grounding mount to transfer the ground current to the grounding mount. By increasing the bonding force between the grounding clamp and the grounding connector, it is possible to restrain the formation of a clearance and thus prevent the damage on the grounding connector due to arcing.
    • 接地结构以及具有该接地结构的加热器及化学气相沉积设备技术领域本发明涉 该接地结构包括:接地支架,其具有用于接收接地连接器的壳体,该接地连接器用于将接地电流引导至接地接收器; 位于壳体处的接地夹具,接地夹具具有圆柱形形状,具有开口部分以在内部和外部相互连通并且保持接地连接器,使得接地连接器的表面和内表面彼此接触 ; 一对爪从接近开口部的外表面突出并且平行于外表面延伸,同时彼此保持彼此的距离与开口部的宽度一样多; 干涉加强构件,所述干涉加强构件被紧固到所述钳口,用于加强所述接地夹具和所述接地连接器之间的结合力; 以及用于将接地夹具的外表面与接地支架连接以将接地电流传递到接地支架的地线。 通过增加接地夹和接地连接器之间的结合力,可以限制间隙的形成,从而防止由于电弧造成的接地连接器的损坏。
    • 8. 发明申请
    • ELECTROSTATIC CHUCK COMPRISING A DOUBLE BUFFER LAYER (DBL) TO REDUCE THERMAL STRESS
    • 包含双缓冲层(DBL)的降压热电阻降低热应力
    • WO2010030101A3
    • 2010-07-08
    • PCT/KR2009005068
    • 2009-09-08
    • KOMICO LTDCHOI JIN-SIKCHOI JEONG-DUCK
    • CHOI JIN-SIKCHOI JEONG-DUCK
    • H01L21/687
    • H01L21/6833H02N13/00
    • Disclosed is an electrostatic chuck (ESC) comprising a buffer layer to absorb thermal stress. The electrostatic chuck comprises: a main body having transverse holes; a base plate disposed on the upper side of said main body and including insertion holes corresponding to said transverse holes, and an electrode layer partially exposed through said insertion holes, to secure an object to be held by the electrostatic energy of said electrode layer; a terminal unit having a contact terminal connected to said electrode layer through said transverse holes and insertion holes, and insulating members for electrically insulating said contact terminal and said main body; a first buffer layer disposed at at least part of the boundary between said main body and said insulating member to block the transfer of thermal stress from said main body to said insulating members; and a second buffer layer disposed at at least part of the boundary between said main body and said base plate to block the transfer of thermal stress from said main body to said insulating members. According to the present invention, the buffer layers of the electrostatic chuck absorb thermal stress, thereby minimising cracks due to thermal stress and extending the life of the chuck.
    • 公开了一种包含缓冲层以吸收热应力的静电卡盘(ESC)。 静电吸盘包括:具有横向孔的主体; 基板,其设置在所述主体的上侧,并且包括对应于所述横向孔的插入孔,以及通过所述插入孔部分地露出的电极层,以固定由所述电极层的静电能量保持的物体; 具有通过所述横向孔和插入孔与所述电极层连接的接触端子的端子单元和用于使所述接触端子和所述主体电绝缘的绝缘构件; 第一缓冲层,设置在所述主体和所述绝缘构件之间的边界的至少一部分上,以阻止从所述主体向所述绝缘构件传递热应力; 以及第二缓冲层,其设置在所述主体和所述基板之间的边界的至少一部分上,以阻止从所述主体向所述绝缘构件传递热应力。 根据本发明,静电卡盘的缓冲层吸收热应力,从而最小化由于热应力引起的裂纹并延长卡盘的使用寿命。
    • 10. 发明申请
    • ELECTROSTATIC CHUCK (ESC) COMPRISING A DOUBLE BUFFER LAYER (DBL) TO REDUCE THERMAL STRESS
    • 包含双缓冲层(DBL)以减少热应力的静电卡盘(ESC)
    • WO2010030102A3
    • 2010-07-01
    • PCT/KR2009005070
    • 2009-09-08
    • KOMICO LTDCHOI JIN-SIKCHOI JEONG-DUCK
    • CHOI JIN-SIKCHOI JEONG-DUCK
    • H01L21/02
    • H01L21/6833H02N13/00
    • Disclosed is an electrostatic chuck comprising a buffer layer to absorb thermal stress. The electrostatic chuck comprises: a main body having transverse holes; a base plate disposed on the upper side of said main body and including insertion holes corresponding to said transverse holes, and an electrode layer partially exposed through said insertion holes, to secure an object to be held by the electrostatic energy of said electrode layer; a terminal unit having a contact terminal connected to said electrode layer through said transverse holes and said insertion holes; and a buffer layer disposed at at least one boundary between said contact terminal, said main body, and said base plate so as to be able to absorb thermal stress from said main body. According to the present invention, the buffer layer of the electrostatic chuck absorbs thermal stress, thereby minimising cracks due to thermal stress and extending the life of the chuck.
    • 公开了一种静电吸盘,其包括缓冲层以吸收热应力。 该静电吸盘包括:具有横向孔的主体; 设置在所述主体的上侧并包括与所述横向孔相对应的插入孔的基板和通过所述插入孔部分地暴露的电极层,以确保被所述电极层的静电能保持的物体; 端子单元,具有通过所述横向孔和所述插入孔连接到所述电极层的接触端子; 以及设置在所述接触端子,所述主体和所述基板之间的至少一个边界处的缓冲层,以便能够吸收来自所述主体的热应力。 根据本发明,静电卡盘的缓冲层吸收热应力,由此使热应力引起的裂纹最小化并延长卡盘的寿命。