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1. 发明申请

WO2005113257A3 COMPLIANT HARD TEMPLATE FOR UV IMPRINTING 审中-公开
标题翻译：用于UV印刷的合适的硬质模板
公开(公告)号：WO2005113257A3
公开(公告)日：2006-07-13
申请号：PCT/US2005013502
申请日：2005-04-19
申请人： MOLECULAR IMPRINTS INC
发明人： WATTS MICHAEL P C , VOISIN RONALD D , SREENIVASAN SIDLGATA V
IPC分类号： B32B3/00 , B44C1/22
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： Disclosed is a compliant UV imprint lithography template (10), which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image (20) and an elastomer (22) adapted to adjust the relief image. In an embodiment, the relief image (20) is arranged in a compliant imprinting layer (12) where the elastomer is arranged between the imprinting layer (12) and a rigid transparent substrate (24). In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer (22) and an imprinting layer (12) on a substrate (24) and patterning a relief image (20) into the imprinting layer (12) form the template (10).
摘要翻译：公开了一种兼容的UV压印光刻模板（10），其也可以充当热植入模板，以及用于制造它的方法。模板基本上包括浮雕图像（20）和适于调节浮雕图像的弹性体（22）。在一个实施例中，浮雕图像（20）布置在柔性压印层（12）中，其中弹性体布置在压印层（12）和刚性透明衬底（24）之间。在一个实施例中，模板符合晶片表面。在一个实施例中，在衬底（24）上层叠弹性体（22）和压印层（12）并将浮雕图像（20）图案化成压印层（12）形成模板（10）。

2. 发明申请

WO2007123819A3 METHOD FOR MAKING LENS FEATURES 审中-公开
标题翻译：制作镜头特点的方法
公开(公告)号：WO2007123819A3
公开(公告)日：2008-10-16
申请号：PCT/US2007008433
申请日：2007-04-03
申请人： MOLECULAR IMPRINTS INC
发明人： SCHMID GERARD , STACEY NICHOLAS A , RESNICK DOUGLAS J , VOISIN RONALD D , MYRON LAWRENCE J
IPC分类号： C03C15/00 , H01L21/302
CPC分类号： G03F7/0005 , B82Y10/00 , B82Y40/00 , G02B3/0012 , G03F7/0002
摘要： A process describes a combined use of anisotropic dry etching and isotropic wet etching to produce features. The mask protecting material (301) to be etched is exposed through lithography. An anisotropic dry etch is used to generate a trench through the hole (303). The depth of this etch will increase the overall lenslet aspect ratio which is generated in the next, wet etch.
摘要翻译：一个过程描述了各向异性干蚀刻和各向同性湿蚀刻的组合使用以产生特征。要蚀刻的掩模保护材料（301）通过光刻曝光。使用各向异性干蚀刻来通过孔（303）产生沟槽。该蚀刻的深度将增加在下一次湿式蚀刻中产生的整体小透镜纵横比。

3. 发明申请

WO2005047975A2 DISPENSE GEOMETRY AND CONDUCTIVE TEMPLATE TO ACHIEVE HIGH-SPEED FILLING AND THROUGHPUT 审中-公开
标题翻译：分辨率几何和导电模板，以实现高速灌装和穿透
公开(公告)号：WO2005047975A2
公开(公告)日：2005-05-26
申请号：PCT/US2004038088
申请日：2004-11-05
申请人： MOLECULAR IMPRINTS INC
发明人： SREENIVASAN SIDLGATA V , MCMACKIN IAN M , CHOI BYUNG-JIN , VOISIN RONALD D
IPC分类号： G03F20060101 , G03F
CPC分类号： G03F1/00
摘要： The present invention is directed to a method that employs a dispense geometry, a conductive template and a method of forming the conductive template to achieve high-speed filling and throughput during imprint lithography processes.
摘要翻译：本发明涉及一种使用分配几何形状，导电模板和形成导电模板以在压印光刻工艺期间实现高速填充和生产量的方法的方法。

4. 发明申请

WO2006020194A3 IMPRINT ALIGNMENT METHOD, SYSTEM, AND TEMPLATE 审中-公开
标题翻译：绘制对齐方法，系统和模板
公开(公告)号：WO2006020194A3
公开(公告)日：2009-04-09
申请号：PCT/US2005025390
申请日：2005-07-18
申请人： MOLECULAR IMPRINTS INC
发明人： VOISIN RONALD D
IPC分类号： B05D5/12
CPC分类号： G03F7/7035 , G03F7/70633 , Y10S977/887
摘要： An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where the intentional offset may vary in magnitude and direction from one subfield to the next. The system includes an imprint lithographic machine and first and second lithography templates where the templates are adapted to enable the machine to form first and second features, respectively, and where a second feature is configured to be deliberately offset from a corresponding first feature. The template set includes at least two templates, one having features which are deliberately offset from corresponding features of another template. Also, a method of manufacturing such a template set.
摘要翻译：改进的光刻对准方法，系统和模板。该方法包括在光刻子场内创建有意从其各自的先前层特征偏移的后续层特征，其中有意偏移可以在一个子场到下一个子场的幅度和方向上变化。该系统包括压印光刻机和第一和第二光刻模板，其中模板适于使机器能够分别形成第一和第二特征，并且其中第二特征被配置为故意偏离对应的第一特征。模板集包括至少两个模板，一个具有故意偏离另一个模板的相应特征的特征。另外，制造这样的模板集的方法。

5. 发明申请

WO2007123819B1 METHOD FOR MAKING LENS FEATURES 审中-公开
标题翻译：制作镜头特征的方法
公开(公告)号：WO2007123819B1
公开(公告)日：2008-12-04
申请号：PCT/US2007008433
申请日：2007-04-03
申请人： MOLECULAR IMPRINTS INC
发明人： SCHMID GERARD , STACEY NICHOLAS A , RESNICK DOUGLAS J , VOISIN RONALD D , MYRON LAWRENCE J
IPC分类号： C03C15/00 , H01L21/302
CPC分类号： G03F7/0005 , B82Y10/00 , B82Y40/00 , G02B3/0012 , G03F7/0002
摘要： A process describes a combined use of anisotropic dry etching and isotropic wet etching to produce features. The mask protecting material (301) to be etched is exposed through lithography. An anisotropic dry etch is used to generate a trench through the hole (303). The depth of this etch will increase the overall lenslet aspect ratio which is generated in the next, wet etch.
摘要翻译：一种工艺描述了各向异性干法蚀刻和各向同性湿法蚀刻的组合使用以产生特征。通过光刻曝光要蚀刻的掩模保护材料（301）。使用各向异性干法蚀刻来产生穿过孔（303）的沟槽。该蚀刻的深度将增加在下一次湿法蚀刻中产生的整体小透镜纵横比。

6. 发明申请

WO2004044651B1 A CHUCKING SYSTEM AND METHOD FOR MODULATING SHAPES OF SUBSTRATES 审中-公开
标题翻译：一种用于调制基板形状的切割系统和方法
公开(公告)号：WO2004044651B1
公开(公告)日：2004-08-05
申请号：PCT/US0336012
申请日：2003-11-12
申请人： MOLECULAR IMPRINTS INC
发明人： CHOI BYUNG-JIN , VOISIN RONALD D , SREENIVASAN SIDLGATA V , WATTS MICHAEL P C , BABBS DANIEL A , MEISSL MARIO J , BAILEY HILLMAN L , SCHUMAKER NORMAN E
IPC分类号： B81C99/00 , G03B27/62 , G03F7/00 , G03F7/20 , G03B27/58 , B29C35/08 , G03B27/32 , G03B27/60 , H01L21/461
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/62 , G03F7/707 , G03F7/70875 , H01L21/6838 , H01L21/68714 , H01L21/68735
摘要： The present invention is directed to a chucking system (40) and method for modulating shapes of a substrate (26), having first (26b) and second opposed surfaces (26a). This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate. To that end, the chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first (58) and second (60) spaced-apart support regions. The first support region cinctures the second support region and the first (52) and second (54) recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces.
摘要翻译：本发明涉及一种用于调制具有第一（26b）和第二相对表面（26a）的基底（26）的形状的夹持系统（40）和方法。这是通过在第一相对表面的不同区域之间产生压差来减少第二相对表面中由轴承在基底上的外力产生的结构变形来实现的。为此，夹紧系统包括具有第一和第二相对侧的卡盘体。侧面在其间延伸。第一侧包括第一（58）和第二（60）间隔开的支撑区域。第一支撑区域使第二支撑区域和第一支撑区域（52）和第二凹陷区域（54）分开。第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。第二面和侧面限定外表面。

7. 发明申请

WO2005113257A9 COMPLIANT HARD TEMPLATE FOR UV IMPRINTING 审中-公开
标题翻译：用于UV印刷的合适的硬质模板
公开(公告)号：WO2005113257A9
公开(公告)日：2006-04-06
申请号：PCT/US2005013502
申请日：2005-04-19
申请人： MOLECULAR IMPRINTS INC
发明人： WATTS MICHAEL P C , VOISIN RONALD D , SREENIVASAN SIDLGATA V
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： Disclosed is a compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer form the template.
摘要翻译：公开了一种兼容的UV压印光刻模板，其也可以充当热植入模板，以及用于制造它的方法。模板基本上包括浮雕图像和适于调整浮雕图像的弹性体。在一个实施例中，浮雕图像被布置在柔性压印层中，其中弹性体布置在压印层和刚性透明衬底之间。在一个实施例中，模板符合晶片表面。在一个实施例中，在基板上层叠弹性体和压印层并将浮雕图案图案化成压印层形成模板。

8. 发明申请

WO2004013693A3 SCATTEROMETRY ALIGNMENT FOR IMPRINT LITHOGRAPHY 审中-公开
标题翻译：用于印刷图的散射对准
公开(公告)号：WO2004013693A3
公开(公告)日：2006-01-19
申请号：PCT/US0323948
申请日：2003-07-31
申请人： MOLECULAR IMPRINTS INC , WATTS MICHAEL P C , MCMACKIN IAN , SREENIVASAN SIDLGATA V , CHOI BYUNG-JIN , VOISIN RONALD D , SCHUMAKER NORMAN E
发明人： WATTS MICHAEL P C , MCMACKIN IAN , SREENIVASAN SIDLGATA V , CHOI BYUNG-JIN , VOISIN RONALD D , SCHUMAKER NORMAN E
IPC分类号： G03F20060101 , G03F1/00 , G03F7/20 , G01B11/00 , G01N21/86
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F9/7049 , G03F9/7065
摘要： Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.
摘要翻译：描述了通过压印光刻图案化衬底的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在一个实施例中，模板与衬底上预先形成的层的对准通过使用散射测量来实现。

9. 发明申请

WO2005033797A2 SINGLE PHASE FLUID IMPRINT LITHOGRAPHY METHOD 审中-公开
标题翻译：单相流体印迹光刻法
公开(公告)号：WO2005033797A2
公开(公告)日：2005-04-14
申请号：PCT/US2004031408
申请日：2004-09-24
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： MCMACKIN IAN M , BABBS DANIEL A , VOTH DUANE J , WATTS MICHAEL P C , TRUSKETT VAN N , XU FRANK Y , VOISIN RONALD D , LAD PANKAJ B
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00 , G03F
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying the transport of gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
摘要翻译：本发明涉及通过减少存在于沉积在基底上的粘性液体层中的气穴来减少压印层中的图案失真的方法。为此，该方法包括改变靠近粘性液体设置的气体的输送。具体地，其中待记录图案的基板附近的气氛相对于被沉积的粘性液体是高度可溶的，高度扩散的或者两者都被饱和。另外，或者代替饱和气氛，可以降低气氛的压力。

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