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1. 发明申请

WO2010100270A1 METHOD AND APPARATUS FOR STATISTICAL ILLUMINATION 审中-公开
标题翻译：用于统计照明的方法和装置
公开(公告)号：WO2010100270A1
公开(公告)日：2010-09-10
申请号：PCT/EP2010/052862
申请日：2010-03-05
申请人： MICRONIC LASER SYSTEMS AB , LUBEREK, Jarek , SANDSTRÖM, Torbjörn
发明人： LUBEREK, Jarek , SANDSTRÖM, Torbjörn
IPC分类号： G03F7/20
CPC分类号： G01B11/303 , G03F7/70291 , G03F7/70366 , G03F7/70433 , G03F7/70508 , G03F7/70516 , G03F7/70591 , G03F7/70783
摘要： The technology disclosed relates to an illumination source including numerous laser diodes. In particular, it relates to extending the duty cycle and/or reducing the frequency of component replacement by detecting failure of one or more individual laser diodes and compensating for the failure, without replacing the laser diodes. The technology disclosed can be used in cases of catastrophic laser diode failure by changing the power of remaining laser diodes to restore illumination to the coherence function similar to the pre-failure illumination field. Particular aspects of the technology disclosed are described in the claims, specification and drawings.
摘要翻译：所公开的技术涉及包括许多激光二极管的照明源。特别地，它涉及通过检测一个或多个单个激光二极管的故障并补偿故障来延长占空比和/或降低部件更换的频率，而无需更换激光二极管。所公开的技术可以用于灾难性激光二极管故障的情况下，通过改变剩余的激光二极管的功率来恢复照射到类似于故障前照明场的相干功能。所公开的技术的特定方面在权利要求，说明书和附图中描述。

2. 发明申请

WO2007098935A3 PLATFORMS, APPARATUSES, SYSTEMS AND METHODS FOR PROCESSING AND ANALYZING SUBSTRATES 审中-公开
公开(公告)号：WO2007098935A3
公开(公告)日：2007-09-07
申请号：PCT/EP2007/001725
申请日：2007-02-28
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , STIBLERT, Lars , LUBEREK, Jarek , LOCK, Tomas
发明人： SANDSTRÖM, Torbjörn , STIBLERT, Lars , LUBEREK, Jarek , LOCK, Tomas
IPC分类号： G03F7/20 , H05K3/00
摘要： Devices and methods for manufacturing displays, solar panels and other devices using larger size workpieces are provided. The workpiece is rolled into a cylinder, thereby reducing the physical size by a factor of 3 in one dimension. The stages on which the workpieces are rolled have a cylindrical shape, which allows a more robust and/or compact movement of the glass, reduced machine weight. The workpieces are relatively thin, more flexible, and are rolled onto a cylinder with a diameter of about 1 meter.

3. 发明申请

WO2007096195A1 SLM LITHOGRAPHY: PRINTING TO BELOW K1=.30 WITHOUT PREVIOUS OPC PROCESSING 审中-公开
标题翻译： SLM LITHOGRAPHY：打印到下面K1 = .30，没有先前的OPC处理
公开(公告)号：WO2007096195A1
公开(公告)日：2007-08-30
申请号：PCT/EP2007/001638
申请日：2007-02-26
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , SANDSTRÖM, Torbjörn , IVONIN, Igor
发明人： SANDSTRÖM, Torbjörn , SANDSTRÖM, Torbjörn , IVONIN, Igor
IPC分类号： G03F7/20
CPC分类号： G03F7/70441 , G03F7/70125 , G03F7/70283 , G03F7/70291 , G03F7/70308 , G03F7/70508 , G03F7/70566
摘要： Previously disclosed methods and devices are extended in this application by two-dimensional analysis of optical proximity interactions and by fashioning a computationally efficient kernel for rapid calculation of adjustments to be made. The computations can be made in realtime, whereby the use of OPC assist features can be reduced, with substantial savings in file size and computational requirements.
摘要翻译：先前公开的方法和装置在本申请中通过对光学邻近相互作用的二维分析和通过形成计算上有效的内核来进行扩展来快速计算要进行的调整。可以实时进行计算，从而可以减少OPC辅助功能的使用，大大节省文件大小和计算需求。

4. 发明申请

WO2010100273A2 VARIABLE OVERLAP METHOD AND DEVICE FOR STITCHING TOGETHER LITHOGRAPHIC STRIPES 审中-公开
标题翻译：可变覆盖方法和装置用于缝合平行条纹
公开(公告)号：WO2010100273A2
公开(公告)日：2010-09-10
申请号：PCT/EP2010/052865
申请日：2010-03-05
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , ÖSTERBERG, Anders , IVANSEN, Lars , LINDAU, Sten
发明人： SANDSTRÖM, Torbjörn , ÖSTERBERG, Anders , IVANSEN, Lars , LINDAU, Sten
IPC分类号： G03F7/20
CPC分类号： G01B11/303 , G03F7/70291 , G03F7/70366 , G03F7/70433 , G03F7/70508 , G03F7/70516 , G03F7/70591 , G03F7/70783
摘要： The technology disclosed relates to variable tapers to resolve varying overlaps between adjacent strips that are lithographically printed. Technology disclosed combines an aperture taper function with the variable overlap taper function to transform data and compensate for varying overlaps. The variable taper function varies according to overlap variation, including variation resulting from workpiece distortions, rotor arm position, or which rotor arm printed the last stripe. Particular aspects of the present invention are described in the claims, specification and drawings.
摘要翻译：所公开的技术涉及可变锥度以解决光刻印刷的相邻条之间的不同重叠。公开的技术将孔径锥度函数与可变重叠锥度函数组合以转换数据并补偿变化的重叠。可变锥度函数根据重叠变化而变化，包括由工件变形，转子臂位置或哪个转子臂打印最后一个条纹引起的变化。在权利要求书，说明书和附图中描述了本发明的特定方面。

5. 发明申请

WO2007018464A2 METHOD AND APPARATUS FOR PROJECTION PRINTING 审中-公开
标题翻译：投影印刷的方法和装置
公开(公告)号：WO2007018464A2
公开(公告)日：2007-02-15
申请号：PCT/SE2006/000932
申请日：2006-08-08
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , IVONIN, Igor
发明人： SANDSTRÖM, Torbjörn , IVONIN, Igor
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/701 , G03F7/70308 , G03F7/70566
摘要： A method, apparatus for and a device manufactured by the same, for printing a microlithographic pattern with high fidelity and resolution using simultaneously optimized illuminator and pupil filters having semi-continuous transmission profiles. The optimization can be further improved if the illuminator and pupil filters are polarization selective. The optimization method becomes a linear programming problem and uses a set of relevant features in the merit function. With a suitably chosen merit function and a representative feature set both neutral printing without long-range proximity effects and good resolution of small features can be achieved. With only short-range proximity effects OPC correction is simple and can be done in real time using a perturbation method.
摘要翻译：一种用于使用其制造的方法，装置和装置，用于使用具有半连续透射轮廓的同时优化的照明器和瞳孔滤光器，以高保真度和分辨率打印微光刻图案。如果照明器和光瞳滤光器是偏振选择的，则可以进一步改善优化。优化方法成为线性规划问题，并在优值函数中使用一组相关特征。通过适当选择的优点功能和具有代表性的特征，可以实现不具有远距离邻近效应的中性打印和小特征的良好分辨率。只有短距离邻近效应OPC校正很简单，可以使用扰动方法实时完成。

6. 发明申请

WO2003079091A1 AN ADRESSING METHOD OF MOVEABLE MICROELEMENTS IN A SPATIAL LIGHT MODULATOR (SLM) FOR PATTERING OF A WORKPIECE 审中-公开
标题翻译：空间光调制器（SLM）中移动微型计算机的工作方法
公开(公告)号：WO2003079091A1
公开(公告)日：2003-09-25
申请号：PCT/SE2003/000428
申请日：2003-03-14
申请人： MICRONIC LASER SYSTEMS AB , FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , LJUNGBLAD, Ulric , SANDSTRÖM, Torbjörn , DUERR, Peter
发明人： LJUNGBLAD, Ulric , SANDSTRÖM, Torbjörn , DUERR, Peter
IPC分类号： G02B26/08
CPC分类号： G02B26/0841
摘要： An aspect of the present invention includes a method for modulating at least one pulse of electromagnetic radiation with a spatial light modulator. At least one mechanically movable modulator element is provided. At least one actuating element capable to produce forces on said movable element is provided. A biasing signal is provided to said at least one movable modulator element. An address signal is provided to at least one first electrode belonging to said at least one movable modulator element to move said movable modulator element to a desired modulation state, where said electromagnetic radiation is impinged onto said at least one movable modulator element when being in said desired modulation state. Other aspects of the present invention are reflected in the detailed description, figures and claims.
摘要翻译：本发明的一个方面包括用空间光调制器调制至少一个电磁辐射脉冲的方法。提供至少一个机械可移动的调制器元件。提供能够在所述可移动元件上产生力的至少一个致动元件。偏置信号被提供给所述至少一个可移动调制器元件。地址信号被提供给属于所述至少一个可移动调制器元件的至少一个第一电极，以将所述可移动调制器元件移动到期望的调制状态，其中当所述电磁辐射处于所述调制状态时，所述电磁辐射入射到所述至少一个可移动调制器元件上所需的调制状态。本发明的其它方面在详细描述，附图和权利要求中被体现。

7. 发明申请

WO2007131792A1 PROCESS FOR IMMERSION EXPOSURE OF A SUBSTRATE 审中-公开
标题翻译：基板浸渍曝光的工艺
公开(公告)号：WO2007131792A1
公开(公告)日：2007-11-22
申请号：PCT/EP2007/004383
申请日：2007-05-16
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn
发明人： SANDSTRÖM, Torbjörn
IPC分类号： G03F7/11 , G03F1/00
CPC分类号： G03F7/11 , G03F7/70341
摘要： The technology disclosed relates to immersion lithography, in particular to the exposure of masks by deep and vacuum ultraviolet wavelengths with so-called sub-wavelength resolution. It also is likely to be useful for other methods of sub-wavelength lithography such as lithography on silicon wafers, surface-acoustic wave (SAW) and dif tractive optical devices. In particular, it relates to controlling the contact angle between the immersion fluid and the top-most layer of the substrate, which is in contact with immersion fluid, by adding a wetting control layer over the resist layer. It is useful to control this interface, in which issues such as entrainment of bubbles in the immersion fluid and puddles of fluid remaining after immersion have been encountered.
摘要翻译：所公开的技术涉及浸没式光刻技术，特别是通过具有所谓的亚波长分辨率的深色和真空紫外线波长曝光掩模。它也可能对其他亚波长光刻方法有用，例如硅晶片上的光刻，表面声波（SAW）和差动光学器件。特别地，涉及通过在抗蚀剂层上添加润湿控制层来控制浸没流体和与浸渍流体接触的基底的最上层之间的接触角。控制该接口是有用的，其中遇到浸没液中夹带气泡和浸没后残留的液体的问题。

8. 发明申请

WO2005050720A1 METHOD AND APPARATUS FOR PRINTING PATTERNS WITH IMPROVED CD UNIFORMITY 审中-公开
标题翻译：用于打印具有改进的CD均匀性的图案的方法和装置
公开(公告)号：WO2005050720A1
公开(公告)日：2005-06-02
申请号：PCT/SE2004/001701
申请日：2004-11-19
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn
发明人： SANDSTRÖM, Torbjörn
IPC分类号： H01L21/027
CPC分类号： G03F7/70558 , G03F7/70583 , G03F7/70625
摘要： An aspect of the present invention includes a method to pattern a workpiece with improved CD uniformity using a partially coherent electromagnetic radiation source. Said method including the actions of: determining, for a plurality of layers in said workpiece, CD uniformity as a function of a number of exposure flashes, determining, for the plurality of layers in said workpiece, the cost of patterning as a function of the number of exposure flashes, and selecting the number of exposure flashes on a layer by layer basis, which gives a predetermined CD uniformity corresponding to a preferred cost. Other aspects of the present invention are reflected in the detailed description, figures and claims.
摘要翻译：本发明的一个方面包括使用部分相干的电磁辐射源对具有改进的CD均匀性的工件进行图案化的方法。所述方法包括以下动作：对于所述工件中的多个层，确定作为曝光闪光次数的函数的CD均匀性，确定所述工件中的多个层的图案化成本为曝光次数闪烁，并逐层选择曝光闪光次数，这给出了与优选成本相对应的预定CD均匀度。本发明的其它方面在详细描述，附图和权利要求中被体现。

9. 发明申请

WO2004111701A1 METHOD FOR HIGH PRECISION PRINTING OF PATTERNS 审中-公开
标题翻译：高精度印刷图案的方法
公开(公告)号：WO2004111701A1
公开(公告)日：2004-12-23
申请号：PCT/SE2004/000936
申请日：2004-06-14
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , MARTINSSON, Hans
发明人： SANDSTRÖM, Torbjörn , MARTINSSON, Hans
IPC分类号： G02B26/08
CPC分类号： G03F7/70283 , G03F7/70291
摘要： The present invention includes a method to print patterns with improved edge acuity. The method for printing fine patterns comprises the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude.
摘要翻译：本发明包括一种打印具有改善的边缘锐度的图案的方法。用于打印精细图案的方法包括以下动作：提供SLM并且提供具有不同类别的调制元素的像素布局图案，所述类别在复幅度的相位上不同。

10. 发明申请

WO2010100269A1 ROTOR OPTICS IMAGING METHOD AND SYSTEM WITH VARIABLE DOSE DURING SWEEP 审中-公开
标题翻译：旋转光学成像方法和系统在可变剂量期间
公开(公告)号：WO2010100269A1
公开(公告)日：2010-09-10
申请号：PCT/EP2010/052861
申请日：2010-03-05
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , ASKEBJER, Per
发明人： SANDSTRÖM, Torbjörn , ASKEBJER, Per
IPC分类号： G03F7/20
CPC分类号： G01B11/303 , G03F7/70291 , G03F7/70366 , G03F7/70433 , G03F7/70508 , G03F7/70516 , G03F7/70591 , G03F7/70783
摘要： The technology disclosed relates to translating between a Cartesian grid and a curved scanning path that produces varying exposure doses as the scanning head traces the curved scanning path. It can be applied to writing to or reading from a workpiece. In particular, we teach use of varying exposure dose that compensates for the curved scan path to transit a straight axis. This simplifies either modulation of a modulator, from which data is projected onto the workpiece, or analysis of data collected by a detector, onto which partial images of the workpiece are projected.
摘要翻译：所公开的技术涉及在扫描头跟踪弯曲的扫描路径时在笛卡尔网格和弯曲的扫描路径之间进行转换，其产生变化的曝光剂量。它可以用于写入或从工件读取。特别地，我们教导使用不同的曝光剂量来补偿弯曲的扫描路径以转移直轴。这简化了调制器的调制，数据从其投影到工件上，或者分析由检测器收集的数据，投影到工件的部分图像上。

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