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1. 发明申请

WO2002096956A1 CONTINUOUS PROCESSING APPARATUS BY PLASMA POLYMERIZATION WITH VERTICAL CHAMBER 审中-公开
标题翻译：通过与垂直室进行等离子体聚合的连续加工装置
公开(公告)号：WO2002096956A1
公开(公告)日：2002-12-05
申请号：PCT/KR2001/000907
申请日：2001-05-30
申请人： LG ELECTRONICS INC.
发明人： HA, Sam-Chul , JEONG, Young-Man , YOUN, Dong-Sik , JO, Seak-Je
IPC分类号： C08F2/52
CPC分类号： B05D1/62 , B05D2252/02 , B29C59/14 , H01J37/3277 , H01J2237/3382
摘要： A continuous processing apparatus by plasma polymerization having a plurality of chambers to perform a surface processing by plasma polymerization on the surface of a substance being moved into a chamber, includes at least one vertical chamber in which a substance is vertically moved and at least one electrode is included therein. Since the vertical chamber can be possibly formed solely or by plural ones, or can be formed along with the horizontal chamber, various forms of plasma polymerization processing system can be constructed. In addition, the plurality of chambers can be utilized for various functions and use such as the polymerization chamber, the post-processing chamber and pre-processing chamber according to purposes of surface processing.
摘要翻译：通过等离子体聚合的连续处理装置具有多个室，以通过等离子体聚合在被移动到室中的物质的表面进行表面处理，包括至少一个垂直室，物质在其中垂直移动，至少一个电极被包含在其中。由于垂直室可以单独形成或由多个单独形成，也可以与水平室一起形成，可以构成各种形式的等离子体聚合处理系统。此外，根据表面处理的目的，多个室可以用于各种功能和用途，例如聚合室，后处理室和预处理室。

2. 发明申请

WO2003083163A1 SURFACE TREATMENT SYSTEM AND METHOD THEREOF 审中-公开
标题翻译：表面处理系统及其方法
公开(公告)号：WO2003083163A1
公开(公告)日：2003-10-09
申请号：PCT/KR2002/002472
申请日：2002-12-28
申请人： LG ELECTRONICS INC. , CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul , JUN, Hyun-Woo
发明人： CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul , JUN, Hyun-Woo
IPC分类号： C23C16/00
CPC分类号： C23C16/458 , C23C16/54
摘要： Disclosed are a surface treatment system that includes a deposition chamber (100) for forming a deposition layer at a surface of an object of surface treatment (900); a carrier (910) for carrying the object of surface treatment (900) by mounting thereon, and a power applying unit (230) for forming a deposition reaction by applying a power to the object in the deposition chamber (100), wherein the power applying unit (230) includes a fixed power applying unit (220) installed in the deposition chamber (100) and connected to an external power source (210); and a movable power applying unit (230) installed at the carrier (910) for being electrically connected to the fixed power applying unit (220) movably as the carrier on which the object of surface treatment (900) is mounted goes into the deposition chamber and thereby applying a power to the object of surface treatment mounted on the carrier by contacting thereto.
摘要翻译：公开了一种表面处理系统，其包括用于在表面处理物体（900）的表面上形成沉积层的沉积室（100）; 用于通过安装其上承载表面处理物体（900）的载体（910），以及用于通过向沉积室（100）中的物体施加电力而形成沉积反应的动力施加单元（230），其中，施加单元（230）包括安装在所述沉积室（100）中并连接到外部电源（210）的固定供电单元（220）。以及安装在所述载体（910）上的用于电连接到所述固定电力施加单元（220）的可动电力施加单元（230），所述固定电力施加单元（220）可移动地作为其上安装有所述表面处理（900）的物体的载体进入所述沉积室从而通过与载体接触而对安装在载体上的表面处理对象施加电力。

3. 发明申请

WO2003083168A1 SURFACE TREATMENT SYSTEM AND METHOD 审中-公开
标题翻译：表面处理系统和方法
公开(公告)号：WO2003083168A1
公开(公告)日：2003-10-09
申请号：PCT/KR2002/002471
申请日：2002-12-28
申请人： LG ELECTRONICS INC. , CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul , JUN, Hyun-Woo
发明人： CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul , JUN, Hyun-Woo
IPC分类号： C23C16/44
CPC分类号： C23C16/45563 , C23C16/4412 , C23C16/455 , C23C16/54
摘要： A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object of surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.
摘要翻译：一种表面处理系统，其中用于沉积反应的气体被注入沉积室并施加功率以形成沉积反应，以在表面处理对象的表面形成沉积层，其中所述沉积室具有多个沉积平行布置的空间和用于将沉积反应之后的每个沉积空间的一个或多个表面处理物体输送到每个沉积空间或排放表面处理物体的输送单元。

4. 发明申请

WO2003083165A1 SURFACE TREATMENT SYSTEM AND METHOD 审中-公开
标题翻译：表面处理系统和方法
公开(公告)号：WO2003083165A1
公开(公告)日：2003-10-09
申请号：PCT/KR2002/002492
申请日：2002-12-30
申请人： LG ELECTRONICS INC. , CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul
发明人： CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul
IPC分类号： C23C16/00
CPC分类号： C23C16/4411 , C23C16/50
摘要： A surface treatment system is disclosed to form a deposition layer at a surface of an object of surface treatment by using a deposition reaction in which an electrode (110) for applying power to form a deposition reaction in the deposition chamber (100) is installed between an inner wall (120) of the deposition chamber (100) and an object of surface treatment (900) and further includes a cooling unit (200) installed at the inner wall (120) of the deposition chamber (100) facing the electrode (110) and cooling ambient thereof.
摘要翻译：公开了一种表面处理系统，通过使用沉积反应在表面处理对象的表面上形成沉积层，其中用于在沉积室（100）中施加电力以形成沉积反应的电极（110）安装在沉积室（100）的内壁（120）和表面处理物（900），还包括安装在沉积室（100）的面向电极（100）的内壁（120）处的冷却单元（200） 110）及其冷却环境。

5. 发明申请

WO2003083164A1 SURFACE TREATMENT SYSTEM, SURFACE TREATMENT METHOD AND PRODUCT PRODUCED BY SURFACE TREATMENT METHOD 审中-公开
标题翻译：表面处理系统，表面处理方法和表面处理方法生产的产品
公开(公告)号：WO2003083164A1
公开(公告)日：2003-10-09
申请号：PCT/KR2002/002491
申请日：2002-12-30
申请人： LG ELECTRONICS INC. , CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul , JUN, Hyun-Woo
发明人： CHO, Cheon-Soo , YOUN, Dong-Sik , LEE, Hyun-Wook , HA, Samchul , JUN, Hyun-Woo
IPC分类号： C23C16/00
CPC分类号： F28F19/02 , C23C14/568 , C23C16/54 , F28F2245/02 , F28F2245/04
摘要： A surface treatment system (200) comprises a conveying unit (100) for loading and conveying an object of surface treatment including one or more members which are already processed; and a surface treatment unit for forming a deposition layer on a surface of the object of surface treatment conveyed by the conveying unit (100) using a chemical vapor deposition (CVD) reaction. Thereby, massive surface treatment can be performed so as to form deposition layer on entire surface of members constructing a product by performing the surface treatment forming the deposition layer on the product continuously, and therefore, function of the product can be improved.
摘要翻译：表面处理系统（200）包括用于装载和传送包括已经处理的一个或多个构件的表面处理物体的传送单元（100）以及表面处理单元，用于使用化学气相沉积（CVD）反应在由所述输送单元（100）输送的所述表面处理对象的表面上形成沉积层。由此，可以进行大规模的表面处理，以通过在产品上连续形成沉积层的表面处理在构成产品的构件的整个表面上形成沉积层，从而可以提高产品的功能。

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