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    • 1. 发明申请
    • DETERMINING PLASMA PROCESSING SYSTEM READINESS WITHOUT GENERATING PLASMA
    • 确定等离子体处理系统无需生成等离子体
    • WO2011008376A2
    • 2011-01-20
    • PCT/US2010/037936
    • 2010-06-09
    • LAM RESEARCH CORPORATIONCHOI, BrianYUN, GunsuVENUGOPAL, Vijayakumar C.WILLIAMS, Norman
    • CHOI, BrianYUN, GunsuVENUGOPAL, Vijayakumar C.WILLIAMS, Norman
    • H01L21/66H01L21/02H01L21/00
    • H01J37/32935
    • A test system for facilitating determining whether a plasma processing system (which includes a plasma processing chamber) is ready for processing wafers. The test system may include a computer-readable medium storing at least a test program. The test program may include code for receiving electric parameter values derived from signals detected by at least one sensor when no plasma is present in the plasma processing chamber. The test program may also include code for generating electric model parameter values using the electric parameter values and a mathematical model. The test program may also include code for comparing the electric model parameter values with baseline model parameter value information. The test program may also include code for determining readiness of the plasma processing system based on the comparison. The test system may also include circuit hardware for performing one or more tasks associated with the test program.
    • 用于有助于确定等离子体处理系统(其包括等离子体处理室)是否准备好用于处理晶片的测试系统。 测试系统可以包括至少存储测试程序的计算机可读介质。 测试程序可以包括用于接收由等离子体处理室中没有等离子体时由至少一个传感器检测的信号导出的电参数值的代码。 测试程序还可以包括使用电参数值和数学模型产生电模型参数值的代码。 测试程序还可以包括用于将电模型参数值与基准模型参数值信息进行比较的代码。 测试程序还可以包括用于基于比较来确定等离子体处理系统的准备状态的代码。 测试系统还可以包括用于执行与测试程序相关联的一个或多个任务的电路硬件。