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    • 2. 发明申请
    • ANTENNA STRUCTURE FOR INDUCTIVELY COUPLED PLASMA GENERATOR
    • 用于感应耦合等离子体发生器的天线结构
    • WO2003013198A1
    • 2003-02-13
    • PCT/KR2002/001407
    • 2002-07-26
    • PLASMART CO. LTDLEE, Young KwanLEE, Sang WonUHM, Sae Hoon
    • LEE, Young KwanLEE, Sang WonUHM, Sae Hoon
    • H05H1/24
    • H01J37/321H05H1/46
    • An antenna structure for an inductively coupled plasma generator suitable for processing large-diameter wafers or large, flat-panel display devices by making a plasma density distribution uniform and symmetrical with respect to a rotating direction inside a circular or rectangular chamber in which a wafer is processed. In the antenna structure having a powered end to which RF power is applied and a ground end connected to the ground, at least two loop antenna elements are disposed electrically in parallel with each other, the powered ends and grounds ends of the respective antennas are disposed symmetrically with respect to the center of the antennas, and the antennas crossing each other such that the powered ends and ground ends thereof are disposed at a part far from a chamber and central parts thereof are disposed at a part close to the chamber.
    • 一种用于电感耦合等离子体发生器的天线结构,其适用于通过使等离子体密度分布在圆形或矩形室内相对于旋转方向均匀且对称的方式处理大直径晶片或大型平板显示装置,其中晶片为 处理。 在具有施加RF功率的动力端和连接到地面的接地端的天线结构中,至少两个环形天线元件彼此电并联布置,各个天线的动力端和接地端被布置 相对于天线的中心对称,并且天线彼此交叉,使得其动力端和接地端设置在远离室的一部分处,并且其中心部分设置在靠近室的部分。