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    • 4. 发明申请
    • POSITION MEASURING SYSTEM
    • 位置测量系统
    • WO2006114764A3
    • 2007-03-08
    • PCT/IB2006051283
    • 2006-04-25
    • KONINKL PHILIPS ELECTRONICS NVPRESURA CRISTIAN
    • PRESURA CRISTIAN
    • G01B9/02G01B11/00G02B27/10
    • G02B27/4255
    • Known position measuring systems must be well aligned to provide the necessary resolution for applications such as lithography. The proposed position measuring system (1) comprises a radiation emitting element (2) emitting a radiation beam (3). The radiation beam (3) is diffracted by a diffraction grating (7). First and second diffracted beams (10, 11) having symmetric diffraction orders are reflected back to the radiation-emitting element (2). Meanwhile, the actual frequency of the radiation beam (3) emitting from the radiation-emitting element (2) has been changed so that a beat pattern is produced in the radiation-emitting element (2). By means of a measuring beam (23) this beat pattern is detected in a detector (25).
    • 已知的位置测量系统必须良好对准,以便为诸如光刻的应用提供必要的分辨率。 所提出的位置测量系统(1)包括发射辐射束(3)的辐射发射元件(2)。 辐射束(3)被衍射光栅(7)衍射。 具有对称衍射级的第一和第二衍射光束(10,11)被反射回辐射发射元件(2)。 同时,已经改变了从辐射发射元件(2)发射的辐射束(3)的实际频率,使得在辐射发射元件(2)中产生拍子图案。 通过测量光束(23),在检测器(25)中检测该拍子图案。