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1. 发明申请

WO2020046408A1 OFF-AXIS ILLUMINATION OVERLAY MEASUREMENT USING TWO-DIFFRACTED ORDERS IMAGING 审中-公开
公开(公告)号：WO2020046408A1
公开(公告)日：2020-03-05
申请号：PCT/US2018/065579
申请日：2018-12-14
申请人： KLA-TENCOR CORPORATION
发明人： YONI, Shalibo , PASKOVER, Yuri , LEVINSKI, Vladimir , MANASSEN, Amnon , EISANBACH, Shlomo , LAREDO, Gilad , HILDESHEIM, Ariel
IPC分类号： G03F7/20 , G02B7/38 , G01N21/47 , G01N21/952
摘要： Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices. Methods comprise illuminating the target in a Littrow configuration to yield a first measurement signal comprising a -1st diffraction order and a 0th diffraction order and a second measurement signal comprising a +1st diffraction order and a 0th diffraction order, wherein the -1st diffraction order of the first measurement signal and the +1st diffraction order of the second measurement signal are diffracted at 180 to a direction of the illumination, performing a first measurement of the first measurement signal and a second measurement of the second measurement signal, and deriving metrology metric(s) therefrom. Optionally, a reflected 0th diffraction order may be split to yield components which interact with the -1st and +1st diffraction orders.

2. 发明申请

WO2018063471A2 OPTICAL NEAR-FIELD METROLOGY 审中-公开
标题翻译：光学近场测量
公开(公告)号：WO2018063471A2
公开(公告)日：2018-04-05
申请号：PCT/US2017/041404
申请日：2017-07-10
申请人： KLA-TENCOR CORPORATION
发明人： PASKOVER, Yuri , MANASSEN, Amnon , LEVINSKI, Vladimir
IPC分类号： G01B11/02 , G01B9/02
摘要： Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.
摘要翻译：提供了系统和方法，其利用光学微腔探测器以符合高体积计量要求的方式通过其间的近场相互作用来映射晶圆形貌。光学微腔探针通过参考辐射与微腔中的辐射和晶片特征（诸如装置特征和计量目标特征）的近场相互作用之间的干涉信号的移位来检测晶片上的特征。各种照明和检测配置提供快速和敏感的信号，用于增强光学测量测量的准确性和灵敏度。光学微腔探针可以在相对于晶片的受控高度和位置处被扫描，并提供关于装置和目标特征之间的空间关系的信息。

3. 发明申请

WO2014099959A1 SPECTRAL CONTROL SYSTEM 审中-公开
标题翻译：光谱控制系统
公开(公告)号：WO2014099959A1
公开(公告)日：2014-06-26
申请号：PCT/US2013/075730
申请日：2013-12-17
申请人： KLA-TENCOR CORPORATION
发明人： MANASSEN, Amnon , HILL, Andrew V. , BACHAR, Ohad , ABRAMOV, Avi , NEGRI, Daria
IPC分类号： G02B27/10
CPC分类号： G01B11/02 , F21V5/02 , F21V5/04 , F21V9/40 , F21V14/08 , G01N21/55 , G02B5/18 , G02B5/205 , G02B6/0005 , G02B6/02 , G02B6/3512 , G02B6/4215 , G02B26/008 , G02B26/023 , G02B26/04 , G02B26/0816 , G02B27/1026 , G02B27/141 , G02B27/146
摘要： The disclosure is directed to a system and method of controlling spectral attributes of illumination. According to various embodiments, a portion of illumination including an excluded selection of illumination spectra is blocked, while another portion of the illumination including a transmitted selection of illumination spectra is directed along an illumination path. In some embodiments, optical metrology is performed utilizing the spectrally controlled illumination to enhance measurement capability. For instance, the spectral attributes of illumination utilized to analyze different portions of a sample, such as different semiconductor layers, may be selected according to certain measurement characteristics associated with the analyzed portions of the sample.
摘要翻译：本公开涉及一种控制照明的光谱属性的系统和方法。根据各种实施例，包括排除的照明光谱选择的照明部分被阻挡，而包括发射的照明光谱选择的照明的另一部分沿着照明路径被引导。在一些实施例中，利用光谱控制的照明来执行光学测量以增强测量能力。例如，可以根据与样本的分析部分相关联的某些测量特性来选择用于分析样本的不同部分（例如不同半导体层）的照明的光谱属性。

4. 发明申请

WO2014085338A1 APODIZATION FOR PUPIL IMAGING SCATTEROMETRY 审中-公开
标题翻译：用于PUPIL成像分析的APODIZATION
公开(公告)号：WO2014085338A1
公开(公告)日：2014-06-05
申请号：PCT/US2013/071715
申请日：2013-11-25
申请人： KLA-TENCOR CORPORATION
发明人： HILL, Andrew W. , MANASSEN, Amnon , BRINGOLTZ, Barak , BACHAR, Ohad , GHINOVKER, Mark , BOMZON, Zeev , KANDEL, Daniel
IPC分类号： G01N21/47 , H01L21/66
CPC分类号： G02B27/58 , G01B11/00 , G01N21/47 , G01N21/55 , G01N2201/06113 , G01N2201/068 , G03F7/70625 , G03F7/70633
摘要： The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.
摘要翻译：本公开涉及用于瞳孔成像散射测量的各种变迹方案。在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。在一些实施例中，系统还包括变迹集合区域停止。可以组合这里描述的各种实施例以实现某些优点。

5. 发明申请

WO2014074893A1 METROLOGY TARGET CHARACTERIZATION 审中-公开
标题翻译：计量目标特征
公开(公告)号：WO2014074893A1
公开(公告)日：2014-05-15
申请号：PCT/US2013/069263
申请日：2013-11-08
申请人： KLA-TENCOR CORPORATION
发明人： TARSHISH-SHAPIR, Inna , FELER, Yoel , MARCHELLI, Anat , DINU, Berta , LEVINSKI, Vladimir , EFRATY, Boris , AMIR, Nuriel , GHINOVKER, Mark , MANASSEN, Amnon , ROBINZON, Sigalit
IPC分类号： G06F19/00
CPC分类号： G01N21/95607 , G01N21/47 , G01N21/9501 , G01N2021/95615 , G03F7/70633
摘要： Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.
摘要翻译：提供了方法和系统，其使用选定的度量来识别指定的计量目标异常，并在几何上对所识别的目标异常进行分类，以将它们链接到相应的误差源。可以通过从晶片上的相应目标导出来自指定感兴趣区域（ROI）的目标信号（例如来自目标信号的内核）来执行识别，使用各自的功能从目标信号计算度量，并分析用于表征目标的度量。

6. 发明申请

WO2020106335A1 SINGLE CELL GREY SCATTEROMETRY OVERLAY TARGETS AND THEIR MEASUREMENT USING VARYING ILLUMINATION PARAMETER(S) 审中-公开
公开(公告)号：WO2020106335A1
公开(公告)日：2020-05-28
申请号：PCT/US2019/045039
申请日：2019-08-05
申请人： KLA-TENCOR CORPORATION
发明人： MANASSEN, Amnon , PASKOVER, Yuri , AMIT, Eran
IPC分类号： G01B11/27 , G01B9/02 , G01N21/47 , G03F7/20 , G01N21/956
摘要： Scatterometry overlay (SCOL) measurement methods, systems and targets are provided to enable efficient SCOL metrology with in-die targets. Methods comprise generating a signal matrix by: illuminating a SCOL target at multiple values of at least one illumination parameter, and at multiple spot locations on the target, wherein the illumination is at a NA (numerical aperture) >1/3 yielding a spot diameter

7. 发明申请

WO2019118039A1 ENHANCING METROLOGY TARGET INFORMATION CONTENT 审中-公开
公开(公告)号：WO2019118039A1
公开(公告)日：2019-06-20
申请号：PCT/US2018/052333
申请日：2018-09-24
申请人： KLA-TENCOR CORPORATION
发明人： AMIT, Eran , MANASSEN, Amnon , GUTMAN, Nadav
IPC分类号： G01B11/27 , G01N21/47 , G01N21/956 , G03F7/20 , H01L23/544
摘要： Metrology targets designs, design methods and measurement methods are provided, which reduce noise and enhance measurement accuracy. Disclosed targets comprise an additional periodic structure which is orthogonal to the measurement direction along which given target structures are periodic. For example, in addition to two or more periodic structures along each measurement direction in imaging or scatterometry targets, a third, orthogonal periodic structure may be introduced, which provides additional information in the orthogonal direction, can be used to reduce noise, enhances accuracy and enables the application of machine learning algorithms to further enhance accuracy. Signals may be analyzed slice-wise with respect to the orthogonal periodic structure, which can be integrated in a process compatible manner in both imaging and scatterometry targets.

8. 发明申请

WO2019108260A1 MEASUREMENT OF OVERLAY ERROR USING DEVICE INSPECTION SYSTEM 审中-公开
公开(公告)号：WO2019108260A1
公开(公告)日：2019-06-06
申请号：PCT/US2018/039192
申请日：2018-06-24
申请人： KLA-TENCOR CORPORATION
发明人： HOO, George (Choon) , JI, Fangren , MANASSEN, Amnon , YERUSHALMI, Liran , MANI, Antonio , PARK, Allen , PANDEV, Stilian , SHCHEGROV, Andrei , MADSEN, Jon
IPC分类号： G03F7/20
摘要： A method and system for measuring overlay in a semiconductor manufacturing process comprise capturing an image of a feature in an article at a predetermined manufacturing stage, deriving a quantity of an image parameter from the image and converting the quantity into an overlay measurement. The conversion is by reference to an image parameter quantity derived from a reference image of a feature at the same predetermined manufacturing stage with known OVL. The image is not a detailed image and the size of the feature is smaller than the resolution of the imaging tool. There is also disclosed a method of determining a device inspection recipe for use by an inspection tool comprising identifying device patterns as candidate device care areas that may be sensitive to OVL, deriving an OVL response for each identified pattern, correlating the OVL response with measured OVL, and selecting some or all of the device patterns as device care areas based on the correlation. Some embodiments use a novel target which may be printed in a die area or on a die.

9. 发明申请

WO2019027705A1 SPECTRAL FILTER FOR HIGH-POWER FIBER ILLUMINATION SOURCES 审中-公开
公开(公告)号：WO2019027705A1
公开(公告)日：2019-02-07
申请号：PCT/US2018/043211
申请日：2018-07-23
申请人： KLA-TENCOR CORPORATION
发明人： HILL, Andrew , BACHAR, Ohad , ABRAMOV, Avi , MANASSEN, Amnon
IPC分类号： G02B5/20
摘要： A spectral filter includes a curved filtering element including a concave surface forming a portion of a sphere. The concave surface may be positioned to receive light diverging from an output face of an optical fiber located at a first location proximate to a center of the sphere corresponding to the concave surface. The concave surface may transmit a first portion of a spectrum of the light. The concave surface may further reflect and focus a second portion of the spectrum to a second location proximate to the center of the sphere. The spectral filter may further include a collector to direct the second portion of the spectrum away from the output face of the optical fiber.

10. 发明申请

WO2018187108A1 SYSTEMS AND METHODS FOR METROLOGY WITH LAYER-SPECIFIC ILLUMINATION SPECTRA 审中-公开
公开(公告)号：WO2018187108A1
公开(公告)日：2018-10-11
申请号：PCT/US2018/024702
申请日：2018-03-28
申请人： KLA-TENCOR CORPORATION
发明人： MANASSEN, Amnon , NEGRI, Daria , HILL, Andrew V. , BACHAR, Ohad , LEVINSKI, Vladimir , PASKOVER, Yuri
IPC分类号： H01L21/66
摘要： A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.

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