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1. 发明申请

WO2004026757A2 CONTROLLING ELECTROMECHANICAL BEHAVIOR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE 审中-公开
标题翻译：控制微电子系统设备中结构的电化学行为
公开(公告)号：WO2004026757A2
公开(公告)日：2004-04-01
申请号：PCT/US2003/030016
申请日：2003-09-18
申请人： IRIDIGM DISPLAY CORPORATION , MILES, Mark, W. , BATEY, John , CHUI, Clarence , KOTHARI, Manish
发明人： MILES, Mark, W. , BATEY, John , CHUI, Clarence , KOTHARI, Manish
IPC分类号： B81B
CPC分类号： G02B26/001 , B81B3/0035
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的薄膜和特征光学响应的第一层，其中特征光学响应是期望的，并且特征机电响应是不希望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。

2. 发明申请

WO2005001545A1 THIN FILM PRECURSOR STACK FOR MEMS MANUFACTURING 审中-公开
标题翻译：薄膜前驱体用于MEMS制造
公开(公告)号：WO2005001545A1
公开(公告)日：2005-01-06
申请号：PCT/US2004/020330
申请日：2004-06-23
申请人： IRIDIGM DISPLAY CORPORATION , MILES, Mark, W. , GALLY, Brian, J. , CHUI, Clarence
发明人： MILES, Mark, W. , GALLY, Brian, J. , CHUI, Clarence
IPC分类号： G02B26/00
CPC分类号： B81C1/00182 , B81B2201/047 , B81C1/0038
摘要： This invention provides a precursor film stack for use in the production of MEMS devices. The precursor film stack comprises a carrier substrate, a first layer formed on the carrier substrate, a second layer of an insulator material formed on the first layer, and a third layer of a sacrificial material formed on the second layer.
摘要翻译：本发明提供了用于制造MEMS器件的前体膜叠层。前体膜叠层包括载体衬底，形成在载体衬底上的第一层，形成在第一层上的绝缘体材料的第二层和形成在第二层上的牺牲材料的第三层。

3. 发明申请

WO2005019899A1 SEPARABLE MODULATOR 审中-公开
标题翻译：可分离调制器
公开(公告)号：WO2005019899A1
公开(公告)日：2005-03-03
申请号：PCT/US2004/026458
申请日：2004-08-12
申请人： IRIDIGM DISPLAY CORPORATION , SAMPSELL, Jeffrey, B. , MILES, Mark, W. , CHUI, Clarence , KOTHARI, Manish
发明人： SAMPSELL, Jeffrey, B. , MILES, Mark, W. , CHUI, Clarence , KOTHARI, Manish
IPC分类号： G02B26/00
CPC分类号： B82Y20/00 , G01J3/26 , G02B6/12 , G02B26/001 , G02B2006/12104 , G02F1/13725 , G02F1/216 , G02F2203/03 , G09G3/3466
摘要： A separable modulator architecture is disclosed. The modulator has a mirror suspended from a flexible layer over a cavity. The flexible layer also forms supports and support posts for the mirror. An alternative separable modulator architecture has a mirror suspended over a cavity. The modulator is supported by supports and support posts. The support posts comprise a flexible layer over support post plugs. A bus structure may be formed upon the flexible layer arranged over the support posts.
摘要翻译：公开了一种可分离调制器架构。调制器具有从空腔上的柔性层悬挂的反射镜。柔性层还形成用于镜子的支撑和支撑柱。另一种可分离的调制器架构具有悬挂在空腔上的反射镜。调制器由支持和支持柱支持。支撑柱包括在支撑柱塞上的柔性层。总线结构可以形成在布置在支撑柱上的柔性层上。

4. 发明申请

WO2003073151A1 A MICROELECTROMECHANICAL SYSTEMS DEVICE AND METHOD FOR FABRICATING SAME 审中-公开
标题翻译：一种微电子系统装置及其制造方法
公开(公告)号：WO2003073151A1
公开(公告)日：2003-09-04
申请号：PCT/US2002/013462
申请日：2002-04-29
申请人： IRIDIGM DISPLAY CORPORATION , CHUI, Clarence , MILES, Mark, W.
发明人： CHUI, Clarence , MILES, Mark, W.
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： One aspect of the invention provides a method for fabricating an array of first elements (108), each first element conforming to a first geometry; fabricating at least one array of second elements (112), each second element conforming to a second geometry; wherein fabricating the arrays comprises selecting a defining aspect of each of the first and second geometries based on a defining characteristic of each of the first and second elements; and normalizing differences in an actuation voltage required to actuate each of the first (108) and second elements (112), wherein the differences are as a result of the selected defining aspect, the defining characteristic of each of the elements being unchanged.
摘要翻译：本发明的一个方面提供一种制造第一元件阵列的方法，每个第一元件符合第一几何形状; 制造至少一个第二元件阵列（112），每个第二元件符合第二几何形状; 其中制造所述阵列包括基于所述第一和第二元件中的每一个的限定特征来选择所述第一和第二几何形状中的每一个的限定方面; 以及归一化驱动所述第一（108）和第二元件（112）中的每一个所需的致动电压的差异，其中所述差异作为所选定义方面的结果，每个所述元件的定义特性不变。

5. 发明申请

WO2003069413A1 A METHOD FOR FABRICATING A STRUCTURE FOR A MICROELECTROMECHANICAL SYSTEMS (MEMS) DEVICE 审中-公开
标题翻译：一种用于制造微电子系统（MEMS）器件的结构的方法
公开(公告)号：WO2003069413A1
公开(公告)日：2003-08-21
申请号：PCT/US2002/013442
申请日：2002-04-29
申请人： IRIDIGM DISPLAY CORPORATION , MILES, Mark, W.
发明人： MILES, Mark, W.
IPC分类号： G03F7/20
CPC分类号： G02B26/001 , B81B2201/042 , B81B2203/0315 , B81C1/00396 , B81C2201/0109 , B81C2203/0136
摘要： The invention provides a microfabrication process which may be used to manufacture a MEMS device. The process comprises depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer; patterning said one or a stack of layers to provide at least one aperture therethrough through which said base layer is exposed; depositing a photosensitive layer over said one or a stack of layers; and passing light through said at least one aperture to expose said photosensitive layer.
摘要翻译：本发明提供了可用于制造MEMS装置的微细加工方法。该方法包括在基底层上沉积一层或一叠层，所述层中的所述一层或最上层为牺牲层; 图案化所述一层或一叠层以提供穿过其中的所述基层暴露的至少一个孔; 在所述一层或一叠层上沉积感光层; 并使光通过所述至少一个孔以暴露所述感光层。

6. 发明申请

WO2003007049A1 PHOTONIC MEMS AND STRUCTURES 审中-公开
标题翻译：光电MEMS和结构
公开(公告)号：WO2003007049A1
公开(公告)日：2003-01-23
申请号：PCT/US2001/041341
申请日：2001-07-10
申请人： IRIDIGM DISPLAY CORPORATION , MILES, Mark, W.
发明人： MILES, Mark, W.
IPC分类号： G02B26/00
CPC分类号： G02B26/0841 , B82Y20/00 , G01J3/0256 , G01J3/26 , G01L5/0047 , G02B5/02 , G02B6/12007 , G02B6/122 , G02B6/1225 , G02B6/13 , G02B6/266 , G02B6/3516 , G02B6/3522 , G02B6/353 , G02B6/3536 , G02B6/3546 , G02B6/3548 , G02B6/356 , G02B6/357 , G02B6/3578 , G02B6/3584 , G02B6/3594 , G02B6/3598 , G02B6/43 , G02B26/001 , G02B26/02 , G02B26/08 , G02B26/0833 , G02B2006/12104 , G02B2006/12109 , G02B2006/12126 , G02B2006/12159 , G02B2006/12164 , G09G3/3466 , G09G2310/02 , G09G2310/0254 , G09G2310/06
摘要： An interference modulator (Imod) incorporates anti-reflection coating (100) and/or microfabricated supplemental lighting sources. An efficient drive scheme is provided for matrix addressed arrays of IMods (108) or other mechanical devices. An improved color scheme provides greater flexibility. Electronic hardware can be field reconfigured to accommodate different display formats and/or application functions. An IMod's electromechanical behavior can be decoupled from its optical behavior. An improved actuation means is provided, some one of which may be hidden from view. An IMod or IMod array (108) is fabricated and used in conjunction with a MEMS switch or switch array. An IMod can be used for optical switching and modulation. Some IMods incorporate 2-D and 3-D photonic structures. A variety of applications for modulation of light are discussed. A MEMS manufacturing and packaging approach if providing based on a continuous web process. IMods can be used as test structures for the evaluation of residual stress in deposited materials.
摘要翻译：干涉调制器（Imod）包括防反射涂层（100）和/或微加工补充光源。为IMod（108）或其他机械设备的矩阵寻址阵列提供了有效的驱动方案。改进的配色方案提供更大的灵活性。电子硬件可以进行现场重新配置，以适应不同的显示格式和/或应用功能。 IMod的机电行为可以与其光学行为分离。提供了一种改进的致动装置，其中一些可以隐藏在视野之内。 IMod或IMod阵列（108）被制造并与MEMS开关或开关阵列一起使用。 IMod可用于光开关和调制。一些IMods包含2-D和3-D光子结构。讨论了各种调制光的应用。 MEMS制造和封装方法，如果提供基于连续的网络过程。可以将IMODs用作评估沉积材料残余应力的测试结构。

7. 发明申请

WO2006036435A1 CONTROLLING ELECTROMECHANICAL BEHAVIOR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE 审中-公开
标题翻译：控制微电子系统设备中结构的电化学行为
公开(公告)号：WO2006036435A1
公开(公告)日：2006-04-06
申请号：PCT/US2005/030902
申请日：2005-08-30
申请人： IDC, LLC , MILES, Mark, W. , BATEY, John , CHUI, Clarence , KOTHARI, Manish , TUNG, Ming-Hau
发明人： MILES, Mark, W. , BATEY, John , CHUI, Clarence , KOTHARI, Manish , TUNG, Ming-Hau
IPC分类号： G02B26/00
CPC分类号： B81B3/0086 , B81C2201/0109 , B81C2201/014 , B81C2201/053 , G02B26/001
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的薄膜和特征光学响应的第一层，其中特征光学响应是期望的，并且特征机电响应是不希望的; 以及通过在所述微机电系统装置的启动期间至少减少其上积累的电荷，来修改所述第一层的特征机电响应。

8. 发明申请

WO2009137535A1 STATIC INTERFEROMETRIC DISPLAY DEVICE AND METHOD FOR PROVIDING THE SAME 审中-公开
标题翻译：静态干涉显示装置及其提供方法
公开(公告)号：WO2009137535A1
公开(公告)日：2009-11-12
申请号：PCT/US2009/042916
申请日：2009-05-05
申请人： QUALCOMM MEMS TECHNOLOGIES, INC. , CHUI, Clarence , MILES, Mark, W. , KOTHARI, Manish
发明人： CHUI, Clarence , MILES, Mark, W. , KOTHARI, Manish
IPC分类号： B41J2/01 , B41M3/00 , G02B5/20 , G02B26/00 , G02B5/28 , B81C1/00
CPC分类号： G02B26/001 , G02B5/201 , G02B5/223 , Y10T428/249921
摘要： Disclosed are apparatus and methods for fabricating a static interferometric display device. A plurality of sputtering modules is used to form static interferometric elements on a substrate. These elements each have a plurality of interferometric sub-elements that each has an interferometric stack. A first sub-element of each element is formed so that an interferometric modulation of light due to the first element's stack transmits at a first color, and a second sub-element of each element is formed so that a second color is transmitted. The sub-elements of each element are arranged with respect to each other so that all of the elements appear as a third color to a user if all the sub-elements of each element are left unmasked. A printing system is then used to mask one or more sub-elements of one or more elements so as to form, with the elements, a static image having multiple colors.
摘要翻译：公开了用于制造静态干涉式显示装置的装置和方法。多个溅射模块用于在衬底上形成静态干涉测量元件。这些元件各自具有多个具有干涉式叠层的干涉子元件。每个元件的第一子元件被形成为使得由于第一元件的堆叠而导致的光的干涉调制以第一颜色发送，并且每个元件的第二子元件被形成为使得第二颜色被传输。每个元素的子元素相对于彼此布置，使得如果将每个元素的所有子元素保持未屏蔽，则所有元素在用户身上显示为第三种颜色。然后使用打印系统来掩蔽一个或多个元件的一个或多个子元件，以便与元件形成具有多种颜色的静态图像。

9. 发明申请

WO2007014022A1 MEMS DEVICES HAVING SUPPORT STRUCTURES AND METHODS OF FABRICATING THE SAME 审中-公开
标题翻译：具有支持结构的MEMS器件及其制造方法
公开(公告)号：WO2007014022A1
公开(公告)日：2007-02-01
申请号：PCT/US2006/028342
申请日：2006-07-20
申请人： QUALCOMM MEMS TECHNOLOGIES, INC. , CHUI, Clarence , CHUNG, Wonsuk , GANTI, Surya, Prakash , KOTHARI, Manish , MILES, Mark, W. , SAMPSELL, Jeffrey, B. , SASAGAWA, Teruo
发明人： CHUI, Clarence , CHUNG, Wonsuk , GANTI, Surya, Prakash , KOTHARI, Manish , MILES, Mark, W. , SAMPSELL, Jeffrey, B. , SASAGAWA, Teruo
IPC分类号： B81B3/00 , G02B26/00
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或者由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，铆钉结构的部分延伸穿过可移动层并接触下面的层。在其他实施例中，用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线，保护电引线免受损坏或其他干扰。

10. 发明申请

WO2004006003A1 A DEVICE HAVING A LIGHT-ABSORBING MASK A METHOD FOR FABRICATING SAME 审中-公开
标题翻译：具有遮光罩的装置一种用于制造它的方法
公开(公告)号：WO2004006003A1
公开(公告)日：2004-01-15
申请号：PCT/US2003/020433
申请日：2003-06-27
申请人： IRIDIGM DISPLAY CORPORATION
发明人： MILES, Mark, W.
IPC分类号： G02F1/03
CPC分类号： G02B26/001 , G02B5/003 , G02B5/288 , G02B26/02 , G02B27/0018 , G03F7/0007
摘要： The invention provides a method for fabricating an optical device comprising at least one optical component formed on a transparent substrate. The method comprises determining an area of the substrate that is to be lightabsorbing; and fabricating a light-absorbing mask on the determined area prior to fabricating the at least one optical component. The invention also provides an optical device comprising a substrate (102); and first and second optical components formed on the substrate, wherein the first optical component (104) has two modes, each mode producing a different optical response to light incident thereupon, and wherein the second optical component (108) absorbs light and is formed on the substrate before the first optical component is formed.
摘要翻译：本发明提供一种制造光学器件的方法，该光学器件包括形成在透明衬底上的至少一个光学部件。该方法包括确定要吸收的衬底的面积; 以及在制造所述至少一个光学部件之前在所确定的区域上制造光吸收掩模。本发明还提供一种包括衬底（102）的光学器件; 以及形成在所述基板上的第一和第二光学部件，其中所述第一光学部件（104）具有两种模式，每种模式对入射到其上的光产生不同的光学响应，并且其中所述第二光学部件（108）吸收光并形成在形成第一光学部件之前的基板。

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