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1. 发明申请

WO03043026A8 ARTICLE IRRADIATION SYSTEM SHIELDING 审中-公开
标题翻译：文章辐射系统屏蔽
公开(公告)号：WO03043026A8
公开(公告)日：2004-04-29
申请号：PCT/BE0200172
申请日：2002-11-14
申请人： ION BEAM APPLIC SA
发明人： NELSON GLENN
IPC分类号： G21F7/00 , G21K5/10
CPC分类号： G21K5/10 , G21F7/00
摘要： An article irradiation system is arranged into an upper level and a lower level. The upper level houses a radiation source used to generate beams of radiation for irradiating articles. The radiation source can emit multiple beams of radiation, for irradiating articles on the upper and the lower levels. The upper level has an upper level shield, arranged as an inner shield and an outer shield, for attenuating radiation generated by the radiation source. The lower level can be disposed below ground level, and a portion of the lower level is covered by the upper level shield, which reduces the shielding requirements for a ceiling of the lower level.
摘要翻译：物品照射系统布置在上层和下层。上层设有辐射源，用于产生用于照射物品的辐射束。辐射源可以发射多束辐射，用于照射上层和下层的物品。上层具有布置为内屏蔽和外屏蔽的上层屏蔽，用于衰减由辐射源产生的辐射。下层可以设置在地面以下，下层的一部分被上层屏蔽覆盖，这降低了对较低层的天花板的屏蔽要求。

2. 发明申请

WO03043026A2 ARTICLE IRRADIATION SYSTEM SHIELDING 审中-公开
标题翻译：文章辐射系统屏蔽
公开(公告)号：WO03043026A2
公开(公告)日：2003-05-22
申请号：PCT/BE0200172
申请日：2002-11-14
申请人： ION BEAM APPLIC SA
发明人： NELSON GLENN
IPC分类号： G21F7/00 , G21K5/10 , G21F
CPC分类号： G21K5/10 , G21F7/00
摘要： An article irradiation system is arranged into an upper level and a lower level. The upper level houses a radiation source used to generate beams of radiation for irradiating articles. The radiation source can emit multiple beams of radiation, for irradiating articles on the upper and the lower levels. The upper level has an upper level shield, arranged as an inner shield and an outer shield, for attenuating radiation generated by the radiation source. The lower level can be disposed below ground level, and a portion of the lower level is covered by the upper level shield, which reduces the shielding requirements for a ceiling of the lower level.
摘要翻译：物品照射系统布置在上层和下层。上层设有辐射源，用于产生用于照射物品的辐射束。辐射源可以发射多束辐射，用于照射上层和下层的物品。上层具有布置为内屏蔽和外屏蔽的上层屏蔽，用于衰减由辐射源产生的辐射。下层可以设置在地面以下，下层的一部分被上层屏蔽覆盖，这降低了对较低层的天花板的屏蔽要求。

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