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1. 发明申请

WO2009032960A1 MULTI-REGION PROCESSING SYSTEM AND HEADS 审中-公开
标题翻译：多区域处理系统和头
公开(公告)号：WO2009032960A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/075303
申请日：2008-09-05
申请人： INTERMOLECULAR, INC. , ENDO, Rick , WEINER, Kurt , DE, Indranil , TSUNG, James , ZHAO, Maosheng
发明人： ENDO, Rick , WEINER, Kurt , DE, Indranil , TSUNG, James , ZHAO, Maosheng
IPC分类号： H01L21/205
CPC分类号： C23C16/45565 , B05B14/30 , B05B16/80 , B05D1/10 , B05D1/62 , C23C16/4412 , C23C16/45589 , C23C16/4584 , C23C16/4585 , C23C16/4587 , C23C16/50 , Y10S438/942
摘要： The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.
摘要翻译：本发明的各种实施例提供了基板和工艺头在最小空间中访问整个晶片的相对运动，以在基板的各个区域上进行组合处理。这些头使得所描述的室内的现场隔离处理和使用它们的方法被描述。

2. 发明申请

WO2009033067A3 COMBINATORIAL PROCESS SYSTEM 审中-公开
公开(公告)号：WO2009033067A3
公开(公告)日：2009-03-12
申请号：PCT/US2008/075459
申请日：2008-09-05
申请人： INTERMOLECULAR, INC. , ENDO, Rick , WEINER, Kurt , DE, Indranil , TSUNG, James , ZHAO, Maosheng , CHENG, Jeremy
发明人： ENDO, Rick , WEINER, Kurt , DE, Indranil , TSUNG, James , ZHAO, Maosheng , CHENG, Jeremy
IPC分类号： H01L21/20 , H01L21/44 , C23C16/00
摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

3. 发明申请

WO2008011329A2 METHOD AND SYSTEM FOR ISOLATED AND DISCRETIZED PROCESS SEQUENCE INTEGRATION 审中-公开
标题翻译：用于分离和分离过程序列集成的方法和系统
公开(公告)号：WO2008011329A2
公开(公告)日：2008-01-24
申请号：PCT/US2007/073368
申请日：2007-07-12
申请人： INTERMOLECULAR, INC. , CHIANG, Tony, P. , ENDO, Richard, R. , TSUNG, James
发明人： CHIANG, Tony, P. , ENDO, Richard, R. , TSUNG, James
IPC分类号： C23C16/00
CPC分类号： H01L21/67207 , H01L21/67155 , H01L21/67225 , H01L21/67236
摘要： A system for processing a semiconductor substrate is provided. The system includes a mainframe having a plurality of modules attached thereto. The modules include processing modules, storage modules, and transport mechanisms. The processing modules may include combinatorial processing modules and conventional processing modules, such as surface preparation, thermal treatment, etch and deposition modules. In one embodiment, at least one of the modules stores multiple masks. The multiple masks enable in-situ variation of spatial location and geometry across a sequence of processes and/or multiple layers of a substrate to be processed in another one of the modules. A method for processing a substrate is also provided.
摘要翻译：提供了一种用于处理半导体衬底的系统。该系统包括具有附接到其上的多个模块的主机。模块包括处理模块，存储模块和传输机制。处理模块可以包括组合处理模块和常规处理模块，例如表面处理，热处理，蚀刻和沉积模块。在一个实施例中，至少一个模块存储多个掩模。多个掩模使得能够在另一个模块中要处理的衬底的一系列工艺和/或多个层的空间位置和几何形状的原位变化。还提供了一种处理基板的方法。

4. 发明申请

WO2013090001A1 COMBINATORIAL RF BIAS METHOD FOR PVD 审中-公开
标题翻译： PVD的组合RF偏置方法
公开(公告)号：WO2013090001A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/066532
申请日：2012-11-26
申请人： INTERMOLECULAR, INC.
发明人： SHAO, ShouQian , CHILD, Kent , TSUNG, James , YANG, Hong Sheng
IPC分类号： C23C16/04
CPC分类号： C23C14/044 , C23C14/34 , C23C14/505 , H01J37/32651 , H01J37/34
摘要： In some embodiments of the present invention, a shield is provided wherein the shield comprises a ceramic insulation material. The ceramic insulation material fills the space between the shield and the substrate surface and maintains a gap of less than about 2 mm and advantageously, less than about 1 mm. The shield may further be connected to ground through a low-pass filter operable to prevent the loss of high frequency RF power through the shield to ground but allow the dissipation of charge from the shield to ground through a low frequency or DC signal. In some embodiments, the ceramic insulating material further comprises a removable ceramic insert. The ceramic insert may be used to select the size of the aperture. The ceramic insert further comprises a slot operable to isolate the bottom lip of the ceramic insert from the upper portion for a PVD deposition.
摘要翻译：在本发明的一些实施例中，提供了一种屏蔽件，其中屏蔽件包括陶瓷绝缘材料。陶瓷绝缘材料填充屏蔽件和基板表面之间的空间，并且保持小于约2mm并且有利地小于约1mm的间隙。屏蔽可以通过低通滤波器进一步连接到地面，该低通滤波器可操作以防止通过屏蔽到地面的高频RF功率的损失，但允许通过低频或DC信号从屏蔽到地面的电荷的耗散。在一些实施例中，陶瓷绝缘材料还包括可移除的陶瓷插入件。陶瓷插入件可用于选择孔径的尺寸。陶瓷插入件还包括可操作以将陶瓷插入件的底部唇缘与上部隔离用于PVD沉积的槽。

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