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1. 发明申请

WO2006091413B1 SILICON GAS INJECTOR AND METHOD OF MAKING 审中-公开
标题翻译：硅气体喷射器及其制造方法
公开(公告)号：WO2006091413B1
公开(公告)日：2007-11-22
申请号：PCT/US2006004991
申请日：2006-02-13
申请人： INTEGRATED MATERIALS INC , ZEHAVI RANAAN , REYNOLDS REESE
发明人： ZEHAVI RANAAN , REYNOLDS REESE
IPC分类号： C23C16/00 , B32B37/00 , F16K51/00
CPC分类号： C23C16/45578 , C23C16/4583
摘要： A gas injector tube (40) usable in a batch thermal treatment oven including two silicon shells (54, 56) joined together with an adhesive formed of a fine silicon powder and a curable silica-forming agent, such as a spin-on glass, which is ultrasonically homogenized. The tube may have a gas outlet (52) on its distal end or be sealed with a silicon cap (86) and have side outlet holes (84) formed along its side. The silicon injector tube may be used in combination with a silicon tower and a silicon liner so that all bulk parts within the furnace hot zone are formed of silicon.
摘要翻译：一种可用于批量热处理炉的气体注射管（40），该批量热处理炉包括用硅粉和可固化二氧化硅形成剂如旋涂玻璃形成的粘合剂连接在一起的两个硅壳（54,56）这是超声波均匀化。该管可以在其远端具有气体出口（52）或者用硅盖（86）密封并且具有沿着其侧面形成的侧出口孔（84）。硅喷射器管可以与硅塔和硅衬里组合使用，使得炉热区内的所有散装部分由硅形成。

2. 发明申请

WO2006118774A3 SILICON SHELF TOWERS 审中-公开
标题翻译：硅胶带
公开(公告)号：WO2006118774A3
公开(公告)日：2009-06-04
申请号：PCT/US2006014222
申请日：2006-04-14
申请人： INTEGRATED MATERIALS INC , ZEHAVI RANAAN , REYNOLDS REESE
发明人： ZEHAVI RANAAN , REYNOLDS REESE
IPC分类号： C23C16/00
CPC分类号： C30B31/14 , C23C16/4581 , C23C16/4583 , H01L21/67303 , H01L21/67306 , H01L21/67309
摘要： A silicon shelf tower (10) for batch thermal processing of silicon wafers (46) in a vertical furnace. The tower includes at least three silicon legs (16, 18, 20) joined to bases and having a vertical arrangement of slots (22). Silicon shelves (24) are detachably loaded by sliding therm through the slots in the side legs and into the slot of the back leg. An interlocking mechanism detachably locks the shelves to the back leg while the slots in the two side legs laterally constrains the shelves. The shelves include cutouts (38) to allow a robot paddle to load and unload wafers to the shelves. Circular holes (32, 34) in the shelves relieve stress and prevent wafer sticking Preferably, the shelves are formed from randomly oriented polycrystalline silicon (ROPSi). The shelves and towers can alternatively be made of other materials such as quartz and silicon carbide.
摘要翻译：一种用于在垂直炉中对硅晶片（46）进行批量热处理的硅架塔（10）。塔架包括至少三个连接到底座并具有垂直排列的槽（22）的硅脚（16,18,20）。硅架（24）通过滑动热穿过侧腿中的狭槽并进入后腿的槽而可拆卸地加载。互锁机构将搁架可拆卸地锁定到后腿，同时两个侧腿中的狭槽侧向地约束搁架。搁架包括切口（38），以允许机器人桨将载片和卸载晶片装载到货架上。搁板中的圆孔（32,34）缓解应力并防止晶片粘贴。优选地，搁板由随机取向的多晶硅（ROPSi）形成。架子和塔架可以替代地由其它材料制成，例如石英和碳化硅。

3. 发明申请

WO2008030301B1 JET MILL PRODUCING FINE SILICON POWDER 审中-公开
标题翻译：喷枪生产精细硅粉
公开(公告)号：WO2008030301B1
公开(公告)日：2008-06-26
申请号：PCT/US2007016757
申请日：2007-07-26
申请人： INTEGRATED MATERIALS INC , ZEHAVI RANAAN , BOYLE JAMES E
发明人： ZEHAVI RANAAN , BOYLE JAMES E
IPC分类号： B22F9/00
CPC分类号： B02C19/063
摘要： A method of jet milling silicon powder in which silicon pellets are fed into a jet mill producing a gas vortex in which the pellets are entrained and pulverized by collisions with each other or walls of the milling chamber. The chamber walls are advantageously formed of high-purity silicon as are other parts contacting the unground pellets or ground powder. The pellets and chamber parts may be formed of electronic grade silicon but polycrystalline silicon may be used for chamber parts. Additionally, the particle feed tube in which the particles are entrained in a gas flow and the vortex finder operating as the outlet at the center of the vortex may be formed of silicon. The milling and feed gas may be nitrogen supplied from a liquid-nitrogen tank lined with stainless steel. The feed pellets may be formed by chemical vapor deposition.
摘要翻译：一种喷射研磨硅粉末的方法，其中将硅颗粒进料到喷射磨机中，产生气体涡流，其中颗粒被夹带并通过与研磨室的壁碰撞而粉碎。室壁有利地由高纯度硅形成，其它部分与未研磨的颗粒或粉末粉末接触。颗粒和室部件可以由电子级硅形成，但多晶硅可用于室部件。此外，其中颗粒被夹带在气流中的颗粒进料管和在涡流中心作为出口操作的涡流发生器可以由硅形成。研磨和进料气体可以是由内衬有不锈钢的液氮罐供应的氮气。进料颗粒可以通过化学气相沉积形成。

4. 发明申请

WO2007008383A2 DETACHABLE EDGE RING FOR THERMAL PROCESSING SUPPORT TOWERS 审中-公开
标题翻译：用于热处理支撑功能的可拆卸边缘环
公开(公告)号：WO2007008383A2
公开(公告)日：2007-01-18
申请号：PCT/US2006024716
申请日：2006-06-26
申请人： INTEGRATED MATERIALS INC , CADWELL TOM L , ZEHAVI RANAAN , SKYLAR MICHAEL
发明人： CADWELL TOM L , ZEHAVI RANAAN , SKYLAR MICHAEL
IPC分类号： C30B11/00 , B65D85/00
CPC分类号： C30B31/14 , C30B25/12 , H01L21/67309 , Y10S414/135 , Y10S414/137 , Y10S414/138 , Y10T117/10
摘要： An edge ring (152) for use in batch thermal processing of wafers (30) supported on a vertical tower (140) within a furnace (160). The edge rings are have a width approximately overlapping the periphery of the wafers and are detachably supported on the towers equally spaced between the wafer to reduce thermal edge effects. The edge rings have may have internal or external recesses to interlock with structures on or adjacent the fingers of the tower legs (142, 144, 146) supporting the wafers or one or more steps formed on the lateral sides of the edge ring may slide over and then fall below a locking ledge associated with the support fingers. Preferably, the tower and edge ring and other parts (168, 180) of the furnace adjacent the hot zone are composed of silicon.
摘要翻译：一种边缘环（152），用于在支撑在炉子（160）内的垂直塔架（140）上的晶片（30）的批量热处理。边缘环的宽度大致与晶片的周边重叠，并且可拆卸地支撑在等离子间隔在晶片之间的塔上，以减少热边缘效应。边缘环可以具有内部或外部凹部以与支撑晶片的塔腿（142,144,146）的指状物或附近的结构互锁，或者形成在边缘环的侧面上的一个或多个步骤可以滑过然后落在与支撑指状件相关联的锁定凸缘下方。优选地，邻近热区的炉和边缘环以及其它部分（168,180）由硅组成。

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