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1. 发明申请

WO2012170767A1 BRUSH MANDREL FOR PVA SPONGE BRUSH 审中-公开
标题翻译： PVA海绵刷BRUSH MANDREL
公开(公告)号：WO2012170767A1
公开(公告)日：2012-12-13
申请号：PCT/US2012/041477
申请日：2012-06-08
申请人： ILLINOIS TOOL WORKS INC. , WILLIS, Robert , WITHERS, Bradley, S.
发明人： WILLIS, Robert , WITHERS, Bradley, S.
IPC分类号： B08B1/04 , A46B13/00
CPC分类号： H01L21/67046 , A46B13/001 , B08B1/04
摘要： A cleaning device for cleaning substrates is provided. The cleaning device includes a generally cylindrically-shaped brush mandrel and a cylindrical brush. The brush mandrel has a body section with an outer surface positioned about a central axis. The outer surface is interrupted by an engagement member having primary features adjacent secondary features. The brush has a hollow bore formed around the brush mandrel with an inner surface interrupted by a second engagement member which mates the first engagement member. The primary features flow in a direction generally perpendicular to a rotational direction of the brush mandrel around the central axis and include a first surface which is generally perpendicular to the outer surface. The secondary features include a second surface which flows in a direction generally perpendicular to the first surface and along the central axis. No primary feature includes a radially obstructing feature formed over any secondary feature.
摘要翻译：提供了用于清洁基板的清洁装置。清洁装置包括大致圆柱形的刷心轴和圆柱形刷。刷心轴具有主体部分，其外表面围绕中心轴线定位。外表面被具有相邻次要特征的主要特征的接合构件中断。刷子具有形成在刷心轴周围的中空孔，其内表面被与第一接合构件配合的第二接合构件中断。主要特征沿着大致垂直于中心轴线的刷心的旋转方向的方向流动并且包括大致垂直于外表面的第一表面。次要特征包括沿着大致垂直于第一表面并沿着中心轴线的方向流动的第二表面。没有主要特征包括在任何次要特征上形成的径向阻碍特征。

2. 发明申请

WO2013152008A1 CONICAL SPONGE BRUSH FOR CLEANING SEMICONDUCTOR WAFERS 审中-公开
标题翻译：用于清洁半导体波形的锥形海绵刷
公开(公告)号：WO2013152008A1
公开(公告)日：2013-10-10
申请号：PCT/US2013/034964
申请日：2013-04-02
申请人： ILLINOIS TOOL WORKS INC.
发明人： TYRRELL, Jeffrey, J. , WITHERS, Bradley, S.
IPC分类号： B08B1/04 , A46B13/00 , H01L21/67
CPC分类号： A46B9/08 , A46B7/04 , A46B13/00 , B08B1/04 , B08B11/00 , H01L21/02096 , H01L21/67046
摘要： A cleaning device for cleaning a substrate (104) is provided. In one aspect, the cleaning device includes a brush (110) including a first end (124), a second end(126) opposed to the first end (124), an outer surface (114), and a hollow bore (112) defined in the brush (110) about a central axis of the brush. The brush (110) defines a first cross- sectional area near the first end (124) and a second cross-sectional area near the second end (126). Both the first and second cross- sectional areas are generally perpendicular to the central axis (al) and the second cross-sectional area is greater than the first cross- sectional area.
摘要翻译：提供了一种用于清洁基板（104）的清洁装置。在一个方面，清洁装置包括刷子（110），其包括第一端（124），与第一端（124）相对的第二端（126），外表面（114）和中空孔（112）限定在刷子（110）周围的刷子的中心轴线。刷（110）限定靠近第一端（124）的第一横截面区域和靠近第二端（126）的第二横截面区域。第一和第二横截面面积通常垂直于中心轴线（a1），第二横截面面积大于第一横截面面积。

3. 发明申请

WO2013151967A1 CONCAVE NODULE SPONGE BRUSH 审中-公开
标题翻译： CONCAVE NODULE海绵布
公开(公告)号：WO2013151967A1
公开(公告)日：2013-10-10
申请号：PCT/US2013/034897
申请日：2013-04-02
申请人： ILLINOIS TOOL WORKS INC.
发明人： TYRRELL, Jeffrey, J. , WITHERS, Bradley, S.
IPC分类号： H01L21/67 , B08B1/04
CPC分类号： H01L21/02096 , B08B1/04 , H01L21/67046
摘要： Cleaning devices and methods for cleaning substrates are provided. In one aspect, a cleaning device for cleaning a substrate includes a brush including an outer surface and defines a hollow bore positioned around a central axis of the brush, and nodules formed on the outer surface of the brush and each nodule includes a concave surface. Each concave surface defines an outer edge surrounding a central concavity point. In another aspect, a method for cleaning a substrate includes engaging a substrate with a cleaning device. The cleaning device includes a brush including an outer surface and defines a hollow bore positioned around a first axis of the brush, and nodules formed on the outer surface and each nodule includes a concave surface. Each concave surface defines an outer edge surrounding a central concavity point. The method also includes rotating the brush about the first axis in a first rotational direction.
摘要翻译：提供了用于清洁基板的清洁装置和方法。在一个方面，一种用于清洁基底的清洁装置包括：刷子，其包括外表面并且限定围绕刷子的中心轴线定位的中空孔，并且形成在刷子的外表面上的结节和每个结节包括凹面。每个凹面限定围绕中心凹点的外边缘。在另一方面，一种用于清洁衬底的方法包括使衬底与清洁装置接合。清洁装置包括刷子，其包括外表面并且限定围绕刷子的第一轴线定位的中空孔，并且形成在外表面上的结节和每个结节包括凹面。每个凹面限定围绕中心凹点的外边缘。该方法还包括在第一旋转方向上围绕第一轴线旋转刷子。

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