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    • 1. 发明申请
    • PRINTABILITY VERIFICATION BY PROGRESSIVE MODELING ACCURACY
    • 通过逐步建模准确性进行可打印性验证
    • WO2008057996A3
    • 2008-07-10
    • PCT/US2007083441
    • 2007-11-02
    • IBMLAI KAFAIROSENBLUTH ALAN EGALLATIN GREGG MMUKHERJEE MAHARAJ
    • LAI KAFAIROSENBLUTH ALAN EGALLATIN GREGG MMUKHERJEE MAHARAJ
    • G06F17/50
    • G03F1/36
    • A fast method of verifying a lithographic mask design is provided wherein catastrophic errors (432) are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models (411), including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side- lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.
    • 提供了验证光刻掩模设计的快速方法,其中通过使用包括光学和抗蚀剂模型的逐渐更准确的图像模型(411)迭代模拟和验证掩模布局的图像来识别灾难性错误(432)。 逐渐精确的光学模型包括提供连续影响较小的SOCS内核。 构建对应的抗蚀剂模型,其可以仅包括对应于光学模型的SOCS内核项,或者可以包括不同影响范围的图像特征项。 与过量光相关的错误,例如桥接,旁瓣或SRAF打印错误,优选地用明场模拟来识别,而与光线不足有关的错误例如颈缩或线端缩短覆盖错误优选地用暗场识别 模拟。