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1. 发明申请

WO2004068555A2 REPAIR AND RESTORATION OF DAMAGED DIELECTRIC MATERIALS AND FILMS 审中-公开
标题翻译：损坏的电介质材料和膜的修复和恢复
公开(公告)号：WO2004068555A2
公开(公告)日：2004-08-12
申请号：PCT/US2004/002252
申请日：2004-01-26
申请人： HONEYWELL INTERNATIONAL INC , FAN, Wenya , LU, Victor , THOMAS, Michael , DANIELS, Brian , NGUYEN, Tiffany , ZHOU, De-Ling , NAMAN, Ananth , JIN, Lei , BHANAP, Anil
发明人： FAN, Wenya , LU, Victor , THOMAS, Michael , DANIELS, Brian , NGUYEN, Tiffany , ZHOU, De-Ling , NAMAN, Ananth , JIN, Lei , BHANAP, Anil
IPC分类号： H01L
CPC分类号： H01L21/31058 , H01L21/3105 , H01L21/76801 , H01L2924/0002 , H01L2924/00
摘要： Methods of repairing voids in a material are described herein that include: a) providing a material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c) chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. Methods of carbon restoration in a material are also described that include: a) providing a carbon-deficient material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c)chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. In addition, methods are described herein for reducing the condensation of a film and/or a carbon-deficient film that include: a) providing a film having a plurality of reactive silanol groups; b) placing the film into a plasma chamber; c) introducing a plurality of reactive organic moieties-containing silanes into the chamber; and d) allowing the silanes to react with at least some of the reactive silanol groups. Dielectric materials and low-k dielectric materials are described herein that comprise: a) an inorganic material having a plurality of silicon atoms; and b) a plurality of organic moiety-containing silane compounds, wherein the silane compounds are coupled to the inorganic material through at least some of the silicon atoms.
摘要翻译：本文描述了修复材料中空隙的方法，其包括：a）提供具有多个反应性硅烷醇基团的材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。还描述了材料中碳修复的方法，其包括：a）提供具有多个反应性硅烷醇基团的缺碳材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。此外，本文描述了用于减少膜和/或缺碳膜的冷凝的方法，其包括：a）提供具有多个反应性硅烷醇基团的膜; b）将膜放入等离子体室中; c）将多个含反应性有机部分的硅烷引入所述室中; 和d）允许硅烷与至少一些反应性硅烷醇基团反应。介质材料和低k介电材料在本文中描述，其包括：a）具有多个硅原子的无机材料; 和b）多个含有机部分的硅烷化合物，其中硅烷化合物通过至少一些硅原子与无机材料偶联。

2. 发明申请

WO2002083327A1 LAYERED STACKS AND METHODS OF PRODUCTION THEREOF 审中-公开
标题翻译：分层堆叠及其生产方法
公开(公告)号：WO2002083327A1
公开(公告)日：2002-10-24
申请号：PCT/US2002/011927
申请日：2002-04-16
申请人： HONEYWELL INTERNATIONAL INC. , THOMAS, Michael , DANIELS, Brian , APEN, Paul , NAMAN, Ananth , IWAMOTO, Nancy , KOROLEV, Boris , LI, Bo
发明人： THOMAS, Michael , DANIELS, Brian , APEN, Paul , NAMAN, Ananth , IWAMOTO, Nancy , KOROLEV, Boris , LI, Bo
IPC分类号： B05D7/00
CPC分类号： H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02304 , H01L21/02362 , H01L21/312 , H01L21/3122 , H01L21/31695 , H01L21/76807 , H01L21/76828 , H05K1/0313
摘要： Low dielectric constant layered materials and a methof for making said layered materials comprising the steps of: a) providing a surface ; b) spinning a dielectric material on to the surface; c) curing the dielectric material to form a dielectric layer; d) spinning a low dielectric constant material on to the dielectric layer; and e) curing the low dielectric constant material to form a low dielectric constant layer. Each layer can be spun-on to the layered component and subsequently cured before additional layers are added or all layers can be spun-on to the layered component and then the entire stack is cured at once.
摘要翻译：低介电常数层状材料和制造所述层状材料的方法包括以下步骤：a）提供表面; b）将介电材料旋转到表面上; c）固化电介质材料以形成电介质层; d）将低介电常数材料旋转到介电层上; 以及e）固化所述低介电常数材料以形成低介电常数层。每个层可以旋涂到层状部件上，随后在添加另外的层之前固化，或者所有层可以旋涂到层状部件上，然后整个堆叠立即固化。

3. 发明申请

WO2003103020A3 LAYERED COMPONENTS, MATERIALS, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
公开(公告)号：WO2003103020A3
公开(公告)日：2003-12-11
申请号：PCT/US2003/017656
申请日：2003-06-03
申请人： HONEYWELL INTERNATIONAL INC. , IWAMOTO, Nancy , THOMAS, Michael
发明人： IWAMOTO, Nancy , THOMAS, Michael
IPC分类号： H01L21/31
摘要： A layered component is described that includes: a substrate; a dielectric material having a plurality of pores, wherein the material is coupled to the substrate; and a diffusion blocking material coupled to the low k dielectric material, wherein the diffusion blocking material is attracted to the low k dielectric material. A layered material is also described that includes: a dielectric material having a plurality of pores, wherein each pore has a pore diameter; and a layer comprising a plurality of diffusion blocking particles, wherein the particles have a article size that is larger than the pore diameter. Methods of minimizing the diffusion of metal atoms into a material having a plurality of pores are further disclosed that include: providing a precursor material that comprises molecules having a molecule size that is larger than a pore diameter of any of the plurality of pores; providing a solvent carrier solution; combining the precursor material and the solvent carrier solution to form a diffusion blocking reactive solution; and applying the diffusion blocking reactive solution to a layer of porous material.

4. 发明申请

WO2004043631A1 DIE CAST SPUTTER TARGETS 审中-公开
标题翻译： DIE CAST SPUTTER目标
公开(公告)号：WO2004043631A1
公开(公告)日：2004-05-27
申请号：PCT/US2002/036069
申请日：2002-11-07
申请人： HONEYWELL INTERNATIONAL INC. , THOMAS, Michael
发明人： THOMAS, Michael
IPC分类号： B22D27/09
CPC分类号： B22D27/045 , B22D25/02 , C23C14/3414
摘要： Die cast sputter targets, and methods and devices that facilitate formation of die cast sputter targets. Materials to be used in casting a sputter target are melted in a crucible (200), poured into a die (100), and allowed to cool to form the sputter target. The die utilizes heated sidewalls (140) and a cool base (130) to promote bottom to top solidification and a target having uniform top solid interfacial propagation. The die cast sputter target can be used to form layers in microelectronic devices.
摘要翻译：压铸溅射靶，以及促进压铸溅射靶的形成的方法和装置。将用于铸造溅射靶的材料在坩埚（200）中熔化，倒入模具（100）中，并使其冷却以形成溅射靶。模具利用加热的侧壁（140）和冷却底座（130）来促进底部到顶部的固化以及具有均匀的顶部固体界面传播的靶。压铸溅射靶可用于在微电子器件中形成层。

5. 发明申请

WO2004024979A1 SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION 审中-公开
标题翻译：传感器系统和方法用于检测材料磨损和表面缺陷
公开(公告)号：WO2004024979A1
公开(公告)日：2004-03-25
申请号：PCT/US2003/028832
申请日：2003-09-12
申请人： HONEYWELL INTERNATIONAL INC. , BONNE, Ulrich , MOSHER, John , POBLANO, Philip , GRABMEIER, Susanne , THOMAS, Michael , STROTHERS, Susan
发明人： BONNE, Ulrich , MOSHER, John , POBLANO, Philip , GRABMEIER, Susanne , THOMAS, Michael , STROTHERS, Susan
IPC分类号： C23C14/34
CPC分类号： H01J37/3479 , C23C14/3407
摘要： A sensor system has been developed for measuring erosion of a sputtering target (510) in a vacuum chamber that includes: a) a sputtering target, b) a wafer, c) a vacuum atmosphere located between the sputtering target and the wafer, and d) a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure. A method of detecting erosion in a sputtering target (510) has also been developed that includes: a) providing a sputtering target (510), b) providing a wafer (550), c) initiating a vacuum atmosphere and a plasma that are located between the sputtering target (510) and the wafer (550), d) providing a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is partly exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure, e) collecting data from the data collection apparatus; and f) automatically terminating the operation of the plasma once the data collection apparatus determines that the sputtering target (510) has sufficiently eroded.
摘要翻译：已经开发了用于测量真空室中的溅射靶（510）的侵蚀的传感器系统，所述真空室包括：a）溅射靶，b）晶片，c）真空气氛，位于溅射靶和晶片，以及d）直接耦合到溅射靶（510）的传感器装置（525），其中传感器装置（525）暴露于真空气氛并且包括暴露于大气压的数据收集装置。还已经开发了检测溅射靶（510）中的侵蚀的方法，该方法包括：a）提供溅射靶（510），b）提供晶片（550），c）引发位于其中的真空气氛和等离子体在所述溅射靶（510）和所述晶片（550）之间，d）提供直接耦合到所述溅射靶（510）的传感器装置（525），其中所述传感器装置（525）部分地暴露于所述真空气氛并且包括数据收集装置，其暴露于大气压力，e）从数据收集装置收集数据; 和f）一旦数据采集装置确定溅射靶（510）已被充分侵蚀，就自动终止等离子体的操作。

6. 发明申请

WO2003103020A2 LAYERED COMPONENTS, MATERIALS, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
标题翻译：分层组分，材料，生产方法及其用途
公开(公告)号：WO2003103020A2
公开(公告)日：2003-12-11
申请号：PCT/US2003/017656
申请日：2003-06-03
申请人： HONEYWELL INTERNATIONAL INC. , IWAMOTO, Nancy , THOMAS, Michael
发明人： IWAMOTO, Nancy , THOMAS, Michael
IPC分类号： H01L
CPC分类号： H01L21/02126 , H01L21/02203 , H01L21/31695 , H01L21/76801 , H01L21/7682 , H01L21/76825 , H01L21/76828 , H01L23/5329 , H01L2221/1047 , H01L2924/0002 , H01L2924/09701 , H01L2924/00
摘要： A layered component is described that includes: a substrate; a dielectric material having a plurality of pores, wherein the material is coupled to the substrate; and a diffusion blocking material coupled to the low k dielectric material, wherein the diffusion blocking material is attracted to the low k dielectric material. A layered material is also described that includes: a dielectric material having a plurality of pores, wherein each pore has a pore diameter; and a layer comprising a plurality of diffusion blocking particles, wherein the particles have a article size that is larger than the pore diameter. Methods of minimizing the diffusion of metal atoms into a material having a plurality of pores are further disclosed that include: providing a precursor material that comprises molecules having a molecule size that is larger than a pore diameter of any of the plurality of pores; providing a solvent carrier solution; combining the precursor material and the solvent carrier solution to form a diffusion blocking reactive solution; and applying the diffusion blocking reactive solution to a layer of porous material.
摘要翻译：描述了一种分层部件，其包括：基板; 具有多个孔的介电材料，其中所述材料耦合到所述基底; 以及耦合到所述低k电介质材料的扩散阻挡材料，其中所述扩散阻挡材料被所述低k介电材料吸引。还描述了一种层状材料，其包括：具有多个孔的介电材料，其中每个孔具有孔径; 以及包含多个扩散阻挡颗粒的层，其中所述颗粒具有大于孔径的制品尺寸。还公开了使金属原子扩散到具有多个孔的材料中的扩散的方法，其包括：提供包含分子尺寸大于多个孔中的任何孔的孔径的分子的前体材料; 提供溶剂载体溶液; 组合前体材料和溶剂载体溶液以形成扩散阻断反应溶液; 并将扩散阻挡反应溶液施加到多孔材料层上。

7. 发明申请

WO2011060266A1 FIXATION DEVICE AND MULTIPLE-AXIS JOINT FOR A FIXATION DEVICE 审中-公开
标题翻译：固定装置和固定装置的多轴联接
公开(公告)号：WO2011060266A1
公开(公告)日：2011-05-19
申请号：PCT/US2010/056541
申请日：2010-11-12
申请人： AMEI TECHNOLOGIES, INC. , VASTA, Paul , FRANCO, Miguel , THOMAS, Michael
发明人： VASTA, Paul , FRANCO, Miguel , THOMAS, Michael
IPC分类号： A61B17/62
CPC分类号： A61B17/60 , A61B17/62
摘要： A fixator system includes an active strut that can be gradually or acutely adjusted. Adjustments can be made in six degrees of freedom. Embodiments of the active strut can provide for two of the six degrees of freedom being about a first common point of rotation, and another two of the six degrees of freedom being about a second common point of rotation. Embodiments of the fixator can include one or more active struts in combination with one or more passive struts. The passive struts can be rigidly locked or can be unlocked so as to be freely and acutely adjustable while gradual or acute adjustments are made using the one or more active struts.
摘要翻译：固定器系统包括可逐渐或急剧调整的活动支柱。可以在六个自由度进行调整。活动支柱的实施例可以提供围绕第一公共转动点的六个自由度中的两个自由度，并且六个自由度中的另外两个约为第二公共旋转点。固定器的实施例可以包括与一个或多个被动支柱组合的一个或多个活动支柱。被动支柱可以被刚性地锁定或可以被解锁，以便在使用一个或多个主动支柱进行逐渐或急剧的调整时可以自由且可锐度地调节。

8. 发明申请

WO2011006118A2 CUSTOM FILTRATION SLIDE AND FILTRATION APPARATUS AND METHOD 审中-公开
标题翻译：自定义过滤器和过滤装置和方法
公开(公告)号：WO2011006118A2
公开(公告)日：2011-01-13
申请号：PCT/US2010/041596
申请日：2010-07-09
申请人： IKONISYS, INC. , THOMAS, Michael , CLIMER, Charles , SCHLUETER, Richard , TAFAS, Triantafyllos, P. , KILPATRICK, Michael , SEPPO, Antti
发明人： THOMAS, Michael , CLIMER, Charles , SCHLUETER, Richard , TAFAS, Triantafyllos, P. , KILPATRICK, Michael , SEPPO, Antti
IPC分类号： G02B21/34 , G01N1/28 , G01N33/48
CPC分类号： G02B21/34
摘要： An filter, apparatus and method for preparing microscope slides is presented. After filtration of the specimen is performed, the filter containing the filtrand is configured to be microscopically examined. The filter may either be affixed to a microscope slide or, in an embodiment, the filter may be incorporated into a microscope slide.
摘要翻译：提出了一种用于制备显微镜幻灯片的过滤器，设备和方法。在进行样品过滤之后，将包含过滤液的过滤器配置为进行显微镜检查。过滤器可以固定到显微镜载玻片上，或者在一个实施例中，过滤器可以结合到显微镜载片中。

9. 发明申请

WO2010100287A1 BARRIER FOR IMPLANTATION INTO BONE, IN PARTICULAR FOR VERTEBROPLASTY 审中-公开
标题翻译： BARRIER用于植入骨骼，特别是VERTEBROPLASTY
公开(公告)号：WO2010100287A1
公开(公告)日：2010-09-10
申请号：PCT/EP2010/052927
申请日：2010-03-08
申请人： SOMATEX MEDICAL TECHNOLOGIES GMBH , CERVINCOVA, Danica , REINDL, Andreas , TAYLOR, Mark , BORRIS, Jochen , THOMAS, Michael , KNIEP, Frank , HORNSCHEIDT, Dirk , WEISE, Thammo
发明人： CERVINCOVA, Danica , REINDL, Andreas , TAYLOR, Mark , BORRIS, Jochen , THOMAS, Michael , KNIEP, Frank , HORNSCHEIDT, Dirk , WEISE, Thammo
IPC分类号： A61B17/88 , A61B17/70 , A61F2/46
CPC分类号： A61B17/7097 , A61B17/8811 , A61B17/8858 , A61B2017/00004
摘要： The invention relates to a barrier for implantation into bone, in particular for vertebroplasty, the barrier having a bag (123) and at least one filling hole (126) to which a feeding device (121) for feeding a filler medium (119) is attachable, a closure apparatus (125) being provided on or in the filling hole (126) which closes or clogs automatically after completion of a filling of the bag (123) with filler medium (119).
摘要翻译：本发明涉及一种用于植入骨骼的屏障，特别是用于椎体成形术，所述屏障具有袋（123）和至少一个填充孔（126），供给装置（121）用于进料填充介质（119）设置在填充孔（126）上或填充孔（126）中的闭合装置（125），其在填充介质（119）填充袋（123）完成之后自动关闭或堵塞。

10. 发明申请

WO2009117102A3 BACKGROUND LIGHT DETECTION SYSTEM FOR A FLOW CYTOMETER 审中-公开
公开(公告)号：WO2009117102A3
公开(公告)日：2009-09-24
申请号：PCT/US2009/001701
申请日：2009-03-17
申请人： NPE SYSTEMS, INC. , THOMAS, Richard , THOMAS, Michael
发明人： THOMAS, Richard , THOMAS, Michael
IPC分类号： G01N21/01
摘要： A flow cytometer and system having an array of processing elements that detect and convert energy entering the detector into a digital signal which has had background energy filtered.

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