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1. 发明申请

WO2006036433A3 IMPRINT LITHOGRAPHY APPARATUS AND METHOD EMPLOYING AN EFFECTIVE PRESSURE 审中-公开
标题翻译：印刷机的设备和使用有效压力的方法
公开(公告)号：WO2006036433A3
公开(公告)日：2006-08-10
申请号：PCT/US2005030880
申请日：2005-08-30
申请人： HEWLETT PACKARD DEVELOPMENT CO , WU WEI , TONG WILLIAM M , GAO JUN , PICCIOTTO CARL E
发明人： WU WEI , TONG WILLIAM M , GAO JUN , PICCIOTTO CARL E
IPC分类号： G03F7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint apparatus (100, 100', 200, 220) and method 300 employ an effective pressure P eff in imprint lithography. The imprint apparatus (100, 100', 200, 220) includes a compressible chamber (111) that encloses an imprint mold (120, 228a) having a mold pattern (122) and a sample (130, 228b) to be imprinted (300). The chamber (111) is compressed (330, 340, 350) to imprint (360) the mold pattern (122) on the sample (130, 228b). The mold (120, 228a) is pressed (350) against the sample (130, 228b) with the effective pressure P eff . The effective pressure P eff is controlled by a selected ratio A cavity /A contact of a cavity area A cavity of the chamber (111) to a contact area A contact between the mold (120, 228a) and the sample (130, 228b).
摘要翻译：压印装置（100,100'，200,220）和方法300在压印光刻中采用有效压力P eff。压印装置（100,100'，200,220）包括可压缩室（111），其包围具有模具图案（122）和要印刷的样品（130,228b）的压印模具（120,228a）（300 ）。腔室（111）被压缩（330,340,350）以在样品（130,228b）上印模（360）模具图案（122）。模具（120,228a）以有效压力P eff被压制（350）抵靠样品（130,228b）。有效压力P eff通过空腔区域A腔的选定比例A / A 来控制，（111）的位置与模具（120,228a）和样品（130,228b）之间的接触区域A _接触。

2. 发明申请

WO2006058192A3 MULTIPLE LAYER ALIGNMENT SENSING 审中-公开
标题翻译：多层排列感应
公开(公告)号：WO2006058192A3
公开(公告)日：2006-08-03
申请号：PCT/US2005042694
申请日：2005-11-23
申请人： HEWLETT PACKARD DEVELOPMENT CO , PICCIOTTO CARL E , GAO JUN
发明人： PICCIOTTO CARL E , GAO JUN
IPC分类号： G03F9/00
CPC分类号： G03F9/7003 , G03F9/7038 , G03F9/7088
摘要： Using an imaging system (104) in relation to a plurality of material layers (114, 116) is described, the material layers being separated by a distance greater than a depth of field of the imaging system. A focal plane (106) of the imaging system and a first (114) of the plurality of material layers are brought into correspondence. A first image including at least a portion of the first material layer (114) having a first feature of interest thereon (116) is stored. The focal plane (106) of the imaging system and a second (118) of the plurality of material layers are brought into correspondence. A second image including at least a portion of the second material layer (118) having a second feature of interest thereon (120) is acquired. The first and second images are processed for automatic computation of an alignment measurement between the first and second features of interest.
摘要翻译：描述了关于多个材料层（114,116）使用成像系统（104），材料层以大于成像系统的景深的距离分开。使成像系统的焦平面（106）和多个材料层中的第一个（114）对应。存储包括其上具有第一感兴趣特征（116）的第一材料层（114）的至少一部分的第一图像。成像系统的焦平面（106）和多个材料层中的第二个（118）对应。获取包括其上具有第二感兴趣特征（120）的第二材料层（118）的至少一部分的第二图像。处理第一和第二图像以自动计算第一和第二感兴趣特征之间的对准测量值。

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