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    • 1. 发明申请
    • PATTERNING OF IONIC POLYMERS
    • 离子聚合物的构图
    • WO2008051432A3
    • 2009-04-09
    • PCT/US2007022219
    • 2007-10-18
    • HARVARD COLLEGELAHAV MICHALWINKLEMAN ADAMNAROVLYANSKY MAXPEREZ-CASTILLEJOS RAQUELWEISS EMILY ARODRIGUEZ LEONARD N JWHITESIDES GEORGE M
    • LAHAV MICHALWINKLEMAN ADAMNAROVLYANSKY MAXPEREZ-CASTILLEJOS RAQUELWEISS EMILY ARODRIGUEZ LEONARD N JWHITESIDES GEORGE M
    • G03F7/00
    • G03F7/0002B82Y10/00B82Y40/00Y10T428/24479
    • In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL- PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone- novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.
    • 一方面,提供了离子型聚合物(例如聚(丙烯酸))的薄膜图案化方法。 这些方法可以产生离子型聚合物如阳离子交联的聚(丙烯酸)(CCL-PAA)的微米级或亚微米级的图案。 在一个实施方案中,可以在微流体通道内通过使交联剂(例如金属阳离子如Ag +,Ca 2+,Pd 2+,Al 3+,La 3+和Ti 4+)的溶液流过微流体通道,所述溶液可以将部分离子型聚合物与 解决方案。 在另一个实施方案中,构图离子型聚合物的方法涉及光刻。 在CCL-PAA膜上形成正性光致抗蚀剂(例如重氮萘酚 - 酚醛清漆树脂)之后,CCL-PAA的曝光区域可以通过水溶液进行蚀刻。 有利地,图案化的交联聚合物也可以用作反应物和用于后续化学的基质。 例如,在一些实施方案中,可以将初始交联阳离子交换为不能光刻图案化的第二阳离子。 CCL-PAA的图案化膜也可用于将金属阳离子还原为金属纳米颗粒,并制备多孔,低k电介质基底。
    • 5. 发明申请
    • METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES
    • 用于制作纳米尺度图形表面的方法
    • WO2009113063A3
    • 2010-08-19
    • PCT/IL2009000269
    • 2009-03-10
    • YEDA RES & DEV COMPANY LTD NNAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • NAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • B81C1/00H01J1/304H01J1/34
    • B81C1/00206B81C1/00031B81C2201/0132B81C2201/115G03F7/40
    • A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.
    • 提出了一种具有纳米级表面粗糙度的基板的制造方法。 该方法包括:图案化基板的表面以产生光敏材料的间隔开的区域的阵列; 对所述图案化表面施加可控制的蚀刻,所述可控蚀刻具有预定的持续时间,以便形成具有纳米尺度特征的图案; 并去除感光材料,从而产生具有纳米级表面粗糙度的结构。 用疏水性分子对这样的纳米级粗糙表面进行硅烷化,导致产生了以接触角大和倾斜角大的特征的超疏水特性。 而且,在纳米级粗糙度表面上沉积光活性材料导致光电阴极具有增强的光电转换率。 该方法还提供对入射光的偏振不敏感的光电阴极的制造。
    • 6. 发明申请
    • METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES
    • 制造纳米图案化表面的方法
    • WO2009113063A8
    • 2009-11-26
    • PCT/IL2009000269
    • 2009-03-10
    • YEDA RES & DEV COMPANY LTD NNAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • NAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • B81C1/00
    • B81C1/00206B81C1/00031B81C2201/0132B81C2201/115G03F7/40
    • A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.
    • 提出了一种制造具有纳米级表面粗糙度的基板的方法。 该方法包括:图案化衬底的表面以形成光敏材料的间隔开的区域的阵列; 对图案化表面施加可控蚀刻,所述可控蚀刻具有预定的持续时间,以便形成具有纳米级特征的图案; 并去除光敏材料,从而形成具有纳米级表面粗糙度的结构。 用疏水分子将这种纳米级粗糙表面硅烷化导致产生以大接触角和大倾角为特征的超疏水特性。 而且,在纳米级粗糙表面上沉积光敏材料导致光电阴极具有增强的光电发射产率。 该方法还提供了制造对入射光的偏振不敏感的光电阴极。