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    • 8. 发明申请
    • INTEGRATED COMPUTATIONAL ELEMENT FABRICATION METHODS AND SYSTEMS
    • 综合计算元件制造方法与系统
    • WO2015084303A1
    • 2015-06-11
    • PCT/US2013/072614
    • 2013-12-02
    • HALLIBURTON ENERGY SERVICES, INC.
    • PRICE, James, M.
    • G01B11/06H01L21/66
    • G06E3/001G01B11/0633G05B19/402G05B2219/49021G06E3/00
    • Methods and systems for manufacturing optical computing elements, including a method for correcting element layer thickness measurements during manufacturing that includes depositing an element layer on a glass substrate or a previously deposited layer, illuminating the deposited layer and sampling reflected or transmitted light produced by said illuminating, detecting and measuring an actual magnitude of the sampled light as a function of wavelength, and modeling the sampled light to produce a predicted magnitude of the sampled light. The method further includes determining a discrepancy between the actual and predicted magnitudes, adjusting the actual magnitude based on said discrepancy, calculating the thickness of the deposited layer based upon the adjusted actual magnitude of the sampled light, and adjusting the deposited layer's thickness if the calculated thickness is not within a tolerance range of a target thickness.
    • 用于制造光学计算元件的方法和系统,包括用于在制造期间校正元件层厚度测量的方法,包括在玻璃基底或先前沉积的层上沉积元件层,照射沉积层并对由所述照明产生的反射或透射光进行采样 检测和测量作为波长的函数的采样光的实际幅度,以及对采样光进行建模以产生采样光的预测幅度。 该方法还包括确定实际和预测幅度之间的差异,基于所述差异来调整实际幅度,基于经调整的采样光的实际幅度来计算沉积层的厚度,以及如果计算的 厚度不在目标厚度的公差范围内。