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1. 发明申请

WO2010068849A1 HIGH TEMPERATURE AND HIGH VOLTAGE ELECTRODE ASSEMBLY DESIGN 审中-公开
标题翻译：高温和高压电极组件设计
公开(公告)号：WO2010068849A1
公开(公告)日：2010-06-17
申请号：PCT/US2009/067643
申请日：2009-12-11
申请人： GTSP GLOBAL , HSIEH, Jui, Hai , DELONG, David
发明人： HSIEH, Jui, Hai , DELONG, David
IPC分类号： C23C16/00
CPC分类号： C23C16/509 , C01B33/035 , H01J37/32091 , H01J37/32541 , H01J37/32559 , Y10T29/49718
摘要： A chemical vapor deposition apparatus comprising a chamber having a base plate, a chamber wall, a gas inlet and a gas outlet. The base plate has holes therethrough. A plurality of electrodes extend through the holes and are attachable to a power source. At least two of the plurality of electrodes are attachable to a silicon rod within the chamber. An electrical isolation bushing can be positioned between each of the plurality of electrodes and the base plate. The bushing comprises a sleeve surrounding a portion of the electrodes extending through the base plate and a collar surrounding the holes at the surface of the base plate. In some instances, the collar portion and sleeve portion comprise different materials. In some instances, an isolation layer surrounding the holes at the surface of the base plate is employed In some instances, the collar portion and sleeve portion comprise ceramic.
摘要翻译：一种化学气相沉积设备，包括具有基板，室壁，气体入口和气体出口的室。基板具有穿过其中的孔。多个电极延伸穿过孔并且可附接到电源。多个电极中的至少两个可附接到腔室内的硅棒。电绝缘衬套可以位于多个电极和基板中的每一个之间。衬套包括围绕延伸穿过基板的电极的一部分的套筒和围绕基板的表面处的孔的套环。在一些情况下，套环部分和套筒部分包括不同的材料。在一些情况下，采用围绕基板表面的孔的隔离层。在某些情况下，套环部分和套筒部分包括陶瓷。

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