发明申请
WO2013047911A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE
审中-公开
基本信息:
- 专利标题： ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE
- 专利标题（中）：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感膜，使用该组合物形成图案的方法，制造电子器件和电子器件的方法
- 申请号：PCT/JP2012/075880 申请日：2012-09-28
- 公开(公告)号：WO2013047911A1 公开(公告)日：2013-04-04
- 发明人： ITO, Junichi , SHIBUYA, Akinori , MATSUDA, Tomoki , TOKUGAWA, Yoko , FUKUHARA, Toshiaki , TANGO, Naohiro , IWATO, Kaoru , YOSHIDOME, Masahiro , SUGIYAMA, Shinichi , KATAOKA, Shohei
- 申请人： FUJIFILM Corporation
- 申请人地址： 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 JP
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 JP
- 代理机构： KURATA, Masatoshi et al.
- 优先权： JP2011-215882 20110930
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07C381/12 ; C07D327/08 ; C07D333/76 ; G03F7/039
摘要：
Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
摘要（中）：
本发明提供了一种光化学射线或辐射敏感性树脂组合物，其包括以下通式（1）的任何化合物，当暴露于光化射线或辐射时，其被分解，从而产生酸和树脂，当被 酸分解，从而增加其在碱性显影剂中的溶解度。