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    • 3. 发明申请
    • SYSTEM FOR RECEIVING AND RETAINING A SUBSTRATE
    • 一个基板的收购和停止系统
    • WO0030172A3
    • 2000-11-23
    • PCT/DE9903637
    • 1999-11-16
    • LEICA MICROSYS LITHOGRAPHY LTDKIRSCHSTEIN ULF CARSTENRISSE STEFANDAMM CHRISTOPHPESCHEL THOMAS
    • KIRSCHSTEIN ULF-CARSTENRISSE STEFANDAMM CHRISTOPHPESCHEL THOMAS
    • G03F7/20H01L21/027H01L21/683H01L21/00
    • G03F7/70691H01L21/6833
    • The invention relates to system for receiving and retaining a substrate (17) in a light exposure device that is fitted with a handling system for the feeding of said substrate (17), an electrostatic chuck arrangement (1) for the retention of said substrate (17) during exposure to light, whereby said arrangement can be displaced in coordinates X, Y, and an exposure lens system from which corpuscular radiation is directed onto the surface of the substrate at a right angle, corresponding to coodinate Z. The inventive retention system is provided with at least one second electrostatic chuck arrangement (1) which, like the first chuck arrangement (1), is used to retain the substrate (17) during exposure to light and is provided with a bearing surface for said substrate, whereby the bearing surface of the second chuck arrangement (6) is, however, arranged in such a way that it can de displaced in the direction of coordinate Z. In terms of retention force, both chuck arrangements (1,6) are configured in such a way that the substrate (17) is maintained in a firm position when its placed on the first chuck arrangement (1) or solely on the second chuck arrangement (6).
    • 本发明涉及用于曝光系统中的基板(17)的转移和保持系统,其包括用于向基板(17)供给静电卡盘装置(1)的处理系统,静电卡盘装置(1)可在坐标X,Y上移动以保持基板 (17)在曝光期间装备有曝光光学器件,从其中微粒辐射垂直于坐标Z的曝光光学器件被引导至衬底表面。 至少一个第二静电卡盘装置(6)设置在这种保持系统中,其与用于在曝光期间保持基板(17)的第一卡盘装置(1)一样具有用于基板的支撑表面,但基板的支撑表面 第二卡盘装置(6)在坐标Z的方向上可移动地布置。 两个Chuckanordnungen(1,6)都相对于它们的保持力而设计,使得基板17在第一卡盘装置(1)上搁置时和仅在第二卡盘装置(6)上搁置时都保持位置固定。