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1. 发明申请

WO2006067004A3 DUAL-MODE ELECTRON BEAM COLUMN 审中-公开
标题翻译：双模电子束柱
公开(公告)号：WO2006067004A3
公开(公告)日：2006-10-05
申请号：PCT/EP2005056030
申请日：2005-11-17
申请人： LEICA MICROSYS LITHOGRAPHY LTD , RAFFERTY BRIAN
发明人： RAFFERTY BRIAN
IPC分类号： H01J37/30 , H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A dual-mode electron beam column (10) for selectably providing, in an electron beam lithography machine, a Gaussian beam for enhanced writing resolution and a variable shaped beam for enhanced writing throughput comprises a first aperture (13) for confining the beam, a first lens (14) for focussing the beam at a first image plane positioned in dependence on the beam mode, a beamshaping second aperture (15) positionable in the beam path in the shaped beam mode, a second lens (16) effective in the shaped beam mode to focus the beam in a second image plane, and a third aperture (17) in the second image plane to confine or shape the beam depending on mode. Variation of the shape of the shaped beam is achieved by a beam double deflector system (18) operable only in the shaped beam mode.
摘要翻译：一种用于在电子束光刻机中可选择地提供用于增强写入分辨率的高斯光束和用于增强写入通量的可变形光束的双模式电子束柱（10），包括用于限制光束的第一光圈（13）第一透镜（14），用于将光束聚焦在依赖于光束模式定位的第一图像平面处;以成形光束模式在光束路径中定位的束形成第二孔径（15），在成形光束模式中有效的第二透镜（16）光束模式以将光束聚焦在第二图像平面中，以及第三光圈（17）在第二图像平面中以根据模式限制或成形光束。成形梁的形状的变化通过只能在成形梁模式下操作的梁双偏转器系统（18）实现。

2. 发明申请

WO0030172A3 SYSTEM FOR RECEIVING AND RETAINING A SUBSTRATE 审中-公开
标题翻译：一个基板的收购和停止系统
公开(公告)号：WO0030172A3
公开(公告)日：2000-11-23
申请号：PCT/DE9903637
申请日：1999-11-16
申请人： LEICA MICROSYS LITHOGRAPHY LTD , KIRSCHSTEIN ULF CARSTEN , RISSE STEFAN , DAMM CHRISTOPH , PESCHEL THOMAS
发明人： KIRSCHSTEIN ULF-CARSTEN , RISSE STEFAN , DAMM CHRISTOPH , PESCHEL THOMAS
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , H01L21/00
CPC分类号： G03F7/70691 , H01L21/6833
摘要： The invention relates to system for receiving and retaining a substrate (17) in a light exposure device that is fitted with a handling system for the feeding of said substrate (17), an electrostatic chuck arrangement (1) for the retention of said substrate (17) during exposure to light, whereby said arrangement can be displaced in coordinates X, Y, and an exposure lens system from which corpuscular radiation is directed onto the surface of the substrate at a right angle, corresponding to coodinate Z. The inventive retention system is provided with at least one second electrostatic chuck arrangement (1) which, like the first chuck arrangement (1), is used to retain the substrate (17) during exposure to light and is provided with a bearing surface for said substrate, whereby the bearing surface of the second chuck arrangement (6) is, however, arranged in such a way that it can de displaced in the direction of coordinate Z. In terms of retention force, both chuck arrangements (1,6) are configured in such a way that the substrate (17) is maintained in a firm position when its placed on the first chuck arrangement (1) or solely on the second chuck arrangement (6).
摘要翻译：本发明涉及用于曝光系统中的基板（17）的转移和保持系统，其包括用于向基板（17）供给静电卡盘装置（1）的处理系统，静电卡盘装置（1）可在坐标X，Y上移动以保持基板（17）在曝光期间装备有曝光光学器件，从其中微粒辐射垂直于坐标Z的曝光光学器件被引导至衬底表面。至少一个第二静电卡盘装置（6）设置在这种保持系统中，其与用于在曝光期间保持基板（17）的第一卡盘装置（1）一样具有用于基板的支撑表面，但基板的支撑表面第二卡盘装置（6）在坐标Z的方向上可移动地布置。两个Chuckanordnungen（1,6）都相对于它们的保持力而设计，使得基板17在第一卡盘装置（1）上搁置时和仅在第二卡盘装置（6）上搁置时都保持位置固定。

3. 发明申请

WO2005098544A3 DEVICE AND METHOD FOR PRODUCING RESIST PROFILED ELEMENTS 审中-公开
标题翻译：装置及其制造方法抗蚀PROFILES
公开(公告)号：WO2005098544A3
公开(公告)日：2006-07-13
申请号：PCT/EP2005051451
申请日：2005-03-30
申请人： GIESECKE & DEVRIENT GMBH , LEICA MICROSYS LITHOGRAPHY LTD , KAULE WITTICH , PLONTKE RAINER , STOLLBERG INES , SCHUBERT ANDREAS , DICHTL MARIUS
发明人： KAULE WITTICH , PLONTKE RAINER , STOLLBERG INES , SCHUBERT ANDREAS , DICHTL MARIUS
IPC分类号： G03F7/20 , G03F7/00 , G03H5/00 , G11B7/007 , G11B11/00 , H01J37/302 , H01J37/317
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G03F7/0005 , G03F7/0017 , G11B7/007 , H01J37/3174
摘要： The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.
摘要翻译：它公开了一种装置和用于产生抗蚀剂轮廓的装置。为了这个目的，电子束光刻的系统是必需的，其产生的电子束，其束轴线基本上垂直于抗蚀剂层，其中所述抗蚀剂轮廓是要生成。该电子束是相对于所述电子表面剂量可以被设置成使得由于通过电子束的照射，抗蚀剂可以生成配置文件，其具有非矩形的抗蚀剂轮廓。

4. 发明申请

WO0031774A2 HOLDING DEVICE FOR A SUBSTRATE 审中-公开
标题翻译：保持装置用于基板
公开(公告)号：WO0031774A2
公开(公告)日：2000-06-02
申请号：PCT/DE9903638
申请日：1999-11-16
申请人： LEICA MICROSYS LITHOGRAPHY LTD , SCHUBERT GERHARD , KIRSCHSTEIN ULF CARSTEN , RISSE STEFAN , HARNISCH GERD , KALKOWSKI GERHARD , GUYENOT VOLKER
发明人： SCHUBERT GERHARD , KIRSCHSTEIN ULF-CARSTEN , RISSE STEFAN , HARNISCH GERD , KALKOWSKI GERHARD , GUYENOT VOLKER
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , H01L21/00
CPC分类号： G03F7/707 , G03F7/70708 , H01L21/6831
摘要： The invention relates to a device for holding a substrate (18) in an exposure apparatus, wherein the surface of the substrate (18) to be exposed lies in a plane which is generated by the coordinates X, Y. The substrate (18) is linked to a table (1) which can be displaced within the coordinates X, Y and material measure means are provided between the table surface (5) and the substrate (18) for adjusting the distance and for orienting the substrate (18) in relation to an exposure optic (2). Particle radiation is emitted from said exposure optic (2) and is directed onto the substrate surface at a right angle in accordance with the coordinate Z. The inventive device provides for two supporting plates (3, 16) which are arranged parallel to the X, Y plane and which are mounted on the table (1) in the direction of the exposure optic (2) and at different distances from the table surface (5). A first supporting plate (3) is directly connected to the table (1) and the second supporting plate (16) is connected to said first supporting plate (3) by means of at least one holding device whose holding function can be switched on or off. A base plate for the substrate (18) is configured on the side of the second supporting plate (16) facing the exposure optic (2).
摘要翻译：本发明涉及一种设备，用于在其中待曝光的衬底（18）位于由坐标X跨越的平面的表面的曝光装置与一个在保持基板（18），Y平面，基板（18）坐标X，Y可动台（1）连接到和所述表面（5）和基片（18）massverkörpernde之间用于间隔所述衬底的调整和对准提供（18）相对于曝光光学系统（2），从该成直角的微粒辐射，对应于坐标Z，被引导至衬底表面。在上述类型（2）的装置，两个平行于平面X，Y取向的支撑板（3，16）上的表（1）在从所述表面（5）的距离不同的曝光光学系统的方向提供，其中（第一支撑板 3）直接连接到所述表（1）和通过至少一个保持装置的第二支撑板（16），所述保持功能被关闭，并且（与第一支承板3）连接。在此情况下，在第二支撑板（16）的面向曝光光学器件（2）的一侧上形成用于基板（18）的支撑平面。

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