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    • 1. 发明申请
    • CHARGED PARTICLE BEAM PROCESSING SYSTEM WITH VISUAL AND INFRARED IMAGING
    • 带视觉和红外成像的带电粒子束处理系统
    • WO2012006558A3
    • 2012-04-12
    • PCT/US2011043410
    • 2011-07-08
    • FEI CORUE CHADCROWLEY DANIEL
    • RUE CHADCROWLEY DANIELAGORIO ENRIQUE
    • H01J37/22H01J37/08H01J37/20H01J37/244
    • G01J3/0262G01J3/0208G01J3/0278G01N21/9501G01N21/95684G01N2021/8825G01N2021/95653H01J37/226H01J37/3005H01J37/3056H01J2237/31749
    • A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage for supporting and positioning the substrate alternately under the charged particle column and the imaging system. The axes of the charged particle column and imaging system are offset to enable much closer working distances for both imaging and beam processing than would be possible in a single integrated assembly. A method for extremely accurately calibrating the offset between the column and imaging system is disclosed, enabling beam processing at precisely-determined locations on the substrate. The imaging system is capable of locating sub-surface features on the substrate which cannot be seen using the charged particle beam. Two illumination modes are disclosed, enabling both bright-field and dark-field imaging in infrared radiation and visible light.
    • 公开了一种用于处理基板的带电粒子束系统,其包括带电粒子柱,组合式红外辐射和可见光照明和成像子系统,真空中的光学器件以及用于交替地在带电粒子柱下方支撑和定位衬底的精密台,以及 成像系统。 带电粒子柱和成像系统的轴偏移,使得成像和光束处理的工作距离比单个集成组件中的可能距离更近。 公开了一种用于非常准确地校准柱和成像系统之间的偏移的方法,使得能够在衬底上精确确定的位置处进行光束处理。 成像系统能够在衬底上定位使用带电粒子束无法看到的子表面特征。 公开了两种照明模式,使红外辐射和可见光中的明场和暗场成像成为可能。
    • 2. 发明申请
    • CHARGED PARTICLE BEAM PROCESSING SYSTEM WITH VISUAL AND INFRARED IMAGING
    • 具有可视和红外成像的充电颗粒光束处理系统
    • WO2012006558A4
    • 2012-06-14
    • PCT/US2011043410
    • 2011-07-08
    • FEI CORUE CHADCROWLEY DANIEL
    • RUE CHADCROWLEY DANIELAGORIO ENRIQUE
    • H01J37/22H01J37/08H01J37/20H01J37/244
    • G01J3/0262G01J3/0208G01J3/0278G01N21/9501G01N21/95684G01N2021/8825G01N2021/95653H01J37/226H01J37/3005H01J37/3056H01J2237/31749
    • A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage for supporting and positioning the substrate alternately under the charged particle column and the imaging system. The axes of the charged particle column and imaging system are offset to enable much closer working distances for both imaging and beam processing than would be possible in a single integrated assembly. A method for extremely accurately calibrating the offset between the column and imaging system is disclosed, enabling beam processing at precisely-determined locations on the substrate. The imaging system is capable of locating sub-surface features on the substrate which cannot be seen using the charged particle beam. Two illumination modes are disclosed, enabling both bright-field and dark-field imaging in infrared radiation and visible light.
    • 公开了一种用于处理衬底的带电粒子束系统,包括带电粒子柱,组合红外辐射和可见光照明和成像子系统,真空内光学器件,以及精确级,用于在充电粒子柱下交替地支撑和定位衬底, 成像系统。 带电粒子柱和成像系统的轴线偏移,以使成像和光束处理的工作距离远远大于单个集成组件中可能的距离。 公开了一种用于非常精确校准柱和成像系统之间的偏移的方法,使得能够在基板上的精确确定的位置处进行光束处理。 成像系统能够将基底上的子表面特征定位为使用带电粒子束不能看到的。 公开了两种照明模式,使得能够在红外辐射和可见光下进行亮场和暗场成像。