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1. 发明申请

WO2005003858A2 PHOTOACID GENERATORS 审中-公开
标题翻译：光电发生器
公开(公告)号：WO2005003858A2
公开(公告)日：2005-01-13
申请号：PCT/EP2004/006073
申请日：2004-06-04
申请人： CLARIANT INTERNATIONAL LTD
发明人： HOULIHAN, Francis, M. , TOUKHY, Medhat, A. , MULLEN, Salem, K.
IPC分类号： G03F7/00
CPC分类号： G03F7/0045 , G03F7/0392
摘要： A composition useful for forming a photoresist layer at i-line (365 nm) comprising (a) a film forming resin; (b) a compound represented by the following formula (I) wherein R 1 is a C 1-20 alkyl group, C 6-20 aryl group, or C 6-20 aralkyl group, the C 1-20 alkyl group, C 6-20 aryl group, or C 6-20 aralkyl group being unsubstituted or substituted by one or more groups selected from halogen, C 1-20 alkyl, C 1-8 perfluoroalkyl, C 1-20 alkoxy, cyano, hydroxyl, or nitro; R 2 and R 3 are each independently selected from hydrogen, C 1-8 alkyl, C 1-8 perfluoroalkyl, C 1-8 alkoxy, nitro, halogen, carboxyl, hydroxyl, and sulfate; each of m and n are independently 0 or a positive integer; and X - is a non-nucleophilic anion of an acid; (c) optionally, additives to adjust the optical, mechanical and film forming properties; (d) optionally, a base or radiation sensitive base; and (e) a solvent.
摘要翻译：一种可用于在i线（365nm）处形成光致抗蚀剂层的组合物，其包含（a）成膜树脂; （b）由下式（I）表示的化合物，其中R1是C1-20烷基，C6-20芳基或C6-20芳烷基，C1-20烷基，C6-20芳基或 C6-20芳烷基是未取代的或被一个或多个选自卤素，C 1-20烷基，C 1-8全氟烷基，C 1-20烷氧基，氰基，羟基或硝基的基团取代; R2和R3各自独立地选自氢，C1-8烷基，C1-8全氟烷基，C1-8烷氧基，硝基，卤素，羧基，羟基和硫酸根; m和n各自独立地为0或正整数; 而X - 是酸的非亲核阴离子; （c）任选的调节光学，机械和成膜性质的添加剂; （d）任选地，碱或辐射敏感基质; 和（e）溶剂。

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