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    • 4. 发明申请
    • HOMOGENIZER WITH REDUCED INTERFERENCE
    • 均质机减少干扰
    • WO2007141185A2
    • 2007-12-13
    • PCT/EP2007/055323
    • 2007-05-31
    • CARL ZEISS LASER OPTICS GMBHEGGER, RafaelMÜNZ, Holger
    • EGGER, RafaelMÜNZ, Holger
    • G02B27/48G02B27/09H01S3/00B23K26/06
    • B23K26/0604B23K26/0613G02B27/0927G02B27/0961G03F7/70583H01S3/005
    • The invention relates to a method for creating a target intensity distribution (20) in a target field (3) from a first input light beam (4) propagating in a first propagation direction and a second input light beam (5), whereby said first input light beam (4) and said second input light beam (5) entering a light entrance surface (6a, 6b) of a cylindrical lens array (1a) of a homogenizer. According to the invention said second input light beam (5) propagates in a second propagation direction differing from said first propagation direction. The invention further relates to an optical system for creating a target intensity distribution (20) in a target field (3) comprising: a first light source for generating a first input light beam (4) and a second light source for generating a second input light beam (5), or a single light source for generating a light beam and a beam splitter for splitting said light beam into said first input light beam and said second input light beam, a first directing device for directing said first input light beam (4) to propagate in a first propagation direction and a ho mogenizer having a cylindrical lens array (1a) with a light entrance surface (6a, 6b) for being entered by said first input light beam (4) and said second input light beam (5). According to the invention there exists a second directing device for directing said second input light beam (5) propagating in a second propagation direction differing from said first propagation direction when entering said light entrance surface (6a, 6b).
    • 本发明涉及一种用于在从第一传播方向传播的第一输入光束(4)和第二输入光束(5)中产生目标场(3)中的目标强度分布(20)的方法,其中所述第一 输入光束(4)和所述第二输入光束(5)进入均质器的柱面透镜阵列(1a)的光入射表面(6a,6b)。 根据本发明,所述第二输入光束(5)沿与第一传播方向不同的第二传播方向传播。 本发明还涉及一种用于在目标场(3)中产生目标强度分布(20)的光学系统,包括:第一光源,用于产生第一输入光束(4)和第二光源,用于产生第二输入 光束(5)或用于产生光束的单个光源和用于将所述光束分成所述第一输入光束和所述第二输入光束的分束器,用于引导所述第一输入光束( 4)在第一传播方向上传播,具有柱面透镜阵列(1a)的具有光入射表面(6a,6b)的霍尔发生器由所述第一输入光束(4)和所述第二输入光束( 5)。 根据本发明,当进入所述光入射表面(6a,6b)时,存在用于引导在与所述第一传播方向不同的第二传播方向上传播的所述第二输入光束(5)的第二引导装置。
    • 6. 发明申请
    • LIGHT BEAM INTENSITY NON-UNIFORMITY CORRECTION DEVICE AND METHOD FOR AMENDING INTENSITY DISTRIBUTION OF A LIGHT BEAM
    • 光束强度非均匀性校正装置和修改光束强度分布的方法
    • WO2007048474A1
    • 2007-05-03
    • PCT/EP2006/009168
    • 2006-09-21
    • CARL ZEISS LASER OPTICS GMBHSHKLOVER, VitaliyKIEREY, HolgerMÜNZ, HolgerLE MAIRE, MichelWEIGL, Bernhard
    • SHKLOVER, VitaliyKIEREY, HolgerMÜNZ, HolgerLE MAIRE, MichelWEIGL, Bernhard
    • G02B1/11G03F7/20G02B27/00
    • G02B27/0988G02B1/115G02B5/22G02B13/08G02B27/0966G03F7/70591G03F7/70958G03F7/70975
    • The invention relates to a light beam intensity non-uniformity correction device (34) comprising an optical element (34) having a light entrance face (36) with an antireflective property. According to the invention said antireflective property is locally amended in order to enhance light beam intensity uniformity. The invention further relates to a method for amending intensity distribution of a light beam (12) in an optical system (2) having one optical element or a plurality of optical elements (16, 24, 26, 34), comprising the steps of: a) assembling said optical system (2) with said optical elements (16, 24, 26, 34) being arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of said optical elements (34) in order to amend measured intensity distribution into a predetermined intensity distribution, d) removing said one of said optical elements (34) from said optical system (2), e) locally amending absorption and/or reflection of said one of said optical elements according to the calculation, f) installing said one of said optical elements (34) in said predetermined position in said optical system (2).
    • 本发明涉及一种光束强度不均匀性校正装置(34),其包括具有防反射特性的光入射面(36)的光学元件(34)。 根据本发明,为了增强光束强度均匀性,局部地修改了抗反射性能。 本发明还涉及一种用于修正具有一个光学元件或多个光学元件(16,24,26,34)的光学系统(2)中的光束(12)的强度分布的方法,包括以下步骤: a)将所述光学系统(2)与布置在预定位置的所述光学元件(16,24,26,34)组装,b)测量强度分布,c)计算局部所需的增加或减小的吸收和/或反射的一个 的所述光学元件(34),以便将测量的强度分布修改为预定的强度分布,d)从所述光学系统(2)中去除所述光学元件(34)中的所述一个,e)局部地修改所述光学元件(34)的吸收和/或反射 根据所述计算所述光学元件中的一个,f)将所述光学元件(34)中的所述一个安装在所述光学系统(2)中的所述预定位置。