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    • 3. 发明申请
    • THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管及其制造方法
    • WO2009136645A2
    • 2009-11-12
    • PCT/JP2009058724
    • 2009-04-28
    • CANON KKSATO AYUMUHAYASHI RYOYABUTA HISATOSANO MASAFUMI
    • SATO AYUMUHAYASHI RYOYABUTA HISATOSANO MASAFUMI
    • H01L29/786
    • H01L29/7869H01L29/78621
    • Provided are a coplanar structure thin film transistor that allows a threshold voltage to change only a little under electric stress, and a method of manufacturing the same. The thin film transistor includes on a substrate at least: a gate electrode; a gate insulating layer; an oxide semiconductor layer including a source electrode, a drain electrode, and a channel region; a channel protection layer; and an interlayer insulating layer. The channel protection layer includes one or more layers, the layer in contact with the oxide semiconductor layer among the one or more layers being made of an insulating material containing oxygen, ends of the channel protection layer are thinner than a central part of the channel protection layer, the interlayer insulating layer contains hydrogen, and regions of the oxide semiconductor layer that are in direct contact with the interlayer insulating layer form the source electrode and the drain electrode.
    • 提供一种共面结构薄膜晶体管,其制造方法允许阈值电压在电应力下变化很小。 薄膜晶体管至少在基板上包括:栅电极; 栅极绝缘层; 包括源电极,漏电极和沟道区的氧化物半导体层; 通道保护层; 和层间绝缘层。 沟道保护层包括一层或多层,一层或多层中与氧化物半导体层接触的层由含氧的绝缘材料制成,沟道保护层的端部比通道保护层的中心部分薄 层间绝缘层含有氢,与层间绝缘层直接接触的氧化物半导体层的区域形成源电极和漏电极。