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1. 发明申请

WO2007030593A1 NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE 审中-公开
标题翻译：无硅氮化物的硅酮蚀刻剂负极光电剂
公开(公告)号：WO2007030593A1
公开(公告)日：2007-03-15
申请号：PCT/US2006/034817
申请日：2006-09-07
申请人： BREWER SCIENCE INC. , ZHONG, Xing-fu , LI, Chenghong , MALHOTRA, Jyoti, K.
发明人： ZHONG, Xing-fu , LI, Chenghong , MALHOTRA, Jyoti, K.
IPC分类号： G03F7/004 , G03F7/027
CPC分类号： G03F7/0382 , G03F7/0752 , H01L21/3081 , Y10S430/108 , Y10S430/115
摘要： New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes copolymers prepared from styrene, acrylonitrile, and epoxy-containing monomers. The photoresist layer comprises a photoacid generator, and is preferably negative-acting.
摘要翻译：提供了在制造半导体和MEMS器件期间使用的新型光致抗蚀剂。底漆层优选包含溶解或分散在溶剂体系中的硅烷。光致抗蚀剂层包括由苯乙烯，丙烯腈和含环氧基的单体制备的共聚物。光致抗蚀剂层包括光致酸发生剂，并且优选为负性作用。

2. 发明申请

WO2008127785A1 ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE 审中-公开
标题翻译：无硅氮氧化物的硅氧化锌耐碱性负离子
公开(公告)号：WO2008127785A1
公开(公告)日：2008-10-23
申请号：PCT/US2008/054885
申请日：2008-02-25
申请人： BREWER SCIENCE INC. , ZHONG, Xing-fu , FLAIM, Tony, D. , MALHOTRA, Jyoti
发明人： ZHONG, Xing-fu , FLAIM, Tony, D. , MALHOTRA, Jyoti
IPC分类号： G03F7/004
CPC分类号： G03F7/0752 , G03F7/0045 , G03F7/0382 , G03F7/0751 , Y10S430/108 , Y10S430/115
摘要： A removable build box for a three dimensional printer comprises a build box tray defining a build chamber for part assembly and a material feed chamber for supplying powder material to the build chamber. The build and feed chambers have lower piston stops. A build chamber piston engages with the build chamber and with the build chamber piston stops at a lowermost position. A feed chamber piston engages with the feed chamber and with the feed chamber piston stops at a lowermost position. A quick connection coupling is between the build chamber piston and a build chamber z-axis actuator configured to move the build chamber piston when connected thereto. A quick connection coupling is between the feed chamber piston and a feed chamber z-axis actuator configured to move the feed chamber piston when connected thereto. The build box tray may be easily removed from the three dimensional printer.
摘要翻译：用于三维打印机的可拆卸构造盒包括限定用于部件组装的构建室的构建箱托盘和用于将粉末材料供应到构建室的材料馈送室。建造和进料室具有较低的活塞止挡。建筑室活塞与建造室接合，建筑室活塞停在最低位置。进料室活塞与进料室接合，并且进料室活塞停止在最低位置。构建室活塞和构造室z轴致动器之间的快速连接联接器被配置成当连接到构建室活塞时移动构建室活塞。进料室活塞和进料室z轴致动器之间的快速连接耦合被配置为当连接到进料室活塞时移动进料室活塞。构建盒托盘可以容易地从三维打印机中移除。

3. 发明申请

WO2007061559A2 PHOTOCURABLE, CONDUCTIVE, TRANSPARENT POLYMER COATINGS 审中-公开
标题翻译：可光，导电，透明聚合物涂料
公开(公告)号：WO2007061559A2
公开(公告)日：2007-05-31
申请号：PCT/US2006/041599
申请日：2006-10-24
申请人： BREWER SCIENCE INC. , ZHONG, Xing-fu
发明人： ZHONG, Xing-fu
IPC分类号： H01L51/00
CPC分类号： H01B1/127 , H01L51/0037 , Y10T428/31507 , Y10T428/31645 , Y10T428/31855 , Y10T428/31909
摘要： Photocurable, conductive, and transparent polymer coating compositions and methods of using the same are provided. The compositions include a photopolymer and an electrically conductive polymer dissolved or dispersed in a solvent system. Preferred photopolymers include water-miscible, multifunctional acrylates. Preferred electrically conductive polymers include ρoly(3 ,4-ethylenedioxythiophene)/poly(styrene sulfonate) (PEDOT-PSS). The compositions preferably also contain a photoinitiator and may contain a water-immiscible acrylate and/or a surfactant. The compositions are applied to substrates and exposed to actinic radiation such as ultraviolet (UV) light to form a cured, durable, conductive, and transparent coating.
摘要翻译：提供光固化，导电和透明的聚合物涂料组合物及其使用方法。组合物包括溶解或分散在溶剂体系中的光聚合物和导电聚合物。优选的光聚合物包括水混溶性多官能丙烯酸酯。优选的导电聚合物包括（3,4-亚乙基二氧噻吩）/聚（苯乙烯磺酸盐）（PEDOT-PSS）。组合物优选还含有光引发剂并且可以含有不与水混溶的丙烯酸酯和/或表面活性剂。将组合物施加到基底上并暴露于光化辐射如紫外（UV）光下以形成固化的，耐久的，导电的和透明的涂层。

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