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    • 3. 发明申请
    • AN EMBOSSING DEVICE AND A METHOD FOR ADJUSTING THE EMBOSSING DEVICE
    • 一种破坏装置和一种调整破裂装置的方法
    • WO2006016006A1
    • 2006-02-16
    • PCT/FI2005/050288
    • 2005-08-05
    • AVANTONE OYMÄNTYLÄ, MarkkuKOIVUKUNNAS, PekkaKORHONEN, RaimoKEMPPAINEN, AnttiSUMEN, Juha
    • KOIVUKUNNAS, PekkaKORHONEN, RaimoKEMPPAINEN, AnttiSUMEN, Juha
    • B29C59/02B32B38/06
    • B29C59/046B29C59/026B29C2059/023
    • A micro-optical grid structure is produced on the surface layer (40) of a substrate (30) by an embossing device (1000) and method according to the invention. The embossing device (1000) comprises an embossing member (10) and a backing member (20), temperature adjustment means (100, 120) for adjusting the embossing temperature and pressure adjustment means (140) for adjusting the pressure exerted by the embossing member (10) and the backing member (20) to the surface layer (40) of the substrate (30). An optical measuring device (200) is arranged to produce a diffraction signal (211) dependent on the intensity of light diffracted from the surface (40) of the substrate. The embossing pressure and/or temperature is/are adjusted on the basis of said diffraction signal (221) to produce an optimal and even pattern depth (r) of the grid structure. By means of the adjustment based on the diffraction signal (221) of the measuring device (200), it is possible to avoid the sticking of the surface (40) of the substrate to the embossing member (10) due to a too high embossing temperature. When the pattern depth (r) is optimal, the collapsing of the substrate (30) caused by the too high embossing pressure is also avoided.
    • 通过压花装置(1000)和根据本发明的方法在基板(30)的表面层(40)上产生微光栅格结构。 压印装置(1000)包括压花构件(10)和背衬构件(20),温度调节装置(100,120)用于调节压印温度和压力调节装置(140),用于调节由压花构件 (10)和所述背衬构件(20)连接到所述基底(30)的表面层(40)。 光学测量装置(200)被布置成根据从衬底的表面(40)衍射的光的强度产生衍射信号(211)。 基于所述衍射信号(221)来调节压花压力和/或温度,以产生网格结构的最佳和均匀图案深度(r)。 通过基于测量装置(200)的衍射信号(221)的调整,可以避免由于太高的压印而使基板的表面(40)粘附到压花部件(10)上 温度。 当图案深度(r)最佳时,也避免了由过高的压花压力引起的基板(30)的塌缩。
    • 4. 发明申请
    • EMBOSSING DEVICE WITH A DEFLECTION COMPENSATED ROLLER
    • 具有偏转补偿辊的破裂装置
    • WO2006016005A1
    • 2006-02-16
    • PCT/FI2005/050287
    • 2005-08-05
    • AVANTONE OYKORHONEN, RaimoKOIVUKUNNAS, Pekka
    • KORHONEN, RaimoKOIVUKUNNAS, Pekka
    • F16C13/00B31F1/07
    • F16C13/024B31F1/07B31F2201/0753
    • A diffractive microstructure is produced on the surface layer (40) of a substrate (30) using an embossing device (1000) according to the invention. The embossing device (1000) comprises an embossing roll (10) and a backing roll (20) for exerting an embossing pressure on the surface layer (40) of the substrate (30). The embossing pressure and/or variations in temperature cause deflection of the embossing roll (10). In order to compensate the deflection, the embossing device (1000) comprises means for setting the embossing pressure (p3) exerted by the central area (CR) of the embossing roll (10) on the surface layer (40) of the substrate (30) to be at least equal to or higher than the embossing pressure (p1, p2) exerted by the end areas (ER1, ER2) of the embossing roll (10) on the surface layer (40) of the substrate (30). In a preferred embodiment the shell (21) of the backing roll (20) is supported on the central zone (CR) of the shaft (22) of the backing roll such that the ends of the shell (22) can move in relation to the shaft (22) of the backing roll. Thus, when the side of the shell (11) of the embossing roll on the substrate (30) side is bent due to the embossing pressure and becomes concave, the side of the backing roll on the substrate side becomes convex in a corresponding manner. Thus, the pressure in the central area (CR) becomes equal to or higher than in the end areas (ER1, ER2).
    • 使用根据本发明的压花装置(1000)在基材(30)的表面层(40)上产生衍射微结构。 压花装置(1000)包括用于在基材(30)的表面层(40)上施加压花压力的压花辊(10)和背衬辊(20)。 压花压力和/或温度变化导致压花辊(10)的偏转。 为了补偿偏转,压印装置(1000)包括用于将压花辊(10)的中心区域(CR)施加的压花压力(p3)设置在基板(30)的表面层(40)上的装置 )至少等于或高于由压花辊(10)的端部区域(ER1,ER2)施加在基材(30)的表面层(40)上的压花压力(p1,p2)。 在优选实施例中,背衬辊(20)的壳体(21)被支撑在背衬辊的轴(22)的中心区域(CR)上,使得壳体(22)的端部可以相对于 背衬辊的轴(22)。 因此,当基板(30)侧的压花辊的壳体(11)的侧面由于压花压力而弯曲并变为凹陷时,基板侧的背衬辊侧面以相应的方式变成凸形。 因此,中心区域(CR)中的压力变得等于或高于末端区域(ER1,ER2)中的压力。