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1. 发明申请

WO2021058338A1 METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND METHODS THEREOF 审中-公开
公开(公告)号：WO2021058338A1
公开(公告)日：2021-04-01
申请号：PCT/EP2020/075785
申请日：2020-09-15
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： SETIJA, Irwan, Dani , DEN BOEF, Arie, Jeffrey , SWILLAM, Mohamed , BEUKMAN, Arjan, Johannes, Anton
IPC分类号： G02F1/295 , G02B27/48 , G03F7/20
摘要： A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.

2. 发明申请

WO2018007126A1 METHOD AND APPARATUS FOR CALCULATING ELECTROMAGNETIC SCATTERING PROPERTIES OF FINITE PERIODIC STRUCTURES 审中-公开
标题翻译：计算有限周期结构电磁散射特性的方法和装置
公开(公告)号：WO2018007126A1
公开(公告)日：2018-01-11
申请号：PCT/EP2017/064754
申请日：2017-06-16
申请人： ASML NETHERLANDS B.V.
发明人： SETIJA, Irwan, Dani , VAN DEN BERG, Petrus, Maria
IPC分类号： G03F7/20
CPC分类号： G01N21/4788 , G01N2201/12 , G03F7/705 , G03F7/70625
摘要： A method of determining electromagnetic scattering properties of a finite periodic structure has the steps: 1002: Calculating a single-cell contrast current density, within a unit-cell supporting domain of a single one of a finite collection of unit cells. 1004: Calculating a scattered electric field outside the finite collection of unit cells, by integrating, over the single unit cell's supporting domain, a Green's function with the determined single-cell contrast current density. 1006: The Green's function is obtained for observation points outside the finite collection of unit cells by summation across the finite collection of unit cells. The Green's function integrated with the determined single- cell contrast current density is obtained for observation points above the supporting domain with respect to a substrate underlying the finite periodic structure. 1008: Determining an electromagnetic scattering property, for example a diffraction pattern, of the finite periodic structure using the calculated scattered electric field.
摘要翻译：确定有限周期性结构的电磁散射性质的方法具有以下步骤：1002：在单个有限集合的单位单元支撑域内计算单细胞对比电流密度的单位电池。 1004：通过在单个单元电池的支撑区域上集成具有确定的单电池对比度电流密度的格林函数来计算单元电池的有限集合之外的散射电场。 1006：通过在单元单元的有限集合上求和得到单元单元的有限集合外的观察点的格林函数。对于在有限周期性结构下面的衬底，在支撑域之上的观察点获得与确定的单细胞对比电流密度相结合的格林函数。 1008：使用所计算的散射电场确定有限周期性结构的电磁散射性质，例如衍射图。

3. 发明申请

WO2015078670A1 METHODS AND APPARATUS FOR CALCULATING ELECTROMAGNETIC SCATTERING PROPERTIES OF A STRUCTURE AND FOR ESTIMATION OF GEOMETRICAL AND MATERIAL PARAMETERS THEREOF 审中-公开
标题翻译：计算结构电磁散射特性的方法和装置及其几何和材料参数的估计
公开(公告)号：WO2015078670A1
公开(公告)日：2015-06-04
申请号：PCT/EP2014/073702
申请日：2014-11-04
申请人： ASML NETHERLANDS B.V.
发明人： PISARENCO, Maxim , SETIJA, Irwan, Dani
IPC分类号： G03F7/20
CPC分类号： G01B11/02 , G03F7/705 , G03F7/70625 , G03F7/70633
摘要： In scatterometry, a merit function including a regularization parameter is used in an iterative process to find values for the scattering properties of the measured target. An optimal value for the regularization parameter is obtained for each measurement target and in each iteration of the iterative process. Various methods can be used to find the value for the regularization parameter, including the Discrepancy Principle, the chi-squared method and novel modifications of the Discrepancy Principle and the chi-squared method including a merit function.
摘要翻译：在散射法中，在迭代过程中使用包括正则化参数的优值函数来查找测量目标的散射特性的值。为每个测量目标和迭代过程的每次迭代获得正则化参数的最优值。可以使用各种方法来找出正则化参数的值，包括差异原理，卡方法和差异原理的新颖修改以及包括优值函数的卡方法。

4. 发明申请

WO2019034318A1 ALIGNMENT MEASUREMENT SYSTEM 审中-公开
公开(公告)号：WO2019034318A1
公开(公告)日：2019-02-21
申请号：PCT/EP2018/067729
申请日：2018-07-02
申请人： ASML NETHERLANDS B.V.
发明人： HUISMAN, Simon, Reinald , GOORDEN, Sebastianus, Adrianus , SETIJA, Irwan, Dani
IPC分类号： G03F9/00
摘要： An apparatus for determining a characteristic of a feature of an object comprises: a measurement radiation source; a measurement radiation delivery system; a measurement system; a pump radiation source; and a pump radiation delivery system. The measurement radiation source is operable to produce measurement radiation and the measurement radiation delivery system is operable to irradiate at least a part of a top surface of the object with the measurement radiation. The measurement system is operable to receive at least a portion of the measurement radiation scattered from the top surface and is further operable to determine a characteristic of the feature of the object from at least a portion of the measurement radiation scattered from the top surface. The pump radiation source is operable to produce pump radiation and the pump radiation delivery system is operable to irradiate at least a part of the top surface of the object with the pump radiation so as to produce a mechanical response (for example an acoustic wave) in the object.

5. 发明申请

WO2018224251A1 ALIGNMENT MEASUREMENT SYSTEM 审中-公开
公开(公告)号：WO2018224251A1
公开(公告)日：2018-12-13
申请号：PCT/EP2018/062557
申请日：2018-05-15
申请人： STICHTING VU , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , ASML NETHERLANDS B.V.
发明人： WITTE, Stefan, Michiel , ANTONCECCHI, Alessandro , ZHANG, Hao , EDWARD, Stephen , PLANKEN, Paulus, Clemens, Maria , GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald , SETIJA, Irwan, Dani , VLES, David, Ferdinand
IPC分类号： G03F9/00
摘要： A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam. The signal to background ratio is a ratio of: (a) signals generated at the surface by reflections of acoustic waves from the feature to (b) background signals generated at the surface by reflections of acoustic waves which have not reflected from the feature.

6. 发明申请

WO2023020856A1 METROLOGY METHOD AND APPARATUS 审中-公开
公开(公告)号：WO2023020856A1
公开(公告)日：2023-02-23
申请号：PCT/EP2022/072017
申请日：2022-08-04
申请人： UNIVERSITEIT VAN AMSTERDAM , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , STICHTING VU , ASML NETHERLANDS B.V.
发明人： DE HAAN, Guido , EDWARD, Stephen , VAN DEN HOOVEN, Thomas Jan , PLANKEN, Paulus, Clemens, Maria , SETIJA, Irwan, Dani
IPC分类号： G03F9/00
摘要： Disclosed is a method for measuring a target located on a substrate beneath at least one layer. The method comprises exciting said at least one layer with pump radiation comprising at least one pump wavelength, so as to generate an acoustic wave within said at least one layer which reflects of said target thereby generating an acoustic replica of said target at a surface of said substrate and illuminating said acoustic replica with probe radiation comprising at least one probe wavelength and capturing the resultant scattered probe radiation, scattered from the acoustic replica. One or both of said exciting step and said illuminating step comprises generating Surface Plasmon Polaritons (SPPs) on residual topography of said at least one layer resultant from said target.

7. 发明申请

WO2022258275A1 INTEGRATED OPTICAL ALIGNMENT SENSORS 审中-公开
公开(公告)号：WO2022258275A1
公开(公告)日：2022-12-15
申请号：PCT/EP2022/062504
申请日：2022-05-09
申请人： ASML NETHERLANDS B.V.
发明人： SETIJA, Irwan, Dani , DE GRAAF, Jasper, Pieter , VAN DEN BOSCH, Alain, Emiel, Cornelis
IPC分类号： G03F9/00 , G02B6/34
摘要： An on-chip alignment sensor includes an illumination system configured to emit a beam of radiation to irradiate a target on a substrate. The on-chip alignment sensor further includes a first capturing grating configured to receive a first diffracted order beam of radiation diffracted by the target and to produce a first guided mode of radiation. The on-chip alignment sensor further includes a second capturing grating configured to receive a second diffracted order beam of radiation diffracted by the target and to produce a second guided mode of radiation. The on-chip alignment sensor further includes an interference device configured to produce an interfered guided mode of radiation based on the first and second guided mode of radiations or based on the first guided mode of radiation and a reference radiation.

8. 发明申请

WO2022156978A1 METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM 审中-公开
公开(公告)号：WO2022156978A1
公开(公告)日：2022-07-28
申请号：PCT/EP2021/086861
申请日：2021-12-20
申请人： ASML NETHERLANDS B.V.
发明人： ALPEGGIANI, Filippo , BELT, Harm, Jan, Willem , GOORDEN, Sebastianus, Adrianus , SETIJA, Irwan, Dani , HUISMAN, Simon, Reinald , PELLEMANS, Henricus, Petrus, Maria
IPC分类号： G03F7/20 , G06N20/00
摘要： Disclosed is a method for measuring a parameter of interest from a target and associated apparatuses. The method comprises obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or a trained model to obtain corrected measurement data and/or a parameter of interest; and, where the correction step does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.

9. 发明申请

WO2019011608A1 INSPECTION TOOL, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC SYSTEM, INSPECTION METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2019011608A1
公开(公告)日：2019-01-17
申请号：PCT/EP2018/066438
申请日：2018-06-20
申请人： ASML NETHERLANDS B.V.
发明人： QUINTANILHA, Richard , SMAKMAN, Erwin, Paul , AKBULUT, Duygu , KUMAR, Nitish , GOORDEN, Sebastianus, Adrianus , SETIJA, Irwan, Dani
IPC分类号： G03F9/00 , G01N23/225 , G01R31/305
摘要： An inspection tool for inspecting a semiconductor substrate is described, the inspection tool comprising: - an substrate table configured to hold the substrate; - an electron beam source configured to project an electron beam onto an area of interest of the substrate, the area of interest comprising a buried structure; - a cathodoluminescent detector configured to detect cathodoluminescent light emitted from the buried structure; - a control unit configured to: - control the electron beam source to project to electron beam onto the area of interest; - receive a signal representative of the detected cathodoluminescent light; - determine, based on the signal, a characteristic of the buried structure.

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