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1. 发明申请

WO2022258271A1 CHARGED PARTICLE APPARATUS AND METHOD 审中-公开
公开(公告)号：WO2022258271A1
公开(公告)日：2022-12-15
申请号：PCT/EP2022/062443
申请日：2022-05-09
申请人： ASML NETHERLANDS B.V.
发明人： VAN SOEST, Jurgen , VEENSTRA, Roy, Ramon , SMAKMAN, Erwin, Paul , VAN ZUTPHEN, Tom , MANGNUS, Albertus, Victor, Gerardus
IPC分类号： H01J37/073
摘要： The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

2. 发明申请

WO2019011608A1 INSPECTION TOOL, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC SYSTEM, INSPECTION METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2019011608A1
公开(公告)日：2019-01-17
申请号：PCT/EP2018/066438
申请日：2018-06-20
申请人： ASML NETHERLANDS B.V.
发明人： QUINTANILHA, Richard , SMAKMAN, Erwin, Paul , AKBULUT, Duygu , KUMAR, Nitish , GOORDEN, Sebastianus, Adrianus , SETIJA, Irwan, Dani
IPC分类号： G03F9/00 , G01N23/225 , G01R31/305
摘要： An inspection tool for inspecting a semiconductor substrate is described, the inspection tool comprising: - an substrate table configured to hold the substrate; - an electron beam source configured to project an electron beam onto an area of interest of the substrate, the area of interest comprising a buried structure; - a cathodoluminescent detector configured to detect cathodoluminescent light emitted from the buried structure; - a control unit configured to: - control the electron beam source to project to electron beam onto the area of interest; - receive a signal representative of the detected cathodoluminescent light; - determine, based on the signal, a characteristic of the buried structure.

3. 发明申请

WO2020136044A3 PULSED CHARGED-PARTICLE BEAM SYSTEM 审中-公开
公开(公告)号：WO2020136044A3
公开(公告)日：2020-07-02
申请号：PCT/EP2019/085706
申请日：2019-12-17
申请人： ASML NETHERLANDS B.V.
发明人： BLEEKER, Arno, Jan , DE JAGER, Pieter, Willem, Herman , GOOSEN, Maikel, Robert , SMAKMAN, Erwin, Paul , MANGNUS, Albertus, Victor, Gerardus , REN, Yan , LASSISE, Adam
IPC分类号： H01J37/147 , H01J37/26 , H01J37/04
摘要： Apparatuses (1400) and methods for charged-particle detection may include a deflector system (1408, 1410, 1412) configured to direct charged-particle pulses (1414, 1416, 1418), a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

4. 发明申请

WO2020011580A1 SEM IMAGE ENHANCEMENT METHODS AND SYSTEMS 审中-公开
公开(公告)号：WO2020011580A1
公开(公告)日：2020-01-16
申请号：PCT/EP2019/067555
申请日：2019-07-01
申请人： ASML NETHERLANDS B.V.
发明人： FANG, Wei , PU, Lingling , HUISMAN, Thomas, Jarik , SMAKMAN, Erwin, Paul
IPC分类号： H01J37/22 , H01J37/28 , G06T5/00 , G06T5/50 , G06T7/00
摘要： Systems and methods for image enhancement using a multi-beam device are disclosed. A method for enhancing an image includes acquiring a first scanning electron microscopy (SEM) image by use of an on-axis beam of the multi-beam device. The method further includes acquiring a second SEM image by use of an off-axis beam of the multi-beam device. The method further includes providing an enhanced image by using the first SEM image as a reference to enhance the second SEM image. The enhanced image may be provided by using one or more features extracted from the first image to enhance the second SEM image, or using the first SEM image as a reference to numerically enhance the second SEM image.

5. 发明申请

WO2021140072A1 APPARATUS FOR AND METHOD OF CONTROL OF A CHARGED PARTICLE BEAM 审中-公开
公开(公告)号：WO2021140072A1
公开(公告)日：2021-07-15
申请号：PCT/EP2021/050030
申请日：2021-01-04
申请人： ASML NETHERLANDS B.V.
发明人： MANGNUS, Albertus, Victor, Gerardus , GOOSEN, Maikel, Robert , SMAKMAN, Erwin, Paul , REN, Yan
IPC分类号： H01J37/153 , H01J37/28 , H01J2237/151 , H01J2237/153 , H01J2237/1534 , H01J2237/2809
摘要： An apparatus comprising a set of pixels configured to shape a beamlet approaching the set of pixels and a set of pixel control members respectively associated with each of the set of pixels, each pixel control member being arranged and configured to apply a signal to the associated pixel for shaping the beamlet.

6. 发明申请

WO2017114658A1 METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY 审中-公开
标题翻译：用于直写光罩光刻的方法和设备
公开(公告)号：WO2017114658A1
公开(公告)日：2017-07-06
申请号：PCT/EP2016/081006
申请日：2016-12-14
申请人： ASML NETHERLANDS B.V.
发明人： SMAKMAN, Erwin, Paul , VERSCHUREN, Coen, Adrianus
IPC分类号： G03F7/20
CPC分类号： G03F7/70383 , G03F7/70391
摘要： A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.
摘要翻译：一种使用辐射源提供根据图案的至少两个子图案调制的多个辐射束的方法和设备，所述辐射源产生至少两个点尺寸的辐射束，使得每个具有与至少两种光斑尺寸相同的光斑尺寸的辐射束被用于产生至少两个子图案中的一个，将多个光束投射到衬底上，并且在衬底和多个辐射源之间提供相对运动在扫描方向上曝光衬底。一种方法和设备，用于使用多行辐射源的二维阵列提供根据期望图案调制的辐射，使用投影系统将调制辐射投影到衬底上，以及从投影系统和衬底之间移除流体使用一个或多个流体去除单元。

7. 发明申请

WO2020193130A1 APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT 审中-公开
公开(公告)号：WO2020193130A1
公开(公告)日：2020-10-01
申请号：PCT/EP2020/056432
申请日：2020-03-11
申请人： ASML NETHERLANDS B.V.
发明人： MANGNUS, Albertus, Victor, Gerardus , GOOSEN, Maikel, Robert , SMAKMAN, Erwin, Paul
IPC分类号： H01J37/28 , H01J37/244
摘要： Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.

8. 发明申请

WO2018015114A1 DETERMINING THE COMBINATION OF PATTERNS TO BE APPLIED TO A SUBSTRATE IN A LITHOGRAPHY STEP 审中-公开
标题翻译：在光刻步骤中确定要应用于衬底的图案的组合
公开(公告)号：WO2018015114A1
公开(公告)日：2018-01-25
申请号：PCT/EP2017/065800
申请日：2017-06-27
申请人： ASML NETHERLANDS B.V.
发明人： VERSCHUREN, Coen, Adrianus , SMAKMAN, Erwin, Paul
IPC分类号： G03F7/20 , G03F1/50
摘要： A direct write exposure apparatus configured to process a plurality of substrates is described, the apparatus comprising: - a substrate holder configured to hold a substrate having a usable patterning area; - a patterning system configured to project different patterns onto the substrate; - a processing system configured to: o determine a first combination of one or more patterns that are to be applied on a first substrate of the plurality of substrates; and o determine a second, different combination of one or more patterns that are to be applied on a second, subsequent, substrate of the plurality of substrates.
摘要翻译：描述了配置为处理多个基板的直接写入曝光设备，该设备包括： - 基板保持器，配置为保持具有可用图案化区域的基板; - 图案化系统，其被配置为将不同图案投影到所述衬底上; - 处理系统，其被配置为：o确定待施加在所述多个基板中的第一基板上的一个或多个图案的第一组合; 以及o确定待施加在多个基板的第二后续基板上的一个或多个图案的第二不同组合。

9. 发明申请

WO2018015113A1 APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY 审中-公开
标题翻译：用于直写光罩平版印刷的装置
公开(公告)号：WO2018015113A1
公开(公告)日：2018-01-25
申请号：PCT/EP2017/065794
申请日：2017-06-27
申请人： ASML NETHERLANDS B.V.
发明人： SMAKMAN, Erwin, Paul , VERSCHUREN, Coen, Adrianus
IPC分类号： G03F7/20 , G03F9/00
摘要： An exposure apparatus is described, the apparatus comprising: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device comprising an array of a plurality of radiation source modules configured to project the modulated radiation onto a respective array of a plurality of exposure regions on the substrate; a distributed processing system configured to process projection related data to enable the projection of the desired pattern onto the substrate, the distributed processing system comprising at least one central processing unit (1700) and a plurality of module processing units (1710) associated with respective plurality of radiation source modules.
摘要翻译：描述了一种曝光设备，该设备包括：衬底保持器，被构造为支撑衬底; 图案形成装置，其被配置为提供根据期望图案调制的辐射，所述图案形成装置包括多个辐射源模块的阵列，所述多个辐射源模块被配置为将所述调制的辐射投影到所述衬底上的多个曝光区域的相应阵列上; 分布式处理系统，其被配置为处理投影相关数据以使得能够将期望图案投影到衬底上，分布式处理系统包括至少一个中央处理单元（1700）和与相应的多个模块相关联的多个模块处理单元（1710）的辐射源模块。

10. 发明申请

WO2022117295A1 CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD 审中-公开
公开(公告)号：WO2022117295A1
公开(公告)日：2022-06-09
申请号：PCT/EP2021/081134
申请日：2021-11-09
申请人： ASML NETHERLANDS B.V.
发明人： SLOT, Erwin , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul , REN, Yan , SCOTUZZI, Marijke
IPC分类号： H01J37/304
摘要： A charged-particle tool configured to generate a plurality of sub- beams from a beam of charged particles and direct the sub-beams downbeam toward a sample (600) position, the tool charged-particle tool comprising at least three charged-particle-optical components (201,111,235,234); a detector module (240); and a controller. The detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode.. The charged-particle-optical components include: a charged-particle source 201 configured to emit a beam of charged particles and a beam generator (111) configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.

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